Results 171 to 180 of about 2,200,501 (302)

Descriptor‐Informed Screening of Interface‐Active Molecules for Efficient Magnesium Metal Anodes

open access: yesAdvanced Materials, EarlyView.
A descriptor‐informed molecular screening strategy identifies 4‐bromo‐N, N‐dimethylaniline (BrNNA) as an interface‐active electrolyte component that enables fast Mg stripping/plating in Mg(TFSI)2‐based electrolytes. By simultaneously regulating Mg2+ solvation and interphase formation, the BrNNA‐containing electrolyte delivers activation‐free Mg ...
Hao Xu   +16 more
wiley   +1 more source

Correction: Magnetic susceptibility components reveal different aspects of neurodegeneration in alpha-synucleinopathies. [PDF]

open access: yesSci Rep
Kiersnowski OC   +17 more
europepmc   +1 more source

Defect‐Driven Charge Separation in Ba‐Doped SrTiO3: Correlating Photoelectrochemical Performance With Dye‐Selective Photocatalysis

open access: yesAdvanced Materials Interfaces, EarlyView.
Ba‐doped SrTiO3 perovskites establish a direct correlation between photoelectrochemical activity and photocatalytic performance. Optimized Ba0.5Sr0.5TiO3 exhibits enhanced charge separation, photocurrent generation, and visible‐light‐driven dye degradation through defect‐induced oxygen vacancies and lattice distortion.
Sagar A. Nikam   +6 more
wiley   +1 more source

Low-intensity rim on T2-weighted brainstem imaging: a universally observed structure exhibiting a negative magnetic susceptibility effect. [PDF]

open access: yesJpn J Radiol
Yamakuni R   +9 more
europepmc   +1 more source

Spatial patterns of elevated magnetic susceptibility in progressive apraxia of speech. [PDF]

open access: yesNeuroimage Clin, 2023
Satoh R   +10 more
europepmc   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

Where Precursor Loading Stops Making a Difference: Resolving an Operational Infiltration Limit for Nanoparticle Synthesis Using Dual Quantification of Reverse Micelle Nanoreactors

open access: yesAdvanced Materials Interfaces, EarlyView.
A dual characterization strategy combining nanomechanical and mass measurements resolves a common operational loading threshold in reverse micelle nanoreactors. This transferable framework provides a rational strategy for optimizing precursor loading and nanoparticle synthesis, across template‐mediated fabrication systems.
Linan Cui   +3 more
wiley   +1 more source

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