Results 51 to 60 of about 5,443 (237)
The use of Highly Ionized Pulsed Plasmas for the Synthesis of Advanced Thin Films and Nanoparticles
KONA Powder and Particle Journal, 2014 Pulsed plasma processes open up the possibility of using very high plasma densities and modulated deposition in the synthesis of thin films and nanoparticles.
Iris Pilch +3 more
doaj +1 more source
On unipolar and bipolar HiPIMS pulse configurations to enhance energy flux to insulating surfaces [PDF]
Plasma Sources Science & TechnologyHigh-power impulse magnetron sputtering (HiPIMS) delivers a high target power in short pulses, enhancing the ionization and energy of sputtered atoms and thus providing more possibilities to control the film properties.
M. Farahani +4 more
semanticscholar +1 more source
Reactive HiPIMS of oxides for optical coatings
, 2022 S.121-130ZrO2, TiO2 and Al2O3 thin films were deposited by reactive High Power Impulse Magnetron Sputtering (HiPIMS) by the use of a linear double magnetron. For reactive HiPIMS deposition from metallic targets, a partial pressure gas control was used to
Vergöhl, M. +4 more
core +1 more source
Nanomaterials, 2022 Gold nanoparticles conjugated with collagen molecules and fibers have been proven to improve structure strength, water and enzyme degradation resistance, cell attachment, cell proliferation, and skin wound healing.
Sheng-Yang Huang +4 more
doaj +1 more source
Properties of TiAlN Coatings Obtained by Dual-HiPIMS with Short Pulses
Materials, 2023 The paper focuses on the dual high-power impulse magnetron sputtering of TiAlN coatings using short pulses of high power delivered to the target. The surface morphology, elemental composition, phase composition, hardness, wear resistance, and adhesive ...
A. Grenadyorov +7 more
semanticscholar +1 more source
Chapter 2: fundamentals and applications of HIPIMS
, 2008 High Power Impulse Magnetron Sputtering (HIPIMS) has been introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of 3 kWcm-2 on the target.
Ehiasarian, Arutiun
core +5 more sources
Characterization of Electromagnetic Instabilities in HIPIMS Plasmas
, 2016 Characterization of Electromagnetic Instabilities in HIPIMS ...
Zuin Matteo
openaire +2 more sources
Corrosion behaviour of multilayer CrN coatings deposited by hybrid HIPIMS after oxidation treatment
Nanotechnology Reviews, 2020 Chromium nitride coatings prepared by physical vapour deposition (PVD) show high hardness, high strength and good thermal conductivity, which makes them useful for cutting and forming tools. In this article, the microstructure and corrosion resistance of
Yu-Jie Zhu +4 more
doaj +1 more source
Nanomaterials, 2022 The mechanical and wear behavior of CrN/CrAlN multilayers were improved by tailoring the experimental conditions of a hybrid magnetron sputtering process based on a high-power impulse (HiPIMS) and two direct current magnetron sputtering (dcMS) power ...
Bruno César Noronha Marques de Castilho +10 more
doaj +1 more source
An Inverted Magnetron Operating in HiPIMS Mode [PDF]
Plasma, 2018 An ionized physical vapor deposition technique for thin ferromagnetic films is proposed. The technique is based on high power impulse magnetron sputtering (HiPIMS) with positive discharge polarity. A gapped-target was employed as the cathode of the magnetron.
Phitsanu Poolcharuansin +3 more
openaire +1 more source