Results 41 to 50 of about 192 (126)
The average oxidation state of V in AlCrVY(O)N thin films deposited by a hybrid dcMS/HiPIMS method with different O2 flow rates is investigated. X‐ray near‐edge absorption spectroscopy is used to determine the average oxidation states after annealing up to 925 °C.
Eric Schneider +8 more
wiley +1 more source
Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process
We report on a new route to grow epitaxial copper (Cu) ultra-thin films (up to 150 nm thick) at ambient temperature on Si(001) wafers covered with native oxide without any prior chemical etching or plasma cleaning of the substrate.
Felipe Cemin +6 more
doaj +1 more source
Invasive and non-invasive diagnostics of High Power Impulse Magnetron Sputtering (HiPIMS) discharges [PDF]
HiPIMS discharges operated with a titanium and an aluminium-doped zinc target sputtered with the working gas argon were investigated by means of optical 2d-imaging in combination with Abel-inversion. By using optical bandpass filters, the spatial and temporal evolution of the plasma-induced emission of argon atoms and ions and metal atoms and ions were
openaire +1 more source
This work presents CoCrFeNi and MnCrFeNi thin films, synthesized by physical vapor deposition as bifunctional oxygen electrocatalysts that are corrosion‐resistant in alkaline conditions. After a detailed study of the film structure, the films are tested for oxygen catalysis and are active toward both oxygen evolution reaction (OER) and oxygen reduction
Clara Linder +7 more
wiley +1 more source
In-situ evolution and aging of ultrathin sputter deposited silver films
Silver (Ag) thin films deposited by magnetron sputtering are widely utilized in optics, antimicrobial coatings, and flexible organic electronics. However, the inherent three-dimensional (3D) island growth of Ag complicates the fabrication of ultrathin ...
Kristian A. Reck +10 more
doaj +1 more source
Titania and doped-titania coatings can be deposited by a wide range of techniques; this paper will concentrate on magnetron sputtering techniques, including “conventional” reactive co-sputtering from multiple metal targets and the recently introduced ...
Peter J. Kelly +5 more
doaj +1 more source
Bipolar HiPIMS kick‐pulse for high hardness in high‐entropy boride thin films
Abstract We report a microhardness indentation study for multicomponent refractory metal boride thin films that belong to the family of high‐entropy ceramics exhibiting superior hardness and high temperature properties. We focus on the nominally equimolar composition (Ti0.2Zr0.2Hf0.2Nb0.2Ta0.2)B2, which we refer to as HEB3, on c‐plane sapphire ...
Nathaniel S. McIlwaine +7 more
wiley +1 more source
This work presents CoCrFeNi thin films, synthesized by physical vapor deposition as bifunctional oxygen electrocatalysts that are corrosion resistant in alkaline conditions. The film microstructure is tuned by ion acceleration (substrate bias) during deposition and the film's surfaces are oxidized electrochemically by anodization.
Clara Linder +7 more
wiley +1 more source
Dense WS2 thin films with excellent self-lubricating properties have been prepared using high-power impulse magnetron sputtering (HiPIMS) successfully.
Jianjian Yu +9 more
doaj +1 more source
Many strategies have been developed for the synthesis of silicon carbide (SiC) thin films on silicon (Si) substrates by plasma-based deposition techniques, especially plasma enhanced chemical vapor deposition (PECVD) and magnetron sputtering, due to the ...
Nierlly Galvão +9 more
doaj +1 more source

