Results 1 to 10 of about 454 (158)

Low temperature deposition of functional thin films on insulating substrates enabled by selective ion acceleration using synchronized floating potential HiPIMS [PDF]

open access: yesNature Communications
Ionized physical vapor deposition techniques, such as high-power impulse magnetron sputtering (HiPIMS), are gaining popularity but face challenges for deposition on insulating materials, where applying negative potentials for ion acceleration is ...
Jyotish Patidar   +4 more
doaj   +2 more sources

Highly Stable and Enhanced Performance of p–i–n Perovskite Solar Cells via Cuprous Oxide Hole-Transport Layers [PDF]

open access: yesNanomaterials, 2023
Solar light is a renewable source of energy that can be used and transformed into electricity using clean energy technology. In this study, we used direct current magnetron sputtering (DCMS) to sputter p-type cuprous oxide (Cu2O) films with different ...
Tung-Han Chuang   +6 more
doaj   +2 more sources

Band-gap engineering of zirconia by nitrogen doping in reactive HiPIMS: a step forward in developing innovative technologies for photocatalysts synthesis [PDF]

open access: yesFrontiers in Chemistry, 2023
In the global context of climate change and carbon neutrality, this work proposes a strategy to improve the light absorption of photocatalytic water-splitting materials into the visible spectrum by anion doping.
Teodora Matei   +7 more
doaj   +2 more sources

Enhanced Electrical Properties of Copper Nitride Films Deposited via High Power Impulse Magnetron Sputtering [PDF]

open access: yesNanomaterials, 2022
High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films.
Yin-Hung Chen   +6 more
doaj   +2 more sources

Titanium Nitride Coatings on CoCrMo and Ti6Al4V Alloys: Effects on Wear and Ion Release [PDF]

open access: yesLubricants
While titanium nitride (TiN) coatings are well known for their biocompatibility and excellent mechanical properties, their wear particle and debris release in orthopedic implants remains a matter of active investigation. This study addresses the efficacy
Mohammed AbuAlia   +4 more
doaj   +2 more sources

The Enhanced Performance of Oxide Thin-Film Transistors Fabricated by a Two-Step Deposition Pressure Process [PDF]

open access: yesNanomaterials
It is usually difficult to realize high mobility together with a low threshold voltage and good stability for amorphous oxide thin-film transistors (TFTs).
Mingjie Zhao   +10 more
doaj   +2 more sources

Formations of anode double layer and ion beam in bipolar-pulse HiPIMS (BP-HiPIMS)

open access: yesPlasma Sources Science and Technology, 2022
Abstract As an emerging ion acceleration plasma source, the bipolar-pulse high power impulse magnetron sputtering (BP-HiPIMS) discharge provides an effective approach to improve deposited ion energy and tailor the film properties for a large range of applications.
Mingyue Han   +8 more
  +5 more sources

Improving tribocorrosion resistance of a medical grade CoCrMo alloy by the novel HIPIMS nitriding technique

open access: yesJournal of Science: Advanced Materials and Devices, 2023
In this work, tribocorrosion performance of the High Power Impulse Magnetron Sputtering (HIPIMS) nitrided (F75) CoCrMo alloys was examined with the help of sliding wear corrosion experiments carried out in Hank's solution.
Y. Purandare   +5 more
doaj   +1 more source

HiPIMS co-sputtering for the increase of the mechanical properties of arc deposited TiN coatings

open access: yesJournal of Materials Research and Technology, 2023
Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with high-power impulse magnetron sputtering (HiPIMS), due to differences in the respective pressure requirements.
Chi-Lung Chang   +4 more
doaj   +1 more source

A Comparative Investigation on the Microstructure and Thermal Resistance of W-Film Sensor Using dc Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering

open access: yesMagnetochemistry, 2023
Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron ...
Jing Huan   +4 more
doaj   +1 more source

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