Results 71 to 80 of about 1,559 (206)
Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce unique ...
Hamidreza Hajihoseini +3 more
doaj +1 more source
This study provides comprehensive materials characterization of niobium (Nb) hydrides formed in Nb thin films as a function of fluoride chemical treatments that are commonly employed in the fabrication of superconducting qubits. This work provides insight into the formation of Nb hydrides and their role in microwave loss, thus guiding ongoing efforts ...
Carlos G. Torres‐Castanedo +20 more
wiley +1 more source
High power impulse magnetron sputtering discharge
The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron target in unipolar pulses at low duty cycle and low repetition frequency while ...
Helmersson, U. +14 more
core +1 more source
In this work, we demonstrate gallium nitride (GaN) waveguide resonators by sputtering amorphous GaN films on the silicon-based substrate. With the aid of high-power impulse magnetron sputtering (HiPIMS), high-quality, high-deposition-rate, and high ...
Shih-Hsin Wu +4 more
doaj +1 more source
The high plasmonic quality of doped CdO is shown to enhance its magneto‐optic response near the epsilon‐near‐zero frequency, leading to a large peak in the Verdet constant that can be tuned throughout the mid‐infrared. The ability to deposit CdO on Si with no loss in performance makes this material a promising platform for integrated mid‐infrared ...
Jonathon R. Schrecengost +10 more
wiley +1 more source
Hysteresis-free reactive high power impulse magnetron sputtering
High power impulse magnetron sputtering (HIPIMS) of an Al target in Ar/O2 mixtures has been studied. The use of HIPIMS is shown to drastically influence the process characteristics compared to conventional sputtering.
Wallin, Erik +3 more
core +1 more source
Reactive DC Sputtered TiO2 Electron Transport Layers for Cadmium‐Free Sb2Se3 Solar Cells
Evolution of Sb2Se3 heterojunction devices away from CdS electron transport layers to wide bandgap metal oxide alternatives is a critical target in the development of this emerging photovoltaic material. The dependence of TiO2 processing conditions on the series resistance of complete Sb2Se3 devices is demonstrated.
Christopher H. Don +11 more
wiley +1 more source
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study [PDF]
-CrN x (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS ...
Grzegorz Greczynski +2 more
core
Discharge Physics of High Power Impulse Magnetron Sputtering [PDF]
High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude.
Anders, Andre, André Anders
core +1 more source
Energy flux measurements in high power impulse magnetron sputtering
The total energy flux in a high power impulse magnetron sputtering (HiPIMS) plasma has been measured using thermal probes. Radial flux (parallel to the magnetron surface) as well as axial flux (perpendicular to the magnetron surface) were measured at ...
Lundin, Daniel, +7 more
core +2 more sources

