Mechanical and Thermal Properties of W-Ta-B Coatings Deposited by High-Power Impulse Magnetron Sputtering (HiPIMS). [PDF]
Materials (Basel), 2023 We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B2 coatings prepared by the high-power impulse magnetron sputtering technique. We evaluated the influence of pulse duration and substrate bias on the properties of (W,Ta)B2 films.
Psiuk R +7 more
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Recent progress on high power impulse magnetron sputtering (HiPIMS): The challenges and applications in fabricating VO2 thin film [PDF]
AIP Advances, 2019 High power impulse magnetron sputtering (HiPIMS) is well known in modern physical vapor deposition (PVD) owing to its high peak power density, high degree of ionization, high plasma density and hence high ion flux towards the substrate that allows ones ...
Haibao Zhang +2 more
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Deposition of 3YSZ-TiC PVD Coatings with High-Power Impulse Magnetron Sputtering (HiPIMS) [PDF]
Applied Sciences, 2021 Optimized coating adhesion and strength are the advantages of high-power impulse magnetron sputtering (HiPIMS) as an innovative physical vapor deposition (PVD) process.
Bastian Gaedike +4 more
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Highly Stable and Enhanced Performance of p–i–n Perovskite Solar Cells via Cuprous Oxide Hole-Transport Layers [PDF]
Nanomaterials, 2023 Solar light is a renewable source of energy that can be used and transformed into electricity using clean energy technology. In this study, we used direct current magnetron sputtering (DCMS) to sputter p-type cuprous oxide (Cu2O) films with different ...
Tung-Han Chuang +6 more
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A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) [PDF]
Surface and Coatings Technology, 2014 High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition.
André Anders
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Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) [PDF]
Journal of Applied Physics, 2017 High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized.
André Anders, Anders André
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Low temperature deposition of functional thin films on insulating substrates enabled by selective ion acceleration using synchronized floating potential HiPIMS [PDF]
Nature CommunicationsIonized physical vapor deposition techniques, such as high-power impulse magnetron sputtering (HiPIMS), are gaining popularity but face challenges for deposition on insulating materials, where applying negative potentials for ion acceleration is ...
Jyotish Patidar +4 more
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Titanium Nitride Coatings on CoCrMo and Ti6Al4V Alloys: Effects on Wear and Ion Release [PDF]
LubricantsWhile titanium nitride (TiN) coatings are well known for their biocompatibility and excellent mechanical properties, their wear particle and debris release in orthopedic implants remains a matter of active investigation. This study addresses the efficacy
Mohammed AbuAlia +4 more
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Applied Surface ScienceThe integration of silver thin films into optoelectronic devices has gained much interest due to their exceptional properties in terms of conductivity and compatibility with flexible substrates. For this type of application, ultra-thin layers are desirable, because of their optical transparency.
KRISTIAN A Reck +2 more
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The Enhanced Performance of Oxide Thin-Film Transistors Fabricated by a Two-Step Deposition Pressure Process [PDF]
NanomaterialsIt is usually difficult to realize high mobility together with a low threshold voltage and good stability for amorphous oxide thin-film transistors (TFTs).
Mingjie Zhao +10 more
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