Results 111 to 120 of about 1,559 (206)

A Comparative Study of Titanium-Based Coatings Prepared by Magnetron Sputtering for Biomedical Applications

Engineering Proceedings
This study investigates the effects of substrate bias voltage on the properties of titanium nitride (TiN) and titanium oxynitride (TiON) thin films deposited via High-Power Impulse Magnetron Sputtering (HiPIMS).
Ferroudja Lemdani, Nadia Saoula, Noureddine Madaoui, Mourad Azibi, Yassine Azzoug, Gaya Chettouh, Abdelkader Hammouche   +6 more
doaj   +1 more source

Ferroelectric AlScN thin films with enhanced polarization and low leakage enabled by high-power impulse magnetron sputtering

APL Materials
The demand for efficient data processing motivates a shift toward in-memory computing architectures. Ferroelectric materials, particularly AlScN, show great promise for next-generation memory devices.
Federica Messi, Jyotish Patidar, Nathan Rodkey, Christoph W. Dräyer, Morgan Trassin, Sebastian Siol   +5 more
doaj   +1 more source

Investigation of parameters of plasma generated by high-power impulse magnetron sputtering (HiPIMS) of graphite

Journal of Physics: Conference Series, 2018
A S Grenadyorov, V O Oskirko, K V Oskomov, V A Semenov   +3 more
openaire   +1 more source

High power impulse magnetron sputtering under industrial conditions

, 2011
In this thesis, the recent development step of magnetron sputtering, termed high power impulse magnetron sputtering (HiPIMS) has been studied. Compared to conventional magnetron sputtering HiPIMS provides a higher plasma density which can ionise the ...
Samuelsson, Mattias
core  

High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis. [PDF]

Physical vapour deposition (PVD) technology is widely used for deposition of coatings with applications in various industries; coatings in semiconductor industry, optical coatings or hard coatings mostly used in car and aerospace industries. In 1999 novel physical vapour deposition technology entitled high power impulse magnetron sputtering (HIPIMS ...
openaire  

High power impulse magnetron sputtering under industrial conditions [Elektronisk resurs]

, 2011
In this thesis, the recent development step of magnetron sputtering, termed high power impulse magnetron sputtering (HiPIMS) has been studied. Compared to conventional magnetron sputtering HiPIMS provides a higher plasma density which can ionise the ...
Samuelsson, Mattias,, Högberg, Hans,, Kubart, Tomáš,, Helmersson, Ulf,, Joelsson, Torbjörn,, Wälivaara, Bengt,   +5 more
core  

Comparison of CrN Coatings Prepared Using High-Power Impulse Magnetron Sputtering and Direct Current Magnetron Sputtering. [PDF]

Materials (Basel), 2023
Bai H, Li J, Gao J, Ni J, Bai Y, Jian J, Zhao L, Bai B, Cai Z, He J, Chen H, Leng X, Liu X.   +12 more
europepmc   +1 more source

Optimization of Superconducting Niobium Nitride Thin Films via High-Power Impulse Magnetron Sputtering

We report a systematic comparison of niobium nitride thin films deposited on oxidized silicon substrates by reactive DC magnetron sputtering and reactive high-power impulse magnetron sputtering (HiPIMS).
Hugo, Collin M., Horne, Hudson T., Reid, Brandon C., Santavicca, Daniel F.   +3 more
core   +1 more source

Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties. [PDF]

Materials (Basel)
Chen C, Li Y, Ma D, Jiang Q, Peng J, Wang J.   +5 more
europepmc   +1 more source

Assessment of HIPIMS-Deposited TiN Nanostructured Thin Films as Hydrogen Permeation Barriers on Carbon Steel. [PDF]

Materials (Basel)
González-Durán R, Rodríguez-Prieto A, Camacho AM.   +2 more
europepmc   +1 more source