Results 91 to 100 of about 192 (126)

Impact of self-sputtering in high power impulse magnetron sputtering (HiPIMS) with helium

Journal of Applied Physics, 2023
Conventional magnetron discharge is a widely used technology for many applications. In the last decade, the high current density sputtering regime has been an interesting alternative for tailoring thin film properties. In this paper, we focused on the electrical characterization of the helium magnetron plasma operated at average gas pressure (5 Pa ...
Erwan Morel, Yoann Rozier, Abderzak El Farsy, Tiberiu Minea   +3 more
openaire   +1 more source

CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering (HIPIMS/UBM) technology

Surface and Coatings Technology, 2009
A P Ehiasarian, P Eh Hovsepian
exaly   +2 more sources

Application of High Power Impulse Magnetron Sputtering (HIPIMS) Technology for Deposition of Protective Coatings

2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE), 2020
The effects of using of the HIPIMS technology for deposition of coatings for various purposes, including CrB, TiAlNiC, and MoHfSiB, are studied. Ceramic targets obtained by self-propagating high-temperature synthesis were used for sputtering. It is shown that the transition from DC to HIPIMS modes increases the structure density, hardness, elastic ...
Philipp Kiryukhantsev-Korneev, Evgeny Levashov   +1 more
openaire   +1 more source

E. coli Inactivation by High-Power Impulse Magnetron Sputtered (HIPIMS) Cu Surfaces

The Journal of Physical Chemistry C, 2011
This study reports HIPIMS-sputtered samples of Cu-particulate films with currents at 6 and 60 amps leading to E. coil inactivation. The Cu coverage and nanoparticle structure of the fibers is reported by TEM. Evidence is presented of redox processes in the Cu taking place during E.
Kusiak-Nejman, E., Morawski, A. W., Ehiasarian, A. P., Pulgarin, C., Baghriche, O., Mielczarski, E., Mielczarski, J., Kulik, A., Kiwi, J.   +8 more
openaire   +2 more sources

Parametric studyoflow frequency rotating structures in high power impulse magnetron sputtering (HIPIMS) discharges

2013 Abstracts IEEE International Conference on Plasma Science (ICOPS), 2013
Summary form only given. HiPIMS discharges are able to produce a high density plasma (peak electron density 1018 - 1020 m-3) by applying large voltages to a target. Electrons are effectively magnetized by a strong magnetic field (100 mT), and exhibit an E x B drift in the azimuthal direction in the plane of the target.
Sara Gallian, Thomas Mussenbrock, Ralf-Peter Brinkmann, William N. G. Hitchon   +3 more
openaire   +1 more source

Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films

2014 IEEE 40th Photovoltaic Specialist Conference (PVSC), 2014
CuIn 1−x Ga x Se 2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic ...
Jiri Olejnicek, Zdenek Hubicka, Michal Kohout, Petra Ksirova, Michaela Brunclikova, Stepan Kment, Martin Cada, Scott A. Darveau, Christopher L. Exstrom   +8 more
openaire   +1 more source

Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS)

Journal of Physics D: Applied Physics, 2013
ZnO films have been reactively deposited on sapphire substrates at 300 °C using a high impulse power magnetron sputtering deposition system and characterized structurally, optically and electronically. The unintentionally doped n-type ZnO films exhibit high transparency, moderate carrier concentration (∼5 × 1018 cm−3) and a Hall mobility of 8.0 cm2 V−1 
J G Partridge, E L H Mayes, N L McDougall, M M M Bilek, D G McCulloch   +4 more
openaire   +1 more source

Effect of the Degree of High Power Impulse Magnetron Sputtering (HIPIMS) Utilisation on the Corrosion Properties of TiN Films

Annual Technical Conference Proceedings, 2013
TiN coatings were deposited by conventional dc unbalanced magnetron (UBM) sputtering, combined High Power Impulse Magnetron Sputtering (HIPIMS)/UBM and pure HIPIMS sources in an industrial size 4 cathode magnetron sputtering machine with a bias of -50V during deposition.
A.A. Sugurmaran, Y. Purandare, P. Mandal, A.P. Ehiasarian, I. Khan, P.Eh. Hovsepian   +5 more
openaire   +1 more source

Textured Growth of AlN Films Deposited on Si(100) by DC Reactive Magnetron Sputtering and by High Power Impulse Magnetron Sputtering (HiPIMS)

2016
We have studied the texture evolution of Aluminum nitride (AlN) thin. AlN thin films were deposited on Si (100) substrate by dc magnetron sputtering (dcMS) and High Power Impulse Magnetron Sputtering (HiPIMS) technics. The growth of AlN thin films is observed to occur in two phases, stable hexagonal phase (AlN_H) and cubic phase (AIN_C).
B. Riah, A. Ayad, J. Camus, M. A. Djouadi, N. Rouag   +4 more
openaire   +1 more source

Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge

Journal of Physics D: Applied Physics, 2008
The ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) discharges was studied by plasma sampling energy-resolved mass spectroscopy. HIPIMS of chromium (Cr), titanium (Ti) and carbon ( C) targets in argon (Ar) atmosphere was analysed.
A Hecimovic, K Burcalova, A P Ehiasarian
openaire   +1 more source