Results 91 to 100 of about 18,610,504 (202)
Al-Sc-Zr alloys are interesting for the production of high strength micro components by micro deep drawing. These alloys show a good hardenability due to the formation of nanometer-scale spheroidal Al3(Sc, Zr) precipitates, which are highly coherent with
Kovac Julien +5 more
doaj +1 more source
ZrB2 thin films grown by high power impulse magnetron sputtering from a compound target
Abstract ZrB 2 thin films were grown on Si by high power impulse magnetron sputtering (HiPIMS) from a compound target in an industrial deposition system. By keeping a constant average power while modifying the HiPIMS pulse repetition frequency, the pulse peak current and thereby the degree of ionisation was varied. The films were characterised using
Samuelsson, Mattias +4 more
openaire +3 more sources
On reactive high power impulse magnetron sputtering
High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition (IPVD) technique that is particularly promising for reactive sputtering applications.
Gudmundsson, Jon Tomas,
core +1 more source
Reactive sputter deposition of alumina coatings
Art. 012009, 7 S.Highly ionized pulse plasma processes (HIPP processes) like High Power Impulse Magnetron Sputtering HIPIMS and Modulated Pulse Power MPP have matured in recent years.
Bandorf, R. +3 more
core +1 more source
Cross-field ion transport during high power impulse magnetron sputtering
In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS), has been investigated for the case of a planar circular magnetron.
Larsson, Petter +11 more
core +1 more source
A series of CrxN coatings (x = 1 or 2) were fabricated on the 431 stainless steel using a high power impulse magnetron sputtering (HiPIMS), with varying Ar:N2 ratios.
Xiaohui Zhou +8 more
doaj +1 more source
Hybrid high power impulse magnetron sputtering (HIPIMS) is a new-generation HIPIMS technique with a pulse and dirrect current power supply parallelled connection operation.
Liu Xincai +3 more
core
On the electron energy in the high power impulse magnetron sputtering discharge [PDF]
The temporal variation of the electron energy distribution function (EEDF) was measured with a Langmuir probe in a high power impulse magnetron sputtering (HiPIMS) discharge at 3 and 20 mTorr pressures.
Gudmundsson, J T +14 more
core +1 more source
Ultra-short-period multilayer mirrors (period d below 5 nm) are key components for hard X-ray optics in the 20 keV–40 keV range, but their performance rapidly degrades when the period approaches a few nanometers due to density loss and/or interfacial ...
Nannini Corentin +7 more
doaj +1 more source
DEPOSITION OF NIOBIUM AND OTHER SUPERCONDUCTING MATERIALS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING: CONCEPT AND FIRST RESULTS [PDF]
Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not quite lived up to high expectations due to Q-slope and other issues.
High Current Electronics Institute, Tomsk, Russia +8 more
core

