Results 201 to 210 of about 228,991 (341)
Micro Elastofluidics for Tuneable Droplet Merging
This technical paper provides a proof of concept of fully flexible and stretchable microfluidic technology for tuneable droplet mixing and merging. The phenomenon is justified through theoretical, numerical and experimental studies. ABSTRACT Droplet microfluidics enables precise handling of discrete fluid volumes at the microscale, with broad ...
Uditha Roshan +8 more
wiley +1 more source
Mechanism of Vapor-Phase Infiltration of Organometallic Hf in Poly(Methyl Methacrylate) for Hybrid Resist Applications. [PDF]
Chowdhury MI +10 more
europepmc +1 more source
Trends in Research and Development of Lithography Technology for Next-generation LSIs
アツシ オガサワラ
openalex +1 more source
Flexible sweat sensor patch integrating graphene‑interfaced gold microelectrodes functionalized with bio‑receptors and ion‑selective membrane, coupled with a capillary‑driven microfluidic layer and portable potentiostat electronics for multiplexed monitoring of inflammatory, metabolic, and electrolyte biomarkers in microliter sweat volumes.
Roomia Memon +4 more
wiley +1 more source
The Influence of Mask Modification on Microneedle Strength in Deep X-Ray Lithography. [PDF]
Wang J, Li Y, Du L.
europepmc +1 more source
Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam
智子 大山 +3 more
openalex +1 more source
Enhancing Small Molecule Sensing With Aptameric Functionalized Nano Devices
Unveiling an ultra‐sensitive, non‐invasive neurotransmitter sensor. For the first time, a nanoscale sensor for detecting an important neurotransmitter was demonstrated using micro‐electromechanical systems (MEMS) technology. Our approach utilized field‐effect transistor (FET)‐based readout to enable pico‐molar detection of biomarkers in sweat.
Thi Thanh Ha Nguyen +11 more
wiley +1 more source
Stamping Lithography on Arbitrary Surfaces based on Self-Assembly of Colloidal Particles. [PDF]
Yu G +8 more
europepmc +1 more source
Two-Color Synergistic Photochemistry for Network Formation and Lithography
Jan Patrick Hobich
openalex +1 more source
Advances in Resist Materials for 193 nm Lithography.
M. J. Bowden +19 more
openalex +2 more sources

