Results 121 to 130 of about 255,948 (257)

Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering

open access: yes, 2019
Multilayer thin films have the potential to act as high dielectric strength insulation for wire and microelectronics. In this study, films consisting of 2, 4 or 8 layers, composed of Al2O3 with SiO2 or Ta2O5, were prepared via pulsed direct current and ...
Hanby, Benjamin V.T.   +5 more
core   +1 more source

Study of atomic sputtering and transport dynamics by Monte Carlo simulation

open access: yesNuclear Engineering and Technology
Magnetron sputtering vacuum coating technology is widely used in Accident Tolerant Fuel (ATF) cladding materials. The growth of thin films is a crucial step in the magnetron sputtering process, closely linked to the energy and angular distribution of ...
Pengfei Ma   +6 more
doaj   +1 more source

MAGNETRON SPUTTERING SYNTHESIS OF ELECTROCATALYSTS

open access: yesChemical Problems
Magnetron sputtering is a well-known method of obtaining various coatings and surface modifications, but nowadays it is successfully used for the synthesis of electrocatalysts. One of the main advantages of the method is the possibility to vary the parameters during the process, such as the mode (direct current sputtering, pulsed medium-frequency ...
M.V. Kozlova   +5 more
openaire   +1 more source

Structural and electrochromic property control of WO3 films through fine-tuning of film-forming parameters

open access: yesHigh Temperature Materials and Processes
Tungsten trioxide (WO3) films, extensively investigated for their remarkable electrochromic properties, have proven to be highly versatile in numerous applications. However, the challenge of achieving large-scale WO3 films with substantial dimensions and
Lin Gai   +4 more
doaj   +1 more source

Photoluminescence of nanocrystalline SiC films prepared by rf magnetron sputtering

open access: yes, 2001
Amorphous Sic films are deposited on Si (111) substrates by rf magnetron sputtering and then annealed at 1200 degreesC for different times by a dc self-heating method in a vacuum annealing system. The crystallization of the amorphous Sic is determined by
Yang H   +8 more
core  

Characterisation and optimisation of alternating current thin film electroluminescent displays

open access: yes, 2014
This Thesis presents research undertaken to investigate the electro-optical characterisation and optimisation of Thin Film Electroluminescent (TFEL) devices and Laterally Emitting Thin Film Electroluminescent (LETFEL) devices with respect to device ...
Farrow, C
core  

Growth optimisation and laser processing of thin film phosphors for electroluminescent displays

open access: yes, 2010
This thesis presents results of a study of ZnS:Mn thin film phosphors used in Thin Film ELectroluminescent (TFEL) and Laterally Emitting TFEL (LETFEL) devices, examining techniques for phosphor growth optimisation and post deposition processing in order ...
Boutaud, G
core  

Planar Magnetron Sputtering Device: A New Generation of Magnetron Sputtering Design and Technology [PDF]

open access: yesJournal of Physical Science and Application, 2017
null Z. V. Berishvili   +3 more
openaire   +1 more source

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