Results 111 to 120 of about 5,443 (237)

HiPIMS magnetized plasma afterglow diagnostic

, 2019
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it is desirable to know the lifetime of the magnetized plasma at the end of the pulsed cathode current.
Ganciu, Mihai, Butoi, Bogdan, Groza, Andreea, Mihalcea, Bogdan   +3 more
openaire   +2 more sources

Fabrication of gallium nitride waveguide resonators by high-power impulse magnetron sputtering at room temperature

APL Photonics
In this work, we demonstrate gallium nitride (GaN) waveguide resonators by sputtering amorphous GaN films on the silicon-based substrate. With the aid of high-power impulse magnetron sputtering (HiPIMS), high-quality, high-deposition-rate, and high ...
Shih-Hsin Wu, Zhi-Guang Chen, Hung-Sheng Liu, Sheng-Hui Chen, Pei-Hsun Wang   +4 more
doaj   +1 more source

Properties of TiAlCN/VCN nanoscale multilayer coatings deposited by mixed high-power impulse magnetron sputtering (HiPIMS) and unbalanced magnetron sputtering processes - impact of HiPIMS during coating

, 2010
Nanoscale multilayer TiAlCN/VCN coating has been deposited by pure unbalanced magnetron sputtering (UBM) and high-power impulse magnetron sputtering (HiPIMS)–UBM techniques. The V+ HiPIMS etching used in both processes has shown excellent adhesion (Lc >
A. P. Ehiasarian, Kamath, G., Hovsepian, P., G. Kamath, Ehiasarian, A. P., P. Eh. Hovsepian   +5 more
core   +2 more sources

Tailoring Microstructure and Properties of Nitride Films: Manipulating Bombardment via Regulating Me⁺/Me²⁺ Ratios

Nanomaterials
Film optimization using high power impulse magnetron sputtering (HiPIMS) currently faces challenges in process control, primarily due to its reliance on empirical trial-and-error adjustment of the macroscopic parameters as well as the insufficient ...
Xingguang Liu, Xin Zhao, Zheng Shu, Yansong Liu, Binhua Gui, Jun Zheng   +5 more
doaj   +1 more source

Superhard oxidation-resistant Ti1-xAlxBy thin films grown by hybrid HiPIMS/DCMS co-sputtering diboride targets without external substrate heating

Materials & Design
Ti1-xAlxBy films (0.40 ≤ x ≤ 0.76, and 1.81 ≤ y ≤ 2.03) combining good mechanical properties and high-temperature oxidation resistance are demonstrated.
B. Wicher, O.V. Pshyk, X. Li, B. Bakhit, V. Rogoz, I. Petrov, L. Hultman, G. Greczynski   +7 more
doaj   +1 more source

Fabrication and characterization of Si1−xGex nanocrystals in as-grown and annealed structures: a comparative study

Beilstein Journal of Nanotechnology, 2019
Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse
Muhammad Taha Sultan, Adrian Valentin Maraloiu, Ionel Stavarache, Jón Tómas Gudmundsson, Andrei Manolescu, Valentin Serban Teodorescu, Magdalena Lidia Ciurea, Halldór Gudfinnur Svavarsson   +7 more
doaj   +1 more source

Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System

, 2020
A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFexOy thin films
Martin Zlámal, Zdenek Hubička, Josef Krýsa, Martin Čada, Drahoslav Tvarog, Jiri Olejníček   +5 more
core   +1 more source

The Effect of Substrate Bias Voltage on the Mechanical and Tribological Properties of (TiAlZrTaNb)N_x High-Entropy Nitride Coatings

Journal of Manufacturing and Materials Processing
We investigate TiAlZrTaNb nitride coatings deposited on Haynes 282 nickel superalloy substrates via high-power impulse magnetron sputtering (HiPIMS) under varying substrate bias voltages (0 V to −75 V).
Juan Pablo González, Ingrid González, Oscar Piamba, Jhon Olaya, Leonardo Velasco, Gilberto Bejarano   +5 more
doaj   +1 more source

Fundamental surface processes in HiPIMS plasmas

, 2021
Die Oberflächen verschiedener (Komposit-) Targets wurden nach dem Zerstäuben (Sputtern) in einer High Power Impulse Magnetron Sputtering (HiPIMS)-Entladung mittels Röntgen-Photoelektronenspektroskopie (XPS) in-vacuo charakterisiert.
Layes, Vincent (M. Sc.)
core  

Effect of hydrogen incorporation on the mechanical properties of DLC films deposited by HiPIMS in DOMS mode

Surface & Coatings Technology, 2023
A. Costa, F. Ferreira, J. L. Colaux, A. Vahidi, R. Serra, J. Oliveira   +5 more
semanticscholar   +1 more source