Results 21 to 30 of about 1,559 (206)
Pulse Magnetron Sputtering with high power density-an attempt at a critical evaluation
, 2022 Art. 012007In this paper specific advantages and disadvantages of different pulse magnetron sputtering processes (unipolar, bipolar and HIPIMS) as well as current and potential fields of application will be discussed.
Klostermann, H. +5 more
core +1 more source
AIP Advances, 2021 The high power impulse magnetron sputtering (HiPIMS) technique has recently been improved experimentally to deposit titanium films with several short micro-pulses that are decomposed from one single pulse.
Chunqing Huo +4 more
doaj +1 more source
Picosecond Time‐Scale Resistive Switching Monitored in Real‐Time
Advanced Electronic Materials, Volume 9, Issue 6, June 2023., 2023 Resistive switching due to 20 ps long voltage pulses is demonstrated in filamentary tantalum‐pentoxide memristors. A time dependent analysis shows that the electric field induced conducting filament formation takes place at the picosecond time‐scale, whereas the reset transition is delayed by 100's of picoseconds after the short reset pulse due to the ...
Miklós Csontos +6 more
wiley +1 more source
Exotic highly ionized pulse plasma processes
, 2022 Art. 012005, 9 S.Highly ionized pulse plasma processes (HIPP processes), like high power impulse magnetron sputtering (HIPIMS) also known as high power pulse magnetron sputtering (HPPMS), modulated pulse power sputtering (MPP), as well as further ...
Bandorf, R., Bräuer, G.
core +1 more source
Nanomaterials, 2022 High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films.
Yin-Hung Chen +6 more
doaj +1 more source
Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)? [PDF]
Journal of Applied Physics, 2017 This paper discusses a few mechanisms that can assist to answer the title question. The initial approach is to use an established model for DC magnetron sputter deposition, i.e., RSD2013. Based on this model, the impact on the hysteresis behaviour of some typical HiPIMS conditions is investigated.
K. Strijckmans, F. Moens, D. Depla
openaire +2 more sources
Enhanced Oxygen-Reaction Electrocatalysis and Corrosion Resistance of CoCrFeNi Thin Films by Tuned Microstructure and Surface Oxidation. [PDF]
Small SciThis work presents CoCrFeNi thin films, synthesized by physical vapor deposition as bifunctional oxygen electrocatalysts that are corrosion resistant in alkaline conditions. The film microstructure is tuned by ion acceleration (substrate bias) during deposition and the film's surfaces are oxidized electrochemically by anodization.
Linder C +7 more
europepmc +2 more sources
Frontiers in Nanotechnology, 2021 Magnetron sputter deposition of metal targets over liquids allows producing colloidal solutions of small metal nanoparticles (NPs) without any additional reducing or stabilizing reagents. Despite that this synthetic approach is known for almost 15 years,
Anastasiya Sergievskaya +6 more
doaj +1 more source
Characterization of SiC thin films deposited by HiPIMS [PDF]
Materials Research, 2014 In this work thin films of silicon carbide (SiC) were deposited on silicon wafers by High Power Impulse Magnetron Sputtering (HiPIMS) technique varying the average power of the discharge on a stoichiometric SiC target.
Gabriela Leal +5 more
doaj +1 more source
Nanomaterials, 2021 In-Sn-Zn oxide (ITZO) nanocomposite films have been investigated extensively as a potential material in thin-film transistors due to their good electrical properties.
Hui Sun +6 more
doaj +1 more source