Results 81 to 90 of about 18,610,504 (202)
Hysteresis-free reactive high power impulse magnetron sputtering
High power impulse magnetron sputtering (HIPIMS) of an Al target in Ar/O2 mixtures has been studied. The use of HIPIMS is shown to drastically influence the process characteristics compared to conventional sputtering.
Wallin, Erik +3 more
core +1 more source
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study [PDF]
-CrN x (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS ...
Grzegorz Greczynski +2 more
core
This article reports the fabrication of tungsten oxide electrochromic coatings using reactive high‐power impulse magnetron sputtering (HiPIMS). Results demonstrate the tunability of tungsten oxide structures via HiPIMS pulse length, optimizing coating transparency and electrochromic properties.
Hamed Najafi‐Ashtiani +2 more
wiley +1 more source
HARDNESS OF HYBRID PVD-PECVD W-C:H COATINGS VS. SUBSTRATE TYPE
The effects of substrate on the measurement of hardness (and indentation modulus) - penetration depth profiles were investigated on hybrid PVD-PECVD W-C:H coatings made with the additions of C2H2 or CH4 using High Power Impulse Magnetron Sputtering ...
František Lofaj, Margita Kabátová
doaj +1 more source
HiPIMS vs DCMS technology to produce tungsten coatings for fusion applications
Carbon-based materials have been used in thermonuclear fusion devices for a long period. The major drawback of a plasma-facing wall with carbon armour, such as graphite or Carbon Fiber Composite (CFC), is their chemical erosion and dust formation under ...
SM Deambrosis +5 more
core
The high-power impulse magnetron sputtering (HiPIMS) is a deposition method that has potential to achieve both high hardness and high surface smoothness of diamond-like carbon (DLC) films, and investigation has been performed to optimize the deposition ...
Yuuki Tokuta +6 more
doaj +1 more source
Energy flux measurements in high power impulse magnetron sputtering
The total energy flux in a high power impulse magnetron sputtering (HiPIMS) plasma has been measured using thermal probes. Radial flux (parallel to the magnetron surface) as well as axial flux (perpendicular to the magnetron surface) were measured at ...
Ulf Helmersson +3 more
core +2 more sources
Thin tantalum nitride films were grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS) while varying the fractional N2 flow rate at fixed substrate temperature of 400°C.
Gudmundsson, Jon Tomas, +2 more
core +1 more source
High power impulse magnetron sputtering: fundamentals, technologies, challenges and applications
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both ...
Gudmundsson, Jon Tomas +2 more
core +2 more sources
Analysis of retained deuterium on Be-based films: Ion implantation vs. in-situ loading
Pure Be, Be-O and Be-O-C thin coatings were deposited using high-power impulse magnetron sputtering (HiPIMS) with and without incorporation of deuterium.
R. Mateus +7 more
doaj +1 more source

