Results 11 to 20 of about 192 (126)

Nanostructured Thermal Barrier Coatings via Magnetron Sputtering: A Review of Enhanced Performance and Durability

International Journal of Ceramic Engineering & Science
The current review investigates employing magnetron sputtering techniques to create nanostructured thermal barrier coatings (TBCs) manufactured on the nickel‐based superalloy, Superni 718, which is usually used to manufacture turbine parts that lay under
Syed Faizan Altaf, Atikur Rahman, M. F. Wani   +2 more
doaj   +2 more sources

Development of Thin Films Formed by Ti-Zr Alloys at Different Frequencies by the HiPIMS Technique

Materials Research, 2023
In this work, thin films based on the Ti-Zr system were studied, deposited on a silicon substrate by the magnetron sputtering technique using simultaneously a combination of High-Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron ...
C. J. R. Lustosa, J. Stryhalski, R. L. P. Gonçalves, E. Bonturim, O. Florêncio, M. Massi   +5 more
doaj   +1 more source

Tailoring the Hybrid Magnetron Sputtering Process (HiPIMS and dcMS) to Manufacture Ceramic Multilayers: Powering Conditions, Target Materials, and Base Layers

Nanomaterials, 2022
The mechanical and wear behavior of CrN/CrAlN multilayers were improved by tailoring the experimental conditions of a hybrid magnetron sputtering process based on a high-power impulse (HiPIMS) and two direct current magnetron sputtering (dcMS) power ...
Bruno César Noronha Marques de Castilho, Felipe de Sousa Mazuco, Alisson Mendes Rodrigues, Pedro Renato Tavares Avila, Raira Chefer Apolinario, Philipp Daum, Fabiana Pereira da Costa, Romualdo Rodrigues Menezes, Gelmires de Araújo Neves, Christian Greiner, Haroldo Cavalcanti Pinto   +10 more
doaj   +1 more source

HiPIMS co-sputtering for the increase of the mechanical properties of arc deposited TiN coatings

Journal of Materials Research and Technology, 2023
Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with high-power impulse magnetron sputtering (HiPIMS), due to differences in the respective pressure requirements.
Chi-Lung Chang, Kuo-Chun Lo, Fu-Chi Yang, Guan-Lun Shen, Jian-Fu Tang   +4 more
doaj   +1 more source

Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS [PDF]

Materials Research, 2015
In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5,
Abrão Chiaranda Merij, Tarcila Sugahara, Gislene Valdete Martins, Argemiro Soares da Silva Sobrinho, Danieli Aparecida Pereira Reis, Polyana Alves Radi Gonçalves, Marcos Massi   +6 more
doaj   +1 more source

Insight on Photocatalytic and Photoinduced Antimicrobial Properties of ZnO Thin Films Deposited by HiPIMS through Thermal Oxidation

Nanomaterials, 2022
Zinc oxide thin films have been developed through thermal oxidation of Zinc thin films grown by high impulse power magnetron sputtering (HiPIMS). The influence of various sputtering power on thin film structural, morphological, photocatalytic, and ...
Endrika Widyastuti, Jue-Liang Hsu, Ying-Chieh Lee   +2 more
doaj   +1 more source

Simulation results of the gas rarefaction and target ion evolution in a chopped high power impulse magnetron sputtering discharge

AIP Advances, 2021
The high power impulse magnetron sputtering (HiPIMS) technique has recently been improved experimentally to deposit titanium films with several short micro-pulses that are decomposed from one single pulse.
Chunqing Huo, Yingxi Ji, Shijie Xie, Runwei Song, Qiang Chen   +4 more
doaj   +1 more source

Insights on the Formation of Nanoparticles Prepared by Magnetron Sputtering Onto Liquids: Gold Sputtered Onto Castor Oil as a Case Study

Frontiers in Nanotechnology, 2021
Magnetron sputter deposition of metal targets over liquids allows producing colloidal solutions of small metal nanoparticles (NPs) without any additional reducing or stabilizing reagents. Despite that this synthetic approach is known for almost 15 years,
Anastasiya Sergievskaya, Amy O’Reilly, Halima Alem, Julien De Winter, David Cornil, Jérôme Cornil, Stephanos Konstantinidis   +6 more
doaj   +1 more source

Characterization of SiC thin films deposited by HiPIMS [PDF]

Materials Research, 2014
In this work thin films of silicon carbide (SiC) were deposited on silicon wafers by High Power Impulse Magnetron Sputtering (HiPIMS) technique varying the average power of the discharge on a stoichiometric SiC target.
Gabriela Leal, Tiago Moreira Bastos Campos, Argemiro Soares da Silva Sobrinho, Rodrigo Sávio Pessoa, Homero Santiago Maciel, Marcos Massi   +5 more
doaj   +1 more source

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) [PDF]

Journal of Applied Physics, 2017
High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized.
openaire   +3 more sources