Low temperature deposition of functional thin films on insulating substrates enabled by selective ion acceleration using synchronized floating potential HiPIMS [PDF]
Ionized physical vapor deposition techniques, such as high-power impulse magnetron sputtering (HiPIMS), are gaining popularity but face challenges for deposition on insulating materials, where applying negative potentials for ion acceleration is ...
Jyotish Patidar +4 more
doaj +3 more sources
AlCrN and AlCrVYN thin films were deposited by physical vapor deposition using dcMS, HiPIMS and hybrid dcMS/HiPIMS processes. Although all the thin films were produced using the same time-average power and show only slight differences in the chemical ...
Wolfgang Tillmann +5 more
doaj +3 more sources
Band-gap engineering of zirconia by nitrogen doping in reactive HiPIMS: a step forward in developing innovative technologies for photocatalysts synthesis [PDF]
In the global context of climate change and carbon neutrality, this work proposes a strategy to improve the light absorption of photocatalytic water-splitting materials into the visible spectrum by anion doping.
Teodora Matei +7 more
doaj +3 more sources
Industrial applications of HIPIMS
The development of reliable HIPIMS power supplies has reached a satisfactory level. Furthermore conventional magnetron cathodes can be used in connection with HIPIMS power supplies. Therefore HIPIMS equipped PVD coating systems can be designed with sufficient reliability.
W-D Münz +4 more
openaire +2 more sources
A comparison between DCMS, HiPIMS and a novel ‘HiPIMS+Kick’ deposition for piezoelectric thin-films [PDF]
High power impulse magnetron sputtering (HiPIMS) has been shown to improve optical and semi-conductor thin-film coatings through increased density [1], crystallinity and more control over deposition parameters [2]. Here, HiPIMS and, a new technique, HiPIMS + ‘Kick’ are investigated in relation to deposited piezoelectric coatings and compared with a ...
Mhairi Rogan +7 more
openaire +3 more sources
The electrical characteristics and spectroscopic properties have been comprehensively investigated in a DC superimposed high power impulse magnetron sputtering (DC-HiPIMS) deposition system in this paper.
Xiao Zuo +4 more
doaj +2 more sources
HiPIMS co-sputtering for the increase of the mechanical properties of arc deposited TiN coatings
Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with high-power impulse magnetron sputtering (HiPIMS), due to differences in the respective pressure requirements.
Chi-Lung Chang +4 more
doaj +2 more sources
Influence of HiPIMS Pulse Widths on the Structure and Properties of Copper Films [PDF]
High-power pulse magnetron sputtering is a new type of magnetron sputtering technology that has advantages such as high peak power density and a high ionization rate compared to DC magnetron sputtering.
Xincheng Liu +4 more
semanticscholar +2 more sources
Effects of HiPIMS Duty Cycle on Plasma Discharge and the Properties of Cu Film [PDF]
In this paper, Cu thin films were deposited on Si (100) substrates by the high−power impulse magnetron sputtering (HiIPMS) technique, and the effects of different duty cycles (from 2.25% to 5.25%) on the plasma discharge characteristics, microstructure ...
Yongjie Ren +4 more
semanticscholar +2 more sources
Highly Stable and Enhanced Performance of p–i–n Perovskite Solar Cells via Cuprous Oxide Hole-Transport Layers [PDF]
Solar light is a renewable source of energy that can be used and transformed into electricity using clean energy technology. In this study, we used direct current magnetron sputtering (DCMS) to sputter p-type cuprous oxide (Cu2O) films with different ...
Tung-Han Chuang +6 more
doaj +2 more sources

