Results 61 to 70 of about 476 (176)

Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process

Scientific Reports, 2017
We report on a new route to grow epitaxial copper (Cu) ultra-thin films (up to 150 nm thick) at ambient temperature on Si(001) wafers covered with native oxide without any prior chemical etching or plasma cleaning of the substrate.
Felipe Cemin, Daniel Lundin, Clarisse Furgeaud, Anny Michel, Guillaume Amiard, Tiberiu Minea, Gregory Abadias   +6 more
doaj   +1 more source

Bipolar HiPIMS kick‐pulse for high hardness in high‐entropy boride thin films

Journal of the American Ceramic Society, Volume 108, Issue 3, March 2025.
Abstract We report a microhardness indentation study for multicomponent refractory metal boride thin films that belong to the family of high‐entropy ceramics exhibiting superior hardness and high temperature properties. We focus on the nominally equimolar composition (Ti0.2Zr0.2Hf0.2Nb0.2Ta0.2)B2, which we refer to as HEB3, on c‐plane sapphire ...
Nathaniel S. McIlwaine, Nestor O. Marquez Rios, Eva Zurek, Donald W. Brenner, William G. Fahrenholtz, Stefano Curtarolo, Douglas E. Wolfe, Jon‐Paul Maria   +7 more
wiley   +1 more source

Comparison on the superconducting properties of Nb and NbTiN thin films produced by both HiPIMS and bipolar HiPIMS

Most superconducting thin films found on SRF cavity are generally produced through magnetron sputtering using niobium (Nb) as target. Yet, this technique can still be improved as the resulting film lack in efficiency. Alternative materials such as NbTiN could potentially be used with significant improvement compared to pure Nb films.
Simon, Stéphane, Benjamin, C., Valizadeh, Reza, Bradley, J. W.   +3 more
openaire   +2 more sources

Direct metallization of polymers: The HiPIMS effect on early thin film growth

Nano Trends
The metallization of polymers is essential for developing flexible electronics, yet precise control over metal film growth remains challenging. This study demonstrates the effect of high-power impulse magnetron sputtering (HiPIMS) markedly influencing ...
Kristian A. Reck, Yusuf Bulut, Stefan Schröder, Ruoxuan Qi, Xiaojing Ci, Thomas Strunskus, Peter Müller-Buschbaum, Stephan V. Roth, Tayebeh Ameri, Alexander Vahl, Franz Faupel   +10 more
doaj   +1 more source

Chromium Coatings Applied to Zr Alloy Claddings by Cathodic Arc Ion Plating: Effect of Nitrogen Inclusion on Limiting Columnar Defects

Advanced Engineering Materials, Volume 26, Issue 20, October 2024.
The nitrogen incorporation effectively mitigates columnar defects in chromium‐based coatings on the Zr alloy claddings. The important significance of chromium‐based coatings is that they are suitable material candidates for accident‐tolerant fuel cladding of nuclear fuel rods.
Hae Won Yoon, Yuri Choi, Kuk Hyun Yeo, Sang Gweon Kim, Yong Ki Cho   +4 more
wiley   +1 more source

Hierarchical Metal‐Organic Network‐Forming Glasses toward Applications

Advanced Functional Materials, Volume 34, Issue 43, October 22, 2024.
Macro‐scale structurization and properties of metal‐organic framework glasses are correlated with medium‐range order of networks and local coordination geometries. The hierarchical MOF glasses in synthesis, shape adaptation, and structure‐property relationship are discussed for future industrial applications.
Yong‐Sheng Wei, Christopher W. Ashling, Teerat Watcharatpong, Zeyu Fan, Satoshi Horike   +4 more
wiley   +1 more source

Modelling of target effects in reactive HIPIMS

IOP Conference Series: Materials Science and Engineering, 2012
In reactive High Power Impulse Magnetron Sputtering (HIPIMS) of oxides, target effects such as reduced surface oxidation during pulse off time, increased implantation of reactive gas due to the higher discharge voltage as compared to normal DC sputtering, and enhanced target cleaning during on time are considered to be responsible for the differences ...
Tomas Kubart, Joakim Andersson
openaire   +1 more source

Ferroelectric AlScN thin films with enhanced polarization and low leakage enabled by high-power impulse magnetron sputtering

APL Materials
The demand for efficient data processing motivates a shift toward in-memory computing architectures. Ferroelectric materials, particularly AlScN, show great promise for next-generation memory devices.
Federica Messi, Jyotish Patidar, Nathan Rodkey, Christoph W. Dräyer, Morgan Trassin, Sebastian Siol   +5 more
doaj   +1 more source

Comparison of plasma parameters and optical emission in DC, HIPIMS and hybrid DC+HIPIMS modes of magnetron sputtering

Journal of Physics: Conference Series, 2019
Abstract Experimental studies of the parameters of the plasma of a magnetron discharge and optical radiation from plasma in the regime of direct current (DC), high-current mode (HIPIMS), and hybrid (DC+HIPIMS) mode for a copper cathode 100 mm in diameter were carried out.
V A Semenov, A S Grenadyorov, V O Oskirko, A N Zakharov, S V Rabotkin, I V Ionov, A A Solovyev   +6 more
openaire   +1 more source

Corrosion behaviour in liquid lead of pristine and irradiated FeCrAlNi coatings deposited by HiPIMS

Materials & Design
FeCrAlNi coatings with controlled morphology, microstructure, composition and adhesion were developed using High Power Impulse Magnetron Sputtering (HiPIMS) to improve the performance and durability of steels exposed to Lead-cooled Fast Reactor (LFR ...
M.S. Galli De Magistris, D. Vavassori, D. Dellasega, V. Russo, M. Salvi, N. Lecis, A. Smith, A. Milston, M. O’Leary, S. de Moraes Shubeita, F. Currell, M. Passoni, F. García Ferré   +12 more
doaj   +1 more source