Results 91 to 100 of about 1,559 (206)

Analysis of retained deuterium on Be-based films: Ion implantation vs. in-situ loading

Nuclear Materials and Energy, 2018
Pure Be, Be-O and Be-O-C thin coatings were deposited using high-power impulse magnetron sputtering (HiPIMS) with and without incorporation of deuterium.
R. Mateus, C. Porosnicu, C.P. Lungu, C. Cruz, Z. Siketić, I. Bogdanović Radović, A. Hakola, E. Alves   +7 more
doaj   +1 more source

Cross-field ion transport during high power impulse magnetron sputtering

, 2008
In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS), has been investigated for the case of a planar circular magnetron.
Larsson, Petter, Wallin, Erik, Brenning, Nils, Lattemann, Martina,, Brenning, Nils,, Wallin, Erik,, Lundin, Daniel,, Lattemann, Martina, Helmersson, Ulf,, Helmersson, Ulf, Larsson, Petter,, Lundin, Daniel   +11 more
core   +1 more source

Tensile properties and drawability of thin bimetallic aluminum-scandium-zirconium / stainless steel foils and monometallic Al-Sc-Zr fabricated by magnetron sputtering

MATEC Web of Conferences, 2018
Al-Sc-Zr alloys are interesting for the production of high strength micro components by micro deep drawing. These alloys show a good hardenability due to the formation of nanometer-scale spheroidal Al3(Sc, Zr) precipitates, which are highly coherent with
Kovac Julien, Heinrich Lukas, Koehler Bernd, Mehner Andreas, Clausen Brigitte, Zoch Hans-Werner   +5 more
doaj   +1 more source

DEPOSITION OF NIOBIUM AND OTHER SUPERCONDUCTING MATERIALS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING: CONCEPT AND FIRST RESULTS [PDF]

, 2011
Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not quite lived up to high expectations due to Q-slope and other issues.
High Current Electronics Institute, Tomsk, Russia, Mentink, Matthijs, Yushkov, Georgy Yu., Slack, Jonathan L., Nollau, Alexander V., Anders, Andre, Lim, Sunnie, Wallig, Joseph G., Mendelsberg, Rueben J.   +8 more
core  

DISCHARGE CHARACTERISTICS OF Ti AND FILM PREPARATION USING HYBRID HIGH POWER IMPULSE MAGNETRON SPUTTERING

, 2014
Hybrid high power impulse magnetron sputtering (HIPIMS) is a new-generation HIPIMS technique with a pulse and dirrect current power supply parallelled connection operation.
Liu Xincai, Ke Peiling, Li Xiaochan, Wang Aiying   +3 more
core  

HiPIMS-deposited CrxN coatings for marine applications: Controllable microstructure and tribocorrosion behavior

Corrosion Communications
A series of CrxN coatings (x = 1 or 2) were fabricated on the 431 stainless steel using a high power impulse magnetron sputtering (HiPIMS), with varying Ar:N2 ratios.
Xiaohui Zhou, Hong Du, Guanshui Ma, Zhenyu Wang, Wei Yang, Kazuhito Nishimura, Peng Guo, Aiying Wang, Peiling Ke   +8 more
doaj   +1 more source

Measurement setup for High Power Impulse Magnetron Sputtering

, 2011
Recently material physics group at Science Institute of University of Iceland has been using reactive sputtering to grow thin films used in various research projects at the institute.
Sveinsson, Ólafur Björgvin
core  

High-Power Impulse Magnetron Sputtering (HiPIMS): Assessing the innovation potential using the Technological Competence Leveraging (TCL) method

, 2020
High-Power Impulse Magnetron Sputtering (HiPIMS) is an advanced coating technology that is currently being further developed for manufacturing superconducting radiofrequency cavities of particle accelerators.
Quach, Tuong-Vi Sophie, Keinz, Peter, Kretzschmar, Linn   +2 more
core   +1 more source

The Effect of Substrate Bias Voltage on the Mechanical and Tribological Properties of (TiAlZrTaNb)N_x High-Entropy Nitride Coatings

Journal of Manufacturing and Materials Processing
We investigate TiAlZrTaNb nitride coatings deposited on Haynes 282 nickel superalloy substrates via high-power impulse magnetron sputtering (HiPIMS) under varying substrate bias voltages (0 V to −75 V).
Juan Pablo González, Ingrid González, Oscar Piamba, Jhon Olaya, Leonardo Velasco, Gilberto Bejarano   +5 more
doaj   +1 more source

High power impulse magnetron sputtering (HIPIMS)

, 2007
 High power impulse magnetron sputtering is an area presently under active and rapid development. Pulsing the power at low duty cycles allows for instantaneous high power levels to be used, causing the plasma to enter a new operating regime.
Lattemann, Martina,
core