Results 101 to 110 of about 18,610,504 (202)

The Effect of Substrate Bias Voltage on the Mechanical and Tribological Properties of (TiAlZrTaNb)N_x High-Entropy Nitride Coatings

Journal of Manufacturing and Materials Processing
We investigate TiAlZrTaNb nitride coatings deposited on Haynes 282 nickel superalloy substrates via high-power impulse magnetron sputtering (HiPIMS) under varying substrate bias voltages (0 V to −75 V).
Juan Pablo González, Ingrid González, Oscar Piamba, Jhon Olaya, Leonardo Velasco, Gilberto Bejarano   +5 more
doaj   +1 more source

High power impulse magnetron sputtering (HIPIMS)

, 2007
 High power impulse magnetron sputtering is an area presently under active and rapid development. Pulsing the power at low duty cycles allows for instantaneous high power levels to be used, causing the plasma to enter a new operating regime.
Lattemann, Martina,
core  

Transient transport phenomena in high power impulse magnetron sputtering discharges

, 2021
High power impulse magnetron sputtering (HiPIMS) ist ein Verfahren zu Abscheidung dünner Schichten. HiPIMS Entladungen zeichnen sich durch eine Konfiguration gekreuzter elektrischer und magnetischer Felder aus.
Held, Julian (Dr. rer. nat.)
core   +1 more source

Preparation and tribological properties of WS2 solid lubricating coating with dense structure using HiPIMS

Journal of Materials Research and Technology
In this study, a dense WS2 coating was deposited via high-power impulse magnetron sputtering (HiPIMS) after solving the glow discharge problem, and it was compared with WS2 coating deposited via radio frequency (RF) sputtering.
Puyou Ying, Hanying Sun, Ping Zhang, Changhong Lin, Tao Yang, Jianbo Wu, Min Huang, Tianle Wang, Zhibiao Lian, Vladimir Levchenko   +9 more
doaj   +1 more source

Discharge Physics of High Power Impulse Magnetron Sputtering [PDF]

, 2011
High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading
Anders, Andre
core  

Superhard oxidation-resistant Ti1-xAlxBy thin films grown by hybrid HiPIMS/DCMS co-sputtering diboride targets without external substrate heating

Materials & Design
Ti1-xAlxBy films (0.40 ≤ x ≤ 0.76, and 1.81 ≤ y ≤ 2.03) combining good mechanical properties and high-temperature oxidation resistance are demonstrated.
B. Wicher, O.V. Pshyk, X. Li, B. Bakhit, V. Rogoz, I. Petrov, L. Hultman, G. Greczynski   +7 more
doaj   +1 more source

Oxygen-driven shell-like microstructure: a pathway to high-performance PVD Cr coatings for metal protection

npj Materials Degradation
Chromium (Cr) coatings, known for their corrosion resistance and luster, often suffer from coarse columnar grains when fabricated by physical vapor deposition (PVD), limiting their performance.
Meiqi Zhang, Li Wang, Zhenyu Wang, Yong Cheng, Guanshui Ma, Shiyao Tan, Peiling Ke, Aiying Wang   +7 more
doaj   +1 more source

Metallization of nanostructures by High Power Impulse Magnetron Sputtering

, 2015
In this contribution, we present the use of High Power Impulse Magnetron Sputtering (HiPIMS) for metallization of nanostructures for microelectronics. This work is motivated by meeting the increasing demands on deposition processes due to the increasing ...
Zhang, Shi-Li,, Zhang, Zhen,, Jablonka, Lukas,, Kubart, Tomas,   +3 more
core  

High power impulse magnetron sputtering under industrial conditions

, 2011
In this thesis, the recent development step of magnetron sputtering, termed high power impulse magnetron sputtering (HiPIMS) has been studied. Compared to conventional magnetron sputtering HiPIMS provides a higher plasma density which can ionise the ...
Samuelsson, Mattias
core   +2 more sources

Fabrication and Properties of Hard Coatings by a Hybrid PVD Method

Lubricants
By integrating cathodic arc evaporation (CAE) with magnetron sputtering (MS) or high-power impulse magnetron sputtering (HiPIMS), hard coatings with diverse multicomponent compositions can be fabricated.
Rui Zhang, Qimin Wang, Yuxiang Xu, Lisheng Li, Kwang Ho Kim   +4 more
doaj   +1 more source