Results 81 to 90 of about 192 (126)

Ferroelectric AlScN thin films with enhanced polarization and low leakage enabled by high-power impulse magnetron sputtering

APL Materials
The demand for efficient data processing motivates a shift toward in-memory computing architectures. Ferroelectric materials, particularly AlScN, show great promise for next-generation memory devices.
Federica Messi, Jyotish Patidar, Nathan Rodkey, Christoph W. Dräyer, Morgan Trassin, Sebastian Siol   +5 more
doaj   +1 more source

High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis. [PDF]

Physical vapour deposition (PVD) technology is widely used for deposition of coatings with applications in various industries; coatings in semiconductor industry, optical coatings or hard coatings mostly used in car and aerospace industries. In 1999 novel physical vapour deposition technology entitled high power impulse magnetron sputtering (HIPIMS ...
openaire  

Investigation of parameters of plasma generated by high-power impulse magnetron sputtering (HiPIMS) of graphite

Journal of Physics: Conference Series, 2018
A S Grenadyorov, V O Oskirko, K V Oskomov, V A Semenov   +3 more
openaire   +1 more source

Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS)

Journal of the Vacuum Society of Japan, 2017
Tetsuhide SHIMIZU, Michelle VILLAMAYOR, Julien KERAUDY, Daniel LUNDIN, Ulf HELMERSSON   +4 more
openaire   +2 more sources

Magnetic Field Dependent Characteristics of Al-doped ZnO by High Power Impulse Magnetron Sputtering (HIPIMS) [PDF]

Korean Journal of Materials Research, 2010
openaire   +1 more source

Physics of Plasma-Based Ion Implantation & Deposition (PBIID) and High Power Impulse Magnetron Sputtering (HIPIMS): A Comparison

, 2007
The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma-sheath system interacts with the pulse-driving power supply, the plasma ...
openaire   +2 more sources

Some of the next articles are maybe not open access.

Related searches:

Pattern Formation in High Power Impulse Magnetron Sputtering (HiPIMS) Plasmas

Plasma Chemistry and Plasma Processing, 2019
High power impulse magnetron sputtering (HiPIMS) plasmas produce a very energetic growth flux for the synthesis of thin films with superior properties. High power densities in the range of a few $$\hbox {kW}/\hbox {cm}^2$$ are applied to a metal target electrode in short pulses with a length of 10–$$400\,\upmu \hbox {s}$$ and duty cycles of a few ...
Julian Held, Achim von Keudell, Von Keudell Achim   +2 more
exaly   +2 more sources

High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation

Journal of Photochemistry and Photobiology A: Chemistry, 2012
This study addresses the high power impulse magnetron sputtering (HIPIMS) deposition of Ag-nanoparticle films on polyester and the comparison with films deposited by direct current pulsed magnetron sputtering (DCMSP). The first evidence is presented for the Escherichia coli bacterial inactivation by HIPIMS sputtered polyester compared to Ag-polyester ...
Ewelina Kusiak-Nejman, John Kiwi, R Sanjinés   +2 more
exaly   +2 more sources

Properties of TiAlCN/VCN Nanoscale Multilayer Coatings Deposited by Mixed High-Power Impulse Magnetron Sputtering (HiPIMS) and Unbalanced Magnetron Sputtering Processes—Impact of HiPIMS During Coating

IEEE Transactions on Plasma Science, 2010
Nanoscale multilayer TiAlCN/VCN coating has been deposited by pure unbalanced magnetron sputtering (UBM) and high-power impulse magnetron sputtering (HiPIMS)-UBM techniques. The V+ HiPIMS etching used in both processes has shown excellent adhesion (Lc > 50) of the coating to the substrate.
Arutiun Ehiasarian, P Eh Hovsepian
exaly   +2 more sources

High Power Impulse Magnetron Sputtering – HIPIMS

2014
R. Bandorf, V. Sittinger, G. Bräuer
exaly   +2 more sources