Results 61 to 70 of about 18,610,504 (202)
Journal of Physics: Conference Series, 2019 Abstract High-power impulse magnetron sputtering (HiPIMS) of graphite is used to increase the density of the plasma (up to 1013 cm−3) and the fraction of ionization of carbon (up to 70 %). It makes possible to increase the ion bombardment of the growing film by applying a negative high-frequency (HF) bias potential to the substrate ...
K V Oskomov, A V Vizir
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Bipolar HiPIMS kick‐pulse for high hardness in high‐entropy boride thin films
Journal of the American Ceramic Society, Volume 108, Issue 3, March 2025.Abstract We report a microhardness indentation study for multicomponent refractory metal boride thin films that belong to the family of high‐entropy ceramics exhibiting superior hardness and high temperature properties. We focus on the nominally equimolar composition (Ti0.2Zr0.2Hf0.2Nb0.2Ta0.2)B2, which we refer to as HEB3, on c‐plane sapphire ...
Nathaniel S. McIlwaine +7 more
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Modeling the high power impulse magnetron sputtering discharge
, 2019 Modeling has the possibility to capture the main interacting mechanisms in a plasma discharge, which are typically very difficult to identify (isolate) in experiments. A large variety of computer models describing the plasma behavior in HiPIMS discharges
Gudmundsson, Jon Tomas, +4 more
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Journal of Materials Research and TechnologyDense WS2 thin films with excellent self-lubricating properties have been prepared using high-power impulse magnetron sputtering (HiPIMS) successfully.
Jianjian Yu +9 more
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Micromachines, 2019 Many strategies have been developed for the synthesis of silicon carbide (SiC) thin films on silicon (Si) substrates by plasma-based deposition techniques, especially plasma enhanced chemical vapor deposition (PECVD) and magnetron sputtering, due to the ...
Nierlly Galvão +9 more
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Journal of Applied PhysicsAmong the numerous advantages of the high-power impulse magnetron sputtering (HiPIMS) technique, the most important is the enhanced ionization degree of sputtered species contributing to the film growth. Consequently, the quality of deposited thin films is highly improved.
Anna Kapran +3 more
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Advanced Engineering Materials, Volume 26, Issue 20, October 2024.The nitrogen incorporation effectively mitigates columnar defects in chromium‐based coatings on the Zr alloy claddings. The important significance of chromium‐based coatings is that they are suitable material candidates for accident‐tolerant fuel cladding of nuclear fuel rods.
Hae Won Yoon +4 more
wiley +1 more source
Measurement setup for High Power Impulse Magnetron Sputtering
, 2011 Recently material physics group at Science Institute of University of Iceland has been using reactive sputtering to grow thin films used in various research projects at the institute.
Sveinsson, Ólafur Björgvin
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Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
Beilstein Journal of Nanotechnology, 2019 Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce unique ...
Hamidreza Hajihoseini +3 more
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Advanced Optical Materials, Volume 12, Issue 30, October 24, 2024.Ion irradiation through a patterned photoresist mask enables in‐plane control of transport and optical properties in CdO thin films. This proof‐of‐concept demonstrates a simple grating pattern of alternating high and low carrier concentrations (irradiated and non‐irradiated) which exhibit sharp optical contrast in the near‐field and surface plasmon ...
Angela J. Cleri +8 more
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