Results 1 to 10 of about 5,443 (237)

Designing Defect Structure and Interfacial Strain in an Epitaxial VN Bilayer Film by Tailoring N Concentration

Advanced Materials Interfaces, Volume 13, Issue 4, 17 February 2026.
The N concentration in an epitaxial VN bilayer is tailored from overstoichiometric V0.49N0.51 to understoichiometric V0.56N0.44. Based on ab initio, diffraction, and microscopy data, the overstoichiometric V0.49N0.51 layer contains V vacancies, N Frenkel pairs, and a high density of dislocations.
Marcus Hans, Damian M. Holzapfel, Zhuo Chen, Soheil Karimi Aghda, Michal Fečík, Daniel Primetzhofer, Zaoli Zhang, Jochen M. Schneider   +7 more
wiley   +1 more source

Influence of Bias Voltage on Microstructure and Properties of TiAlSiN Coatings Prepared by HiPIMS [PDF]

Cailiao Baohu
For investigating the influence and mechanism of bias voltage on the composition structure, mechanical properties and tribological properties of TiAlSiN coatings prepared by high-power pulsed magnetron sputtering(HiPIMS), TiAlSiN coatings were deposited ...
DU Jianrong, TAO Guanyu, CHEN Hui, YI Juan, WAN Hong, LIU Shuyang, ZHANG Yu
doaj   +1 more source

Influence of Metal Oxide Interface Layers on the Thermochromic Properties of VO2 Thin Films Deposited by Magnetron Sputtering

Advanced Materials Interfaces, Volume 13, Issue 4, 17 February 2026.
This study investigates the thermochromic properties of VO2 deposited on aluminum doped zinc oxide precoated fused silica with Al2O3, TiO2, and WO3 as interface layers. The results indicate that the metal‐to‐insulator transition is highly influenced by the grains formed at the interface.
Eduard Llorens Balada, Eugen Stamate
wiley   +1 more source

Plasmonic Characteristics of TiN Layers Deposited by ECWR Assisted MF Magnetron Sputtering

Advanced Physics Research, Volume 5, Issue 1, January 2026.
MFECWR magnetron sputtering produces compact TiN films at room temperature by enhancing plasma density and nitrogen dissociation. The films exhibit metallic dielectric functions and SPP quality factors comparable to high‐temperature or epitaxial counterparts.
Libor Nožka, Miroslav Hrabovský, Zdenek Hubička, Aneta Písaříková, Jan Krajczewski, Petr Schovánek, Jan Tomáštík, Lukas Václavek   +7 more
wiley   +1 more source

Unprecedented high-temperature electrical insulation of reactively sputtered AlN thin films

Materials & Design
This study investigates the morphological and electrical properties of hexagonal aluminium nitride (h-AlN) films synthesized through different reactive sputtering techniques at low growth temperatures (270 °C) – specifically direct and pulsed current ...
N. Salvadores Farran, T.M. Huber, T. Wojcik, A. Gies, J. Ramm, S. Kolozsvári, P. Polcik, M. Stöger-Pollach, J. Rath, J. Fleig, H. Riedl   +10 more
doaj   +1 more source

Vapor Deposition Strategies for Copper‐Based Electrocatalysts in CO2 Reduction Applications

ChemSusChem, Volume 18, Issue 21, Novemebr 4, 2025.
This review explores the innovative application of vapor deposition techniques such as physical vapor deposition, chemical vapor deposition, and atomic layer deposition for fabricating copper‐based electrocatalysts for CO2 electrochemical reduction. The advent of copper‐based electrocatalysts has significantly advanced the electrochemical conversion of
Lovelle Rhoy Manpatilan, Stefano Bianco, Giancarlo Cicero, Juqin Zeng, Elena Maria Tresso   +4 more
wiley   +1 more source

Recent developments on titanium based mono and multilayer nitride films deposited through HiPIMS

Next Materials
High Power Impulse Magnetron Sputtering (HiPIMS) is a notable advancement under Physical Vapor Deposition (PVD) techniques, achieving plasma densities of 1018–1019 m−3 and ionization levels over 70 %, resulting in a transient plasma with exceptional ion ...
Sayan Atta, Sitaram Dash, Arun Tom Mathew, Uttamchand NarendraKumar   +3 more
doaj   +1 more source

Discovering Stable Amorphous Ceramics: From Computational Prediction to Thin‐Film Synthesis

Advanced Materials, Volume 37, Issue 32, August 14, 2025.
This work presents a computationally guided approach to discovering stable amorphous ceramics, using yttrium tungsten nitride (Y‐W‐N) as a prototype. By combining first‐principles random structure sampling with thin‐film synthesis, the authors identify and experimentally realize previously unreported amorphous nitrides, demonstrating their exceptional ...
Oleksandr V. Pshyk, Siarhei Zhuk, Jyotish Patidar, Alexander Wieczorek, Amit Sharma, Johann Michler, Claudia Cancellieri, Vladan Stevanovic, Sebastian Siol   +8 more
wiley   +1 more source

Tribological properties of WS2 thin films with improved adhesion using MAIP/HiPIMS composite deposition

Journal of Materials Research and Technology
Dense WS2 thin films with excellent self-lubricating properties have been prepared using high-power impulse magnetron sputtering (HiPIMS) successfully.
Jianjian Yu, Ping Zhang, Puyou Ying, Chen Li, Changhong Lin, Tao Yang, Jianbo Wu, Tianle Wang, Nikolai Myshkin, Vladimir Levchenko   +9 more
doaj   +1 more source

Nanostructured Thermal Barrier Coatings via Magnetron Sputtering: A Review of Enhanced Performance and Durability

International Journal of Ceramic Engineering &Science, Volume 7, Issue 4, July 2025.
This review highlights recent advances in magnetron‐sputtered ceramic thermal barrier coatings for Superni 718, emphasizing improved thermal insulation, oxidation resistance, and durability. Key deposition parameters and emerging techniques like HiPIMS are critically discussed with a focus on coating performance under extreme operating conditions ...
Syed Faizan Altaf, Atikur Rahman, M. F. Wani   +2 more
wiley   +1 more source