Results 11 to 20 of about 18,610,504 (202)
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) [PDF]
Journal of Applied Physics, 2017 High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized.
Anders, André, André Anders
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International Journal of Ceramic Engineering & ScienceThe current review investigates employing magnetron sputtering techniques to create nanostructured thermal barrier coatings (TBCs) manufactured on the nickel‐based superalloy, Superni 718, which is usually used to manufacture turbine parts that lay under
Syed Faizan Altaf +2 more
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The Enhanced Performance of Oxide Thin-Film Transistors Fabricated by a Two-Step Deposition Pressure Process [PDF]
NanomaterialsIt is usually difficult to realize high mobility together with a low threshold voltage and good stability for amorphous oxide thin-film transistors (TFTs).
Mingjie Zhao +10 more
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Research Progress of TiCN, TiAlN and TiAlCN Coatings [PDF]
Cailiao Baohu, 2023 Hard coatings such as TiAlCN can improve the surface hardness， wear resistance and corrosion resistance of metal workpieces，thereby effectively improving the precision and service life of cutting tools， abrasive tools and auto parts in service under high-
WU Yong, YANG Hanzhe, SUN Qingyun, CHEN Hui, XIA Siyao
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AIP Advances, 2021 The thrusts induced by the 45-mm-diameter DC and high power impulse magnetron sputtering [DC magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS)] sources are assessed by using the pendulum thrust balance, where the ...
Kazunori Takahashi, Hidemasa Miura
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Development of Thin Films Formed by Ti-Zr Alloys at Different Frequencies by the HiPIMS Technique
Materials Research, 2023 In this work, thin films based on the Ti-Zr system were studied, deposited on a silicon substrate by the magnetron sputtering technique using simultaneously a combination of High-Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron ...
C. J. R. Lustosa +5 more
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Vapor Deposition Strategies for Copper-Based Electrocatalysts in CO<sub>2</sub> Reduction Applications. [PDF]
ChemSusChemThis review explores the innovative application of vapor deposition techniques such as physical vapor deposition, chemical vapor deposition, and atomic layer deposition for fabricating copper‐based electrocatalysts for CO2 electrochemical reduction. The advent of copper‐based electrocatalysts has significantly advanced the electrochemical conversion of
Manpatilan LR +4 more
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Nanomaterials, 2022 The mechanical and wear behavior of CrN/CrAlN multilayers were improved by tailoring the experimental conditions of a hybrid magnetron sputtering process based on a high-power impulse (HiPIMS) and two direct current magnetron sputtering (dcMS) power ...
Bruno César Noronha Marques de Castilho +10 more
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HiPIMS co-sputtering for the increase of the mechanical properties of arc deposited TiN coatings
Journal of Materials Research and Technology, 2023 Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with high-power impulse magnetron sputtering (HiPIMS), due to differences in the respective pressure requirements.
Chi-Lung Chang +4 more
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Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS [PDF]
Materials Research, 2015 In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5,
Abrão Chiaranda Merij +6 more
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