Results 61 to 70 of about 1,559 (206)

In-situ evolution and aging of ultrathin sputter deposited silver films

Applied Surface Science Advances
Silver (Ag) thin films deposited by magnetron sputtering are widely utilized in optics, antimicrobial coatings, and flexible organic electronics. However, the inherent three-dimensional (3D) island growth of Ag complicates the fabrication of ultrathin ...
Kristian A. Reck, Yusuf Bulut, Benedikt Sochor, Doan Duy Ky Le, Lyuyang Cheng, Thomas Strunskus, Peter Müller-Buschbaum, Stephan V. Roth, Tayebeh Ameri, Alexander Vahl, Franz Faupel   +10 more
doaj   +1 more source

Structural Formation and Photocatalytic Activity of Magnetron Sputtered Titania and Doped-Titania Coatings

Molecules, 2014
Titania and doped-titania coatings can be deposited by a wide range of techniques; this paper will concentrate on magnetron sputtering techniques, including “conventional” reactive co-sputtering from multiple metal targets and the recently introduced ...
Peter J. Kelly, Glen T. West, Marina Ratova, Leanne Fisher, Soheyla Ostovarpour, Joanna Verran   +5 more
doaj   +1 more source

2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge

Journal of Applied Physics
Among the numerous advantages of the high-power impulse magnetron sputtering (HiPIMS) technique, the most important is the enhanced ionization degree of sputtered species contributing to the film growth. Consequently, the quality of deposited thin films is highly improved.
Anna Kapran, Charles Ballage, Zdeněk Hubička, Tiberiu Minea   +3 more
openaire   +2 more sources

Investigation of plasma ion composition generated by high-power impulse magnetron sputtering (HiPIMS) of graphite

Journal of Physics: Conference Series, 2019
Abstract High-power impulse magnetron sputtering (HiPIMS) of graphite is used to increase the density of the plasma (up to 1013 cm−3) and the fraction of ionization of carbon (up to 70 %). It makes possible to increase the ion bombardment of the growing film by applying a negative high-frequency (HF) bias potential to the substrate ...
K V Oskomov, A V Vizir
openaire   +1 more source

Chromium Coatings Applied to Zr Alloy Claddings by Cathodic Arc Ion Plating: Effect of Nitrogen Inclusion on Limiting Columnar Defects

Advanced Engineering Materials, Volume 26, Issue 20, October 2024.
The nitrogen incorporation effectively mitigates columnar defects in chromium‐based coatings on the Zr alloy claddings. The important significance of chromium‐based coatings is that they are suitable material candidates for accident‐tolerant fuel cladding of nuclear fuel rods.
Hae Won Yoon, Yuri Choi, Kuk Hyun Yeo, Sang Gweon Kim, Yong Ki Cho   +4 more
wiley   +1 more source

High power impulse magnetron sputtering using a rotating cylindrical magnetron

, 2010
Both the industrially favorable deposition technique, high power impulse magnetron sputtering (HIPIMS), and the industrially popular rotating cylindrical magnetron have been successfully combined.
S. Mahieu, Depla, Diederik, A. P. Ehiasarian, Leroy, W. P., Leroy, Wouter, Ehiasarian, Arutiun, W. P. Leroy, Depla, D., Mahieu, S., D. Depla, Ehiasarian, A. P., Mahieu, Stijn   +11 more
core   +1 more source

Tribological properties of WS2 thin films with improved adhesion using MAIP/HiPIMS composite deposition

Journal of Materials Research and Technology
Dense WS2 thin films with excellent self-lubricating properties have been prepared using high-power impulse magnetron sputtering (HiPIMS) successfully.
Jianjian Yu, Ping Zhang, Puyou Ying, Chen Li, Changhong Lin, Tao Yang, Jianbo Wu, Tianle Wang, Nikolai Myshkin, Vladimir Levchenko   +9 more
doaj   +1 more source

The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering

Micromachines, 2019
Many strategies have been developed for the synthesis of silicon carbide (SiC) thin films on silicon (Si) substrates by plasma-based deposition techniques, especially plasma enhanced chemical vapor deposition (PECVD) and magnetron sputtering, due to the ...
Nierlly Galvão, Marciel Guerino, Tiago Campos, Korneli Grigorov, Mariana Fraga, Bruno Rodrigues, Rodrigo Pessoa, Julien Camus, Mohammed Djouadi, Homero Maciel   +9 more
doaj   +1 more source

Laterally Modulating Carrier Concentration by Ion Irradiation in CdO Thin Films for Mid‐IR Plasmonics

Advanced Optical Materials, Volume 12, Issue 30, October 24, 2024.
Ion irradiation through a patterned photoresist mask enables in‐plane control of transport and optical properties in CdO thin films. This proof‐of‐concept demonstrates a simple grating pattern of alternating high and low carrier concentrations (irradiated and non‐irradiated) which exhibit sharp optical contrast in the near‐field and surface plasmon ...
Angela J. Cleri, Mingze He, Maxwell J. Tolchin, Christopher Gubbin, Eric Lang, Khalid Hattar, Simone De Liberato, Joshua D. Caldwell, Jon‐Paul Maria   +8 more
wiley   +1 more source

New superimposed pulsed plasma technology using High Power Impulse Magnetron Sputtering (HiPIMS) combined with DC or MF-frequency

, 2022
S.224-228High Power Pulse Magnetron Sputtering (HPPMS), also known as High Power Impulse Magnetron Sputtering (HiPIMS) is a novel pulse plasma technology for coating applications.
Vergöhl, M., Parra, E., Bandorf, R., Mark, G.   +3 more
core