Results 91 to 100 of about 2,236 (212)
In this study, the amorphous carbon (a-C) films were deposited using HiPIMS and DCMS at same average power. The composition, microstructure and the anti-tribocorrosion property at hydrostatic pressure environment were investigated in detail.
Yingrui Liu +7 more
doaj +1 more source
Fundamental aspects of HiPIMS under industrial conditions
Fundamental aspects of the high power impulse magnetron sputtering (HiPIMS) process and its implication for film growth under industrial conditions have been studied.
Samuelsson, Mattias
core
Non-reactive HiPIMS deposition of NbC coatings
The structural and mechanical properties of NbC films are known to be highly influenced by the carbon content determined by the C/Me ratio and the morphology.
Primetzhofer, Daniel; orcid: +10 more
core
HiPIMS Ion Energy Distribution Measurements in Reactive Mode
International audienceIn this paper, mass spectrometry was used to measure the ion energy distributions of the main species during the sputtering of an aluminum target in a reactive Ar + N2 mixture.
Tricot, Sylvain +5 more
core +1 more source
Film optimization using high power impulse magnetron sputtering (HiPIMS) currently faces challenges in process control, primarily due to its reliance on empirical trial-and-error adjustment of the macroscopic parameters as well as the insufficient ...
Xingguang Liu +5 more
doaj +1 more source
Coating of tools by the PVD HiPIMS technology
This bachelor’s thesis is aimed on the study of PVD coatings of tools with a focus on HiPIMS (High Power Impulse Magnetron Sputtering) technology. As part of the research, the PVD coating methods are presented, then the basic physical processes and ...
Havlíková, Tereza
core
Titanium aluminum nitride sputtered by HIPIMS
TiAlN was sputtered reactively by HIPIMS in the target compositions Ti/Al 33/67 and 50/50 using a modified OC Oerlikon Balzers INNOVA coating equipment. The resulting film properties like deposition rate, surface roughness, hardness, Young's modulus, wear, and film stress were analyzed as function of the nitrogen gas flow, pressure, target-substrate ...
Juergen Weichart, Markus Lechthaler
openaire +1 more source
Chapter 2: fundamentals and applications of HIPIMS
High Power Impulse Magnetron Sputtering (HIPIMS) has been introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of 3 kWcm-2 on the target.
Ehiasarian, Arutiun
core
Ti1-xAlxBy films (0.40 ≤ x ≤ 0.76, and 1.81 ≤ y ≤ 2.03) combining good mechanical properties and high-temperature oxidation resistance are demonstrated.
B. Wicher +7 more
doaj +1 more source
Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse
Muhammad Taha Sultan +7 more
doaj +1 more source

