Results 221 to 230 of about 600,300 (312)
Smartphone-Based Assessment of the Stretch-Shortening Cycle: Validity and Reliability of the My Jump Lab App for Measuring the Dynamic Rebound Index. [PDF]
Balsalobre-Fernández C.
europepmc +1 more source
This review comprehensively evaluates extrusion‐based additive manufacturing for advanced ceramics, detailing feedstock options and key process parameters. By critically addressing defect mechanisms like porosity and cracking, the work highlights optimization strategies through machine learning and advanced postprocessing.
Meisam Bakhtiari +4 more
wiley +1 more source
Predicting Postoperative Anterior Chamber Depth, Intraocular Lens Tilt, and Decentration Using an Internally Validated Machine Learning Model. [PDF]
Waser K +6 more
europepmc +1 more source
Minimum Mean Square Error Method on Observation Result of Phased Array Weather Radar
Maruo, Kouichi +6 more
openaire +1 more source
Multilayer Self‐Limiting Electrospray Deposition via Stepped Voltage Bias
Self‐limiting electrospray deposition (SLED) uses a high voltage to generate and deposit a charged payload on a target surface. The coating retains its charge, repelling newly arriving material. SLED thickness can be decreased by applying a secondary bias to the target.
Madhuri Deb +3 more
wiley +1 more source
Pre-Stimulus Head Position and Its Effect on Sound Localization Metrics in Children. [PDF]
Zangerl E +4 more
europepmc +1 more source
Postbuild annealing systematically modifies the phase fractions and morphology of EB‐PBF processed Mo–9Si–8B. Quantitative microstructure–property correlations reveal how controlled phase evolution enhances high‐temperature compressive strength and creep resistance.
Christopher Schmidt +5 more
wiley +1 more source
Development and Test of Highly Accurate End Point Free Energy Methods. 4. Expanding Solvents Capability and logBB Prediction. [PDF]
Niu T, He X, Man VH, Wang X, Wang J.
europepmc +1 more source
Deep‐UV (258 nm) femtosecond pulses enable uniform amorphous silicon writing on Si(100)/(111) with a six‐fold larger fluence amorphization window than NIR methods. Optimized fluence and overlap yield 20–45 nm uniform and continuous amorphous layers. Microscopy shows sharp interfaces, and real‐time reflectivity reveals nanosecond melt–resolidification ...
Wissal Benali +5 more
wiley +1 more source

