Results 71 to 80 of about 476 (176)

Fabrication of gallium nitride waveguide resonators by high-power impulse magnetron sputtering at room temperature

APL Photonics
In this work, we demonstrate gallium nitride (GaN) waveguide resonators by sputtering amorphous GaN films on the silicon-based substrate. With the aid of high-power impulse magnetron sputtering (HiPIMS), high-quality, high-deposition-rate, and high ...
Shih-Hsin Wu, Zhi-Guang Chen, Hung-Sheng Liu, Sheng-Hui Chen, Pei-Hsun Wang   +4 more
doaj   +1 more source

Enhanced anti-tribocorrosion property of a-C film under high hydrostatic pressure by high power pulsed magnetron sputter (HiPIMS)

Journal of Materials Research and Technology
In this study, the amorphous carbon (a-C) films were deposited using HiPIMS and DCMS at same average power. The composition, microstructure and the anti-tribocorrosion property at hydrostatic pressure environment were investigated in detail.
Yingrui Liu, Shuyu Li, Xiaohui Zhou, Peng Guo, Rende Chen, Jing Wei, Aiying Wang, Peiling Ke   +7 more
doaj   +1 more source

International Conference on Fundamentals and Applications of HIPIMS

IOP Conference Series: Materials Science and Engineering, 2012
Thin film technology and surface engineering are nowadays key components for numerous innovative products like efficient windows, flat screens, sensors or hard coatings used in tool coating and automotive applications, as well as products for everyday life.
Arutiun Ehiasarian, Ralf Bandorf
openaire   +1 more source

Tailoring Microstructure and Properties of Nitride Films: Manipulating Bombardment via Regulating Me⁺/Me²⁺ Ratios

Nanomaterials
Film optimization using high power impulse magnetron sputtering (HiPIMS) currently faces challenges in process control, primarily due to its reliance on empirical trial-and-error adjustment of the macroscopic parameters as well as the insufficient ...
Xingguang Liu, Xin Zhao, Zheng Shu, Yansong Liu, Binhua Gui, Jun Zheng   +5 more
doaj   +1 more source

HiPIMS magnetized plasma afterglow diagnostic

, 2019
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it is desirable to know the lifetime of the magnetized plasma at the end of the pulsed cathode current.
Ganciu, Mihai, Butoi, Bogdan, Groza, Andreea, Mihalcea, Bogdan   +3 more
openaire   +2 more sources

Superhard oxidation-resistant Ti1-xAlxBy thin films grown by hybrid HiPIMS/DCMS co-sputtering diboride targets without external substrate heating

Materials & Design
Ti1-xAlxBy films (0.40 ≤ x ≤ 0.76, and 1.81 ≤ y ≤ 2.03) combining good mechanical properties and high-temperature oxidation resistance are demonstrated.
B. Wicher, O.V. Pshyk, X. Li, B. Bakhit, V. Rogoz, I. Petrov, L. Hultman, G. Greczynski   +7 more
doaj   +1 more source

Fabrication and characterization of Si1−xGex nanocrystals in as-grown and annealed structures: a comparative study

Beilstein Journal of Nanotechnology, 2019
Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse
Muhammad Taha Sultan, Adrian Valentin Maraloiu, Ionel Stavarache, Jón Tómas Gudmundsson, Andrei Manolescu, Valentin Serban Teodorescu, Magdalena Lidia Ciurea, Halldór Gudfinnur Svavarsson   +7 more
doaj   +1 more source

The Effect of Substrate Bias Voltage on the Mechanical and Tribological Properties of (TiAlZrTaNb)N_x High-Entropy Nitride Coatings

Journal of Manufacturing and Materials Processing
We investigate TiAlZrTaNb nitride coatings deposited on Haynes 282 nickel superalloy substrates via high-power impulse magnetron sputtering (HiPIMS) under varying substrate bias voltages (0 V to −75 V).
Juan Pablo González, Ingrid González, Oscar Piamba, Jhon Olaya, Leonardo Velasco, Gilberto Bejarano   +5 more
doaj   +1 more source

The HiPIMS Process

, 2010
The work presented in this thesis involves experimental and theoretical studies related to a thin film deposition technique called high power impulse magnetron sputtering (HiPIMS), and more specifically the plasma properties and how they influence the coating. HiPIMS is an ionized physical vapor deposition technique based on conventional direct current
openaire   +1 more source

On tailoring structural and optoelectronic properties of TiO2 thin films synthesized via ‘room’ temperature high power impulse magnetron sputtering (HiPIMS)

JPhys Energy
Titanium dioxide (TiO _2 ) is a key material in optoelectronic and energy conversion technologies, including solar cells and photocatalysis. However, integrating TiO _2 into flexible or temperature-sensitive devices requires deposition techniques that ...
Aarati Chacko, Erwin Hack, Sebastian Lohde, Robin Bucher, Oğuz Yildirim, Arnold Müller, Michel Calame, Hans J Hug, Mirjana Dimitrievska   +8 more
doaj   +1 more source