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Deposition of 3YSZ-TiC PVD Coatings with High-Power Impulse Magnetron Sputtering (HiPIMS) [PDF]
Applied Sciences, 2021 Optimized coating adhesion and strength are the advantages of high-power impulse magnetron sputtering (HiPIMS) as an innovative physical vapor deposition (PVD) process.
Bastian Gaedike +4 more
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A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) [PDF]
Surface and Coatings Technology, 2014 High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition.
André Anders
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Recent progress on high power impulse magnetron sputtering (HiPIMS): The challenges and applications in fabricating VO2 thin film [PDF]
AIP Advances, 2019 High power impulse magnetron sputtering (HiPIMS) is well known in modern physical vapor deposition (PVD) owing to its high peak power density, high degree of ionization, high plasma density and hence high ion flux towards the substrate that allows ones ...
Haibao Zhang +2 more
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Materials, 2023 We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B2 coatings prepared by the high-power impulse magnetron sputtering technique. We evaluated the influence of pulse duration and substrate bias on the properties of (W,Ta)B2 films.
Piotr Denis +2 more
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Nanomaterials, 2022 High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films.
Yin-Hung Chen +6 more
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Microstructure and Properties of the Cr–Si–N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering (HiPIMS) and Pulsed DC Magnetron Sputtering [PDF]
Acta Metallurgica Sinica (English Letters), 2017 The Cr–Si–N coatings were prepared by combining system of high-power impulse magnetron sputtering and pulsed DC magnetron sputtering. The Si content in the coating was adjusted by changing the sputtering power of the Si target. By virtue of electron-probe microanalysis, X-ray diffraction analysis and scanning electron microscopy, the influence of the ...
Kwang Ho Kim, Yu Dong, Tiegang Wang
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Applied Surface ScienceThe integration of silver thin films into optoelectronic devices has gained much interest due to their exceptional properties in terms of conductivity and compatibility with flexible substrates. For this type of application, ultra-thin layers are desirable, because of their optical transparency.
Ralf Bandorf +2 more
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Nanomaterials, 2023 Solar light is a renewable source of energy that can be used and transformed into electricity using clean energy technology. In this study, we used direct current magnetron sputtering (DCMS) to sputter p-type cuprous oxide (Cu2O) films with different ...
Tung-Han Chuang +6 more
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Research Progress of TiCN, TiAlN and TiAlCN Coatings [PDF]
Cailiao Baohu, 2023 Hard coatings such as TiAlCN can improve the surface hardness， wear resistance and corrosion resistance of metal workpieces，thereby effectively improving the precision and service life of cutting tools， abrasive tools and auto parts in service under high-
WU Yong, YANG Hanzhe, SUN Qingyun, CHEN Hui, XIA Siyao
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AIP Advances, 2021 The thrusts induced by the 45-mm-diameter DC and high power impulse magnetron sputtering [DC magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS)] sources are assessed by using the pendulum thrust balance, where the ...
Kazunori Takahashi, Hidemasa Miura
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