Results 51 to 60 of about 1,559 (206)
Electron dynamics in high power impulse magnetron sputtering discharges
, 2019 Electrons are the main energy carriers in HiPIMS discharges and their properties govern the ionization processes and thus the discharge properties. The properties of the electrons are described by the fundamental plasma parameters, such as the electron ...
Čada, M. +5 more
core +1 more source
Invasive and non-invasive diagnostics of High Power Impulse Magnetron Sputtering (HiPIMS) discharges [PDF]
, 2013 HiPIMS discharges operated with a titanium and an aluminium-doped zinc target sputtered with the working gas argon were investigated by means of optical 2d-imaging in combination with Abel-inversion. By using optical bandpass filters, the spatial and temporal evolution of the plasma-induced emission of argon atoms and ions and metal atoms and ions were
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Microstructure and Properties of the Cr–Si–N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering (HiPIMS) and Pulsed DC Magnetron Sputtering [PDF]
Acta Metallurgica Sinica (English Letters), 2017 The Cr–Si–N coatings were prepared by combining system of high-power impulse magnetron sputtering and pulsed DC magnetron sputtering. The Si content in the coating was adjusted by changing the sputtering power of the Si target. By virtue of electron-probe microanalysis, X-ray diffraction analysis and scanning electron microscopy, the influence of the ...
Tie-Gang Wang +5 more
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physica status solidi (a), Volume 222, Issue 14, July 2025.The average oxidation state of V in AlCrVY(O)N thin films deposited by a hybrid dcMS/HiPIMS method with different O2 flow rates is investigated. X‐ray near‐edge absorption spectroscopy is used to determine the average oxidation states after annealing up to 925 °C.
Eric Schneider +8 more
wiley +1 more source
Advanced Sustainable Systems, Volume 9, Issue 3, March 2025.This work presents CoCrFeNi and MnCrFeNi thin films, synthesized by physical vapor deposition as bifunctional oxygen electrocatalysts that are corrosion‐resistant in alkaline conditions. After a detailed study of the film structure, the films are tested for oxygen catalysis and are active toward both oxygen evolution reaction (OER) and oxygen reduction
Clara Linder +7 more
wiley +1 more source
Reactive sputter deposition of alumina coatings
, 2022 Art. 012009, 7 S.Highly ionized pulse plasma processes (HIPP processes) like High Power Impulse Magnetron Sputtering HIPIMS and Modulated Pulse Power MPP have matured in recent years.
Bandorf, R. +3 more
core +1 more source
Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process
Scientific Reports, 2017 We report on a new route to grow epitaxial copper (Cu) ultra-thin films (up to 150 nm thick) at ambient temperature on Si(001) wafers covered with native oxide without any prior chemical etching or plasma cleaning of the substrate.
Felipe Cemin +6 more
doaj +1 more source
Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges [PDF]
, 2014 Reactive HiPIMS discharges have been investigated by employing a selection of plasma diagnostic techniques. Plasma dynamics in a reactive HiPIMS discharge were studied by means of a single Langmuir probe which revealed electron and positive ion densities of the order of 10^17 to 10^18 m^-3 in typical substrate positions, the temporal evolutions of ...
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Bipolar HiPIMS kick‐pulse for high hardness in high‐entropy boride thin films
Journal of the American Ceramic Society, Volume 108, Issue 3, March 2025.Abstract We report a microhardness indentation study for multicomponent refractory metal boride thin films that belong to the family of high‐entropy ceramics exhibiting superior hardness and high temperature properties. We focus on the nominally equimolar composition (Ti0.2Zr0.2Hf0.2Nb0.2Ta0.2)B2, which we refer to as HEB3, on c‐plane sapphire ...
Nathaniel S. McIlwaine +7 more
wiley +1 more source
Modeling the high power impulse magnetron sputtering discharge
, 2019 Modeling has the possibility to capture the main interacting mechanisms in a plasma discharge, which are typically very difficult to identify (isolate) in experiments. A large variety of computer models describing the plasma behavior in HiPIMS discharges
Gudmundsson, Jon Tomas, +4 more
core +1 more source