Results 51 to 60 of about 18,610,504 (202)
Advanced Materials Interfaces, Volume 13, Issue 4, 17 February 2026.This study investigates the thermochromic properties of VO2 deposited on aluminum doped zinc oxide precoated fused silica with Al2O3, TiO2, and WO3 as interface layers. The results indicate that the metal‐to‐insulator transition is highly influenced by the grains formed at the interface.
Eduard Llorens Balada, Eugen Stamate
wiley +1 more source
Electron dynamics in high power impulse magnetron sputtering discharges
, 2019 Electrons are the main energy carriers in HiPIMS discharges and their properties govern the ionization processes and thus the discharge properties. The properties of the electrons are described by the fundamental plasma parameters, such as the electron ...
Čada, M. +5 more
core +1 more source
Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge
Journal of Physics: Conference Series, 2008 The ionization mechanism and the temporal behavior of the plasma parameters in a high power impulse magnetron sputtering (HiPIMS) discharge are investigated using a time dependent global (volume averaged) model. The metal ion fraction and the ionized flux fraction are shown to be very high, the sputtered metal is almost fully ionized.
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physica status solidi (a), Volume 222, Issue 14, July 2025.The average oxidation state of V in AlCrVY(O)N thin films deposited by a hybrid dcMS/HiPIMS method with different O2 flow rates is investigated. X‐ray near‐edge absorption spectroscopy is used to determine the average oxidation states after annealing up to 925 °C.
Eric Schneider +8 more
wiley +1 more source
, 2022 S.224-228High Power Pulse Magnetron Sputtering (HPPMS), also known as High Power Impulse Magnetron Sputtering (HiPIMS) is a novel pulse plasma technology for coating applications.
Vergöhl, M. +3 more
core +1 more source
Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process
Scientific Reports, 2017 We report on a new route to grow epitaxial copper (Cu) ultra-thin films (up to 150 nm thick) at ambient temperature on Si(001) wafers covered with native oxide without any prior chemical etching or plasma cleaning of the substrate.
Felipe Cemin +6 more
doaj +1 more source
Advanced Sustainable Systems, Volume 9, Issue 3, March 2025.This work presents CoCrFeNi and MnCrFeNi thin films, synthesized by physical vapor deposition as bifunctional oxygen electrocatalysts that are corrosion‐resistant in alkaline conditions. After a detailed study of the film structure, the films are tested for oxygen catalysis and are active toward both oxygen evolution reaction (OER) and oxygen reduction
Clara Linder +7 more
wiley +1 more source
In-situ evolution and aging of ultrathin sputter deposited silver films
Applied Surface Science AdvancesSilver (Ag) thin films deposited by magnetron sputtering are widely utilized in optics, antimicrobial coatings, and flexible organic electronics. However, the inherent three-dimensional (3D) island growth of Ag complicates the fabrication of ultrathin ...
Kristian A. Reck +10 more
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Molecules, 2014 Titania and doped-titania coatings can be deposited by a wide range of techniques; this paper will concentrate on magnetron sputtering techniques, including “conventional” reactive co-sputtering from multiple metal targets and the recently introduced ...
Peter J. Kelly +5 more
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Invasive and non-invasive diagnostics of High Power Impulse Magnetron Sputtering (HiPIMS) discharges [PDF]
, 2013 HiPIMS discharges operated with a titanium and an aluminium-doped zinc target sputtered with the working gas argon were investigated by means of optical 2d-imaging in combination with Abel-inversion. By using optical bandpass filters, the spatial and temporal evolution of the plasma-induced emission of argon atoms and ions and metal atoms and ions were
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