Results 221 to 230 of about 42,035 (262)
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Angewandte Chemie International Edition, 1998
Abstract Soft lithography represents a non-photolithographic strategy based on self-assembly and replica molding for carrying out micro- and nanofabrication. It provides a convenient, effective, and low-cost method for the formation and manufacturing of micro- and nanostructures.
Younan, Xia, George M, Whitesides
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Abstract Soft lithography represents a non-photolithographic strategy based on self-assembly and replica molding for carrying out micro- and nanofabrication. It provides a convenient, effective, and low-cost method for the formation and manufacturing of micro- and nanostructures.
Younan, Xia, George M, Whitesides
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2020
Lithography became an essential tool for materials research during the post-World War II computing revolution. Increasing computing power required shrinking circuits and packing transistors more tightly together. Lithography made it possible to write small, precise circuits on a semiconducting surface, setting the stage for modern computing and fueling
Martin, Joseph D., Mody, Cyrus C. M.
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Lithography became an essential tool for materials research during the post-World War II computing revolution. Increasing computing power required shrinking circuits and packing transistors more tightly together. Lithography made it possible to write small, precise circuits on a semiconducting surface, setting the stage for modern computing and fueling
Martin, Joseph D., Mody, Cyrus C. M.
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Science, 2005
We report a high-throughput procedure for lithographically processing one-dimensional nanowires. This procedure, termed on-wire lithography, combines advances in template-directed synthesis of nanowires with electrochemical deposition and wet-chemical etching and allows routine fabrication of face-to-face disk arrays and gap structures in the range of ...
Lidong, Qin +3 more
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We report a high-throughput procedure for lithographically processing one-dimensional nanowires. This procedure, termed on-wire lithography, combines advances in template-directed synthesis of nanowires with electrochemical deposition and wet-chemical etching and allows routine fabrication of face-to-face disk arrays and gap structures in the range of ...
Lidong, Qin +3 more
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Nature Nanotechnology, 2015
The optical and electrical properties of heterogeneous nanowires are profoundly related to their composition and nanoscale architecture. However, the intrinsic constraints of conventional synthetic and lithographic techniques have limited the types of multi-compositional nanowire that can be created and studied in the laboratory. Here, we report a high-
Tuncay, Ozel +2 more
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The optical and electrical properties of heterogeneous nanowires are profoundly related to their composition and nanoscale architecture. However, the intrinsic constraints of conventional synthetic and lithographic techniques have limited the types of multi-compositional nanowire that can be created and studied in the laboratory. Here, we report a high-
Tuncay, Ozel +2 more
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AFM lithography combined with optical lithography
Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387), 2002Reports on a hybrid method of AFM lithography and optical lithography that increases the drawing speed and decreases the drawing length. Advanced devices, such as quantum ones, have both nanometer-scale structures and large area structures, such as contact pads. It takes a long time to fabricate all the patterns using AFM lithography alone.
M. Ishibashi, S. Heike, T. Hashizume
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2021 IEEE International Roadmap for Devices and Systems Outbriefs, 2021
Hsiung, H., Schwartz, K.
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Hsiung, H., Schwartz, K.
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IBM Journal of Research and Development, 1980
Advances in lithography rely largely on the capability of reducing overlay errors, which in turn depends on the capability to make two-dimensional overlay measurements. This paper describes a simple and accurate method of determining singular overlay errors of step-and-repeat exposure systems with a precision of ±0.01 µm (standard deviation).
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Advances in lithography rely largely on the capability of reducing overlay errors, which in turn depends on the capability to make two-dimensional overlay measurements. This paper describes a simple and accurate method of determining singular overlay errors of step-and-repeat exposure systems with a precision of ±0.01 µm (standard deviation).
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Proceedings of the IEEE, 2001
Lithography technology has been one of the key enablers and drivers for the semiconductor industry for the past several decades. Improvements in lithography are responsible for roughly half of the improvement in cost per function in integrated circuit (IC) technology.
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Lithography technology has been one of the key enablers and drivers for the semiconductor industry for the past several decades. Improvements in lithography are responsible for roughly half of the improvement in cost per function in integrated circuit (IC) technology.
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Nanobiotechnology: Soft Lithography
2009An entirely new scientific and technological area has been born from the combination of nanotechnology and biology: nanobiotechnology. Such a field is primed especially by the strong potential synergy enabled by the integration of technologies, protocols, and investigation methods, since, while biomolecules represent functional nanosystems interesting ...
MELE E, PISIGNANO, Dario
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Nano Letters
As Moore's Law continues to push critical dimension (CD) scaling in integrated circuits, conventional photolithography approaches fundamental resolution limits. While alternative strategies such as self-aligned double patterning and directed self-assembly address these challenges, they introduce process complexity and manufacturing variability. Here we
Yuxiang Yin +4 more
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As Moore's Law continues to push critical dimension (CD) scaling in integrated circuits, conventional photolithography approaches fundamental resolution limits. While alternative strategies such as self-aligned double patterning and directed self-assembly address these challenges, they introduce process complexity and manufacturing variability. Here we
Yuxiang Yin +4 more
openaire +2 more sources