Results 81 to 90 of about 2,236 (212)

On selective ion acceleration in bipolar HiPIMS: A case study of (Al,Cr)2O3 film growth

, 2023
Selective ion acceleration using a synchronized substrate bias is a common way to tailor the microstructure and intrinsic stress of films grown by high-power impulse magnetron sputtering (HiPIMS), owing to the high degree of sputtered metal ionization ...
Zanaska, Michal, Ulf Helmersson, Helmersson, Ulf, Daniel Lundin, Du, Hao, Lundin, Daniel, Hao Du, Michal Zanáška   +7 more
core   +1 more source

Comparison of plasma parameters and optical emission in DC, HIPIMS and hybrid DC+HIPIMS modes of magnetron sputtering

Journal of Physics: Conference Series, 2019
Abstract Experimental studies of the parameters of the plasma of a magnetron discharge and optical radiation from plasma in the regime of direct current (DC), high-current mode (HIPIMS), and hybrid (DC+HIPIMS) mode for a copper cathode 100 mm in diameter were carried out.
V A Semenov, A S Grenadyorov, V O Oskirko, A N Zakharov, S V Rabotkin, I V Ionov, A A Solovyev   +6 more
openaire   +1 more source

Laterally Modulating Carrier Concentration by Ion Irradiation in CdO Thin Films for Mid‐IR Plasmonics

Advanced Optical Materials, Volume 12, Issue 30, October 24, 2024.
Ion irradiation through a patterned photoresist mask enables in‐plane control of transport and optical properties in CdO thin films. This proof‐of‐concept demonstrates a simple grating pattern of alternating high and low carrier concentrations (irradiated and non‐irradiated) which exhibit sharp optical contrast in the near‐field and surface plasmon ...
Angela J. Cleri, Mingze He, Maxwell J. Tolchin, Christopher Gubbin, Eric Lang, Khalid Hattar, Simone De Liberato, Joshua D. Caldwell, Jon‐Paul Maria   +8 more
wiley   +1 more source

Modelling of target effects in reactive HIPIMS

, 2011
In reactive HIgh Power Impulse Magnetron Sputtering (HIPIMS) of oxides, target effects such as reduced surface oxidation during pulse off time, increased implantation of reactive gas due to the higher discharge voltage as compared to normal DC sputtering,
Andersson, Joakim,, Kubart, Tomas,
core  

International Conference on Fundamentals and Applications of HIPIMS

IOP Conference Series: Materials Science and Engineering, 2012
Thin film technology and surface engineering are nowadays key components for numerous innovative products like efficient windows, flat screens, sensors or hard coatings used in tool coating and automotive applications, as well as products for everyday life.
Arutiun Ehiasarian, Ralf Bandorf
openaire   +1 more source

Ferroelectric AlScN thin films with enhanced polarization and low leakage enabled by high-power impulse magnetron sputtering

APL Materials
The demand for efficient data processing motivates a shift toward in-memory computing architectures. Ferroelectric materials, particularly AlScN, show great promise for next-generation memory devices.
Federica Messi, Jyotish Patidar, Nathan Rodkey, Christoph W. Dräyer, Morgan Trassin, Sebastian Siol   +5 more
doaj   +1 more source

Experimental Verification of BP-HiPIMS Thrusters

, 2020
The ion acceleration process in Bipolar High Power Impulse Magnetron Sputteringis investigated for use in a novel space propulsion system - the BP-HiPIMS thruster.The interest for BP-HiPIMS has recently been growing within the area of thin filmdeposition
Mainwaring, David
core  

Corrosion behaviour in liquid lead of pristine and irradiated FeCrAlNi coatings deposited by HiPIMS

Materials & Design
FeCrAlNi coatings with controlled morphology, microstructure, composition and adhesion were developed using High Power Impulse Magnetron Sputtering (HiPIMS) to improve the performance and durability of steels exposed to Lead-cooled Fast Reactor (LFR ...
M.S. Galli De Magistris, D. Vavassori, D. Dellasega, V. Russo, M. Salvi, N. Lecis, A. Smith, A. Milston, M. O’Leary, S. de Moraes Shubeita, F. Currell, M. Passoni, F. García Ferré   +12 more
doaj   +1 more source

HiPIMS magnetized plasma afterglow diagnostic

, 2019
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it is desirable to know the lifetime of the magnetized plasma at the end of the pulsed cathode current.
Ganciu, Mihai, Butoi, Bogdan, Groza, Andreea, Mihalcea, Bogdan   +3 more
openaire   +2 more sources

Fabrication of gallium nitride waveguide resonators by high-power impulse magnetron sputtering at room temperature

APL Photonics
In this work, we demonstrate gallium nitride (GaN) waveguide resonators by sputtering amorphous GaN films on the silicon-based substrate. With the aid of high-power impulse magnetron sputtering (HiPIMS), high-quality, high-deposition-rate, and high ...
Shih-Hsin Wu, Zhi-Guang Chen, Hung-Sheng Liu, Sheng-Hui Chen, Pei-Hsun Wang   +4 more
doaj   +1 more source