Results 61 to 70 of about 2,236 (212)
Nanoscale multilayer TiAlCN/VCN coating has been deposited by pure unbalanced magnetron sputtering (UBM) and high-power impulse magnetron sputtering (HiPIMS)–UBM techniques. The V+ HiPIMS etching used in both processes has shown excellent adhesion (Lc >
A. P. Ehiasarian +5 more
core +2 more sources
Zinc oxide thin films have been developed through thermal oxidation of Zinc thin films grown by high impulse power magnetron sputtering (HiPIMS). The influence of various sputtering power on thin film structural, morphological, photocatalytic, and ...
Endrika Widyastuti +2 more
doaj +1 more source
Discovering Stable Amorphous Ceramics: From Computational Prediction to Thin‐Film Synthesis
This work presents a computationally guided approach to discovering stable amorphous ceramics, using yttrium tungsten nitride (Y‐W‐N) as a prototype. By combining first‐principles random structure sampling with thin‐film synthesis, the authors identify and experimentally realize previously unreported amorphous nitrides, demonstrating their exceptional ...
Oleksandr V. Pshyk +8 more
wiley +1 more source
Unprecedented high-temperature electrical insulation of reactively sputtered AlN thin films
This study investigates the morphological and electrical properties of hexagonal aluminium nitride (h-AlN) films synthesized through different reactive sputtering techniques at low growth temperatures (270 °C) – specifically direct and pulsed current ...
N. Salvadores Farran +10 more
doaj +1 more source
This review highlights recent advances in magnetron‐sputtered ceramic thermal barrier coatings for Superni 718, emphasizing improved thermal insulation, oxidation resistance, and durability. Key deposition parameters and emerging techniques like HiPIMS are critically discussed with a focus on coating performance under extreme operating conditions ...
Syed Faizan Altaf +2 more
wiley +1 more source
Recent developments on titanium based mono and multilayer nitride films deposited through HiPIMS
High Power Impulse Magnetron Sputtering (HiPIMS) is a notable advancement under Physical Vapor Deposition (PVD) techniques, achieving plasma densities of 1018–1019 m−3 and ionization levels over 70 %, resulting in a transient plasma with exceptional ion ...
Sayan Atta +3 more
doaj +1 more source
Most superconducting thin films found on SRF cavity are generally produced through magnetron sputtering using niobium (Nb) as target. Yet, this technique can still be improved as the resulting film lack in efficiency. Alternative materials such as NbTiN could potentially be used with significant improvement compared to pure Nb films.
Simon, Stéphane +3 more
openaire +2 more sources
The average oxidation state of V in AlCrVY(O)N thin films deposited by a hybrid dcMS/HiPIMS method with different O2 flow rates is investigated. X‐ray near‐edge absorption spectroscopy is used to determine the average oxidation states after annealing up to 925 °C.
Eric Schneider +8 more
wiley +1 more source
Industrial use of HiPIMS and the hiP‐V hiPlus technology
It has been demonstrated by several groups that HiPIMS is a state of the art tool for applying demanding coatings with superior film properties. The real industrial breakthrough for the HiPIMS‐technology, has not yet happened.
Fernández-Martínez, Iván +8 more
core +1 more source
Dense WS2 thin films with excellent self-lubricating properties have been prepared using high-power impulse magnetron sputtering (HiPIMS) successfully.
Jianjian Yu +9 more
doaj +1 more source

