Results 31 to 40 of about 18,610,504 (202)

Growth of HfN thin films by reactive high power impulse magnetron sputtering

open access: yesAIP Advances, 2018
Thin hafnium nitride films were grown on SiO2 by reactive high power impulse magnetron sputtering (HiPIMS) and reactive direct current magnetron sputtering (dcMS).
D. Ö. Thorsteinsson, J. T. Gudmundsson
doaj   +1 more source

Room Temperature Deposition of Nanocrystalline SiC Thin Films by DCMS/HiPIMS Co-Sputtering Technique

open access: yesNanomaterials, 2022
Due to an attractive combination of chemical and physical properties, silicon carbide (SiC) thin films are excellent candidates for coatings to be used in harsh environment applications or as protective coatings in heat exchanger applications.
Vasile Tiron   +6 more
doaj   +1 more source

Hardware and power management for high power impulse magnetron sputtering

open access: yes, 2019
The work that led to the development of the HiPIMS technique was initiated at the Moscow Engineering and Physics Institute (MEPhI) in the late 1960s, where high power pulses were applied to diode sputter sources.
Zdeněk Hubička   +7 more
core   +1 more source

Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20

open access: yesAIP Advances, 2019
We investigate the effect of atomic ordering on the magnetic anisotropy of Ni80Fe20 at.% (Py). To this end, Py films were grown epitaxially on MgO(001) using dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS).
Movaffaq Kateb   +2 more
doaj   +1 more source

Reactive high power impulse magnetron sputtering

open access: yes, 2019
Reactive magnetron sputtering is essential in many industrial processes where it is applied to deposit compound films or coatings. Reactive sputtering is attractive because a range of compounds can be prepared from a low-cost metal target by addition of ...
Kubart, T.   +7 more
core   +1 more source

Physics of high power impulse magnetron sputtering discharges

open access: yes, 2019
The most striking difference between HiPIMS and other magnetron sputtering discharges, in terms of the plasma process itself, lies in the high-power discharge pulses applied and the large discharge currents generated.
Brenning, Nils,   +11 more
core   +1 more source

Unprecedented high-temperature electrical insulation of reactively sputtered AlN thin films

open access: yesMaterials & Design
This study investigates the morphological and electrical properties of hexagonal aluminium nitride (h-AlN) films synthesized through different reactive sputtering techniques at low growth temperatures (270 °C) – specifically direct and pulsed current ...
N. Salvadores Farran   +10 more
doaj   +1 more source

Introduction to magnetron sputtering

open access: yes, 2019
Plasma-based physical vapor deposition (PVD) methods have found widespread use in various industrial applications. In plasma-based PVD processes, the deposition species are either vaporized by thermal evaporation or by sputtering from a source (the ...
Gudmundsson, Jon Tomas,   +3 more
core   +1 more source

Direct metallization of polymers: The HiPIMS effect on early thin film growth

open access: yesNano Trends
The metallization of polymers is essential for developing flexible electronics, yet precise control over metal film growth remains challenging. This study demonstrates the effect of high-power impulse magnetron sputtering (HiPIMS) markedly influencing ...
Kristian A. Reck   +10 more
doaj   +1 more source

Fabrication and characterization of Si1−xGex nanocrystals in as-grown and annealed structures: a comparative study

open access: yesBeilstein Journal of Nanotechnology, 2019
Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse
Muhammad Taha Sultan   +7 more
doaj   +1 more source

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