Results 111 to 120 of about 2,236 (212)

Preparation and tribological properties of WS2 solid lubricating coating with dense structure using HiPIMS

Journal of Materials Research and Technology
In this study, a dense WS2 coating was deposited via high-power impulse magnetron sputtering (HiPIMS) after solving the glow discharge problem, and it was compared with WS2 coating deposited via radio frequency (RF) sputtering.
Puyou Ying, Hanying Sun, Ping Zhang, Changhong Lin, Tao Yang, Jianbo Wu, Min Huang, Tianle Wang, Zhibiao Lian, Vladimir Levchenko   +9 more
doaj   +1 more source

Reactive HiPIMS of Oxides: Hysteresis and Discharge behaviour

, 2014
In High Power Impulse Magnetron Sputtering (HiPIMS), high degree of ionization of the sputtered material is achieved thanks to the high instantaneous peak powers and thus high plasma densities. HiPIMS is therefore beneficial for deposition of dense films,
Helmersson, Ulf,, Kubart, Tomas,, Lundin, Daniel   +2 more
core  

Pressure Effects on HiPIMS Deposition of Hafnium Films

, 2012
High power impulse magnetron sputtering (HiPIMS) was studied during the growth of hafnium films at argon pressures ranging from 0.80 to 5.33 Pa with a fixed pulse length (50 μs) and frequency (200 Hz).
Voevodin, Andrey A., Bultman, John E., Reed, Amber N., Jones, John G., Muratore, Christopher, Lange, Matthew A.   +5 more
core   +1 more source

The development of electrical plasma diagnostics for HiPIMS discharges

High power impulse magnetron sputtering (HiPIMS) is a plasma-based thin film deposition technique in which extremely high power pulses are applied to a conventional magnetron sputtering source.
Poolcharuansin, Phitsanu
core   +1 more source

ZnSnN2 films deposited by HiPIMS, role of process parameters

LAUREA MAGISTRALEAl giorno d’oggi, la ricerca di energia pulita, economica e semplice da produrre è molto richiesta. Un sistema che soddisfa questi requisiti è rappresentato dalle celle fotovoltaiche, in particolare dalle celle tandem.
BARBAGALLO, LORENZO
core  

HiPIMS-based Novel Deposition Processes for Thin Films

, 2012
In this research, high power impulse magnetron sputtering (HiPIMS) based new deposition processes are introduced to address; the issue of low degree of ionization of C in magnetron sputtering discharges, and the difficulty encountered in thin film ...
Aijaz, Asim
core  

Comparison of CrN Coatings Prepared Using High-Power Impulse Magnetron Sputtering and Direct Current Magnetron Sputtering. [PDF]

Materials (Basel), 2023
Bai H, Li J, Gao J, Ni J, Bai Y, Jian J, Zhao L, Bai B, Cai Z, He J, Chen H, Leng X, Liu X.   +12 more
europepmc   +1 more source

Fundamental aspects of HiPIMS under industrial conditions [Elektronisk resurs]

, 2012
Fundamental aspects of the high power impulse magnetron sputtering (HiPIMS) process and its implication for film growth under industrial conditions have been studied.
Samuelsson, Mattias,, Högberg, Hans,, Helmersson, Ulf,, Patscheider, Jörg,, Joelsson, Torbjörn,, Wälivaara, Bengt,   +5 more
core  

On unipolar and bipolar HiPIMS pulse configurations to enhance energy flux to insulating surfaces

High-power impulse magnetron sputtering (HiPIMS) delivers a high target power in short pulses, enhancing the ionization and energy of sputtered atoms and thus providing more possibilities to control the film properties.
Tölg, T., Farahani, M., Čapek, J., Pajdarová, A. D., Kozák, T.   +4 more
core   +1 more source

Assessment of HIPIMS-Deposited TiN Nanostructured Thin Films as Hydrogen Permeation Barriers on Carbon Steel. [PDF]

Materials (Basel)
González-Durán R, Rodríguez-Prieto A, Camacho AM.   +2 more
europepmc   +1 more source