Results 41 to 50 of about 5,443 (237)

Ion current density on the substrate during short-pulse HiPIMS

Plasma Sources Science & Technology, 2023
A probe method for measuring the ion current density and theoretical calculations of the dynamics of neutral and charged plasma particles using the ionization region model (IRM) is used to study short and ultra-short pulse high-power impulse magnetron ...
V. Oskirko, V. Kozhevnikov, S. Rabotkin, A. Pavlov, V. Semenov, A. Solovyev   +5 more
semanticscholar   +1 more source

A Comparative Study in the Tribological Behavior of DLC Coatings Deposited by HiPIMS Technology with Positive Pulses

Metals, 2020
During the last few decades, diamond-like carbon (DLC) coatings were widely used for tribological applications, being an effective tool for improving the performance and the useful life of different machining tools.
Jose A. García, Pedro J. Rivero, Eneko Barba, Ivan Fernández, Jose A. Santiago, Jose F. Palacio, Gonzalo G. Fuente, Rafael J. Rodríguez   +7 more
doaj   +1 more source

Deposition of 3YSZ-TiC PVD Coatings with High-Power Impulse Magnetron Sputtering (HiPIMS)

Applied Sciences, 2021
Optimized coating adhesion and strength are the advantages of high-power impulse magnetron sputtering (HiPIMS) as an innovative physical vapor deposition (PVD) process.
Bastian Gaedike, Svenja Guth, Frank Kern, Andreas Killinger, Rainer Gadow   +4 more
doaj   +1 more source

The superior properties of CrN coatings prepared by high power pulsed reactive magnetron sputtering

AIP Advances, 2020
In this paper, we investigate the properties of chromium nitride (CrN) coating prepared using a high power magnetron sputtering (HiPIMS) technique. As a comparison, CrN coating prepared using a direct current magnetron sputtering (DCMS) technique is also
Qian Li, Lizhen Yang, Zhengduo Wang, Haibao Zhang, Zhongwei Liu, Qiang Chen   +5 more
doaj   +1 more source

HiPIMS-grown AlN buffer for threading dislocation reduction in DC-magnetron sputtered GaN epifilm on sapphire substrate

Vacuum, 2023
Gallium nitride (GaN) epitaxial films on sapphire (Al 2 O 3 ) substrates have been grown using reactive magnetron sputter epitaxy with a liquid Ga target.
Jui-Che Chang, Han-Hui Tseng, Yi-Ling Lo, Sanjay Nayak, D. Lundin, P. Persson, R. Horng, L. Hultman, J. Birch, Ching-Lien Hsiao   +9 more
semanticscholar   +1 more source

Dense and hard TiWC protective coatings grown with tungsten ion irradiation using WC-HiPIMS/TiC-DCMS co-sputtering technique without external heating

Applications of Surface Science, 2023
Titanium tungsten carbide (TiWC) coatings are deposited by a combined high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) technique. No external heating is applied during deposition phase, instead, the thermally driven adatom mobility is ...
Tun-Wei Hsu, G. Greczynski, R. Boyd, S. Kolozsvári, P. Polcik, M. Odén   +5 more
semanticscholar   +1 more source

Enhanced Electrical Properties of Copper Nitride Films Deposited via High Power Impulse Magnetron Sputtering

Nanomaterials, 2022
High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films.
Yin-Hung Chen, Pei-Ing Lee, Shikha Sakalley, Chao-Kuang Wen, Wei-Chun Cheng, Hui Sun, Sheng-Chi Chen   +6 more
doaj   +1 more source

Growth of HfN thin films by reactive high power impulse magnetron sputtering

AIP Advances, 2018
Thin hafnium nitride films were grown on SiO2 by reactive high power impulse magnetron sputtering (HiPIMS) and reactive direct current magnetron sputtering (dcMS).
D. Ö. Thorsteinsson, J. T. Gudmundsson
doaj   +1 more source

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

Beilstein Journal of Nanotechnology, 2019
Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce unique ...
Hamidreza Hajihoseini, Movaffaq Kateb, Snorri Þorgeir Ingvarsson, Jon Tomas Gudmundsson   +3 more
doaj   +1 more source

Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS [PDF]

Materials Research, 2015
In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5,
Abrão Chiaranda Merij, Tarcila Sugahara, Gislene Valdete Martins, Argemiro Soares da Silva Sobrinho, Danieli Aparecida Pereira Reis, Polyana Alves Radi Gonçalves, Marcos Massi   +6 more
doaj   +1 more source