Results 31 to 40 of about 1,559 (206)

Corrosion behaviour of multilayer CrN coatings deposited by hybrid HIPIMS after oxidation treatment

Nanotechnology Reviews, 2020
Chromium nitride coatings prepared by physical vapour deposition (PVD) show high hardness, high strength and good thermal conductivity, which makes them useful for cutting and forming tools. In this article, the microstructure and corrosion resistance of
Yu-Jie Zhu, Jing-Ling Ma, Guang-Xin Wang, Ke-Xing Song, Stock Heinz Rolf   +4 more
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Room Temperature Deposition of Nanocrystalline SiC Thin Films by DCMS/HiPIMS Co-Sputtering Technique

Nanomaterials, 2022
Due to an attractive combination of chemical and physical properties, silicon carbide (SiC) thin films are excellent candidates for coatings to be used in harsh environment applications or as protective coatings in heat exchanger applications.
Vasile Tiron, Elena-Laura Ursu, Daniel Cristea, Georgiana Bulai, George Stoian, Teodora Matei, Ioana-Laura Velicu   +6 more
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Growth of HfN thin films by reactive high power impulse magnetron sputtering

AIP Advances, 2018
Thin hafnium nitride films were grown on SiO2 by reactive high power impulse magnetron sputtering (HiPIMS) and reactive direct current magnetron sputtering (dcMS).
D. Ö. Thorsteinsson, J. T. Gudmundsson
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Hardware and power management for high power impulse magnetron sputtering

, 2019
The work that led to the development of the HiPIMS technique was initiated at the Moscow Engineering and Physics Institute (MEPhI) in the late 1960s, where high power pulses were applied to diode sputter sources.
Zdeněk Hubička, Gudmundsson, Jon Tomas,, Jon Tomas Gudmundsson, Lundin, D., Hubička, Z., Daniel Lundin, Petter Larsson, Larsson, P.   +7 more
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Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20

AIP Advances, 2019
We investigate the effect of atomic ordering on the magnetic anisotropy of Ni80Fe20 at.% (Py). To this end, Py films were grown epitaxially on MgO(001) using dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS).
Movaffaq Kateb, Jon Tomas Gudmundsson, Snorri Ingvarsson   +2 more
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Reactive high power impulse magnetron sputtering

, 2019
Reactive magnetron sputtering is essential in many industrial processes where it is applied to deposit compound films or coatings. Reactive sputtering is attractive because a range of compounds can be prepared from a low-cost metal target by addition of ...
Kubart, T., Gudmundsson, Jon Tomas,, Tomáš Kubart, Jon Tomas Gudmundsson, Lundin, Daniel,, Lundin, D., Daniel Lundin, Kubart, Tomas,   +7 more
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Physics of high power impulse magnetron sputtering discharges

, 2019
The most striking difference between HiPIMS and other magnetron sputtering discharges, in terms of the plasma process itself, lies in the high-power discharge pulses applied and the large discharge currents generated.
Brenning, Nils,, Nils Brenning, Gudmundsson, Jon Tomas,, Jon Tomas Gudmundsson, Lundin, D., Hecimovic, A., Daniel Lundin, Anders, A., André Anders, Tiberiu Minea, Ante Hecimovic, Minea, T.   +11 more
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Unprecedented high-temperature electrical insulation of reactively sputtered AlN thin films

Materials & Design
This study investigates the morphological and electrical properties of hexagonal aluminium nitride (h-AlN) films synthesized through different reactive sputtering techniques at low growth temperatures (270 °C) – specifically direct and pulsed current ...
N. Salvadores Farran, T.M. Huber, T. Wojcik, A. Gies, J. Ramm, S. Kolozsvári, P. Polcik, M. Stöger-Pollach, J. Rath, J. Fleig, H. Riedl   +10 more
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Introduction to magnetron sputtering

, 2019
Plasma-based physical vapor deposition (PVD) methods have found widespread use in various industrial applications. In plasma-based PVD processes, the deposition species are either vaporized by thermal evaporation or by sputtering from a source (the ...
Gudmundsson, Jon Tomas,, Jon Tomas Gudmundsson, Lundin, D., Daniel Lundin   +3 more
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Direct metallization of polymers: The HiPIMS effect on early thin film growth

Nano Trends
The metallization of polymers is essential for developing flexible electronics, yet precise control over metal film growth remains challenging. This study demonstrates the effect of high-power impulse magnetron sputtering (HiPIMS) markedly influencing ...
Kristian A. Reck, Yusuf Bulut, Stefan Schröder, Ruoxuan Qi, Xiaojing Ci, Thomas Strunskus, Peter Müller-Buschbaum, Stephan V. Roth, Tayebeh Ameri, Alexander Vahl, Franz Faupel   +10 more
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