Results 161 to 170 of about 329,505 (267)
Residual adhesive after electrode loading in adhesive‐assisted resistance spot welding is quantified through a traceable experimental‐to‐digital workflow. Chromatic confocal topography provides calibrated surface‐height data, while OpenCV detects the electrode imprint and integrates adhesive height into comparable volume metrics.
Sung‐Min Wi, Jiangdong Zhao
wiley +1 more source
Protocol for the preparation, heat treatment, and structural and magnetic characterization of Cu-doped τ-MnAl ribbons produced by melt spinning. [PDF]
Echeverri Restrepo AJ +5 more
europepmc +1 more source
We apply a foundational machine‐learning interatomic potential based on the graph atomic cluster expansion (GRACE) to simulate the commercial Ni‐based single‐crystal superalloy CMSX‐4. Hybrid Monte‐Carlo/molecular dynamics sampling resolves short‐range order in the γ phase and L12 sublattice occupancies in the γ’ phase and connects them to stacking ...
Aditya Vishwakarma +4 more
wiley +1 more source
A Novel Pressure-Assisted Induction Melting Technique for Synthesis of Lightweight High-Entropy Alloys: A Concept, Process Development and Hardware Design. [PDF]
Newcombe P, Czerwinski F.
europepmc +1 more source
Controlling the Field Assisted Sintering Technology (FAST) parameters, dwell temperature and cooling rate, significantly influences the microstructural evolution in titanium aluminide GE4822. Significant γ‐lamellar colonies develop only upon cooling through the α‐transus.
Jack Krohn, James Pepper, Martin Jackson
wiley +1 more source
Channelized topography amplifies melt-sensitivity of cold Antarctic ice shelves. [PDF]
Zhou Q +6 more
europepmc +1 more source
Postbuild annealing systematically modifies the phase fractions and morphology of EB‐PBF processed Mo–9Si–8B. Quantitative microstructure–property correlations reveal how controlled phase evolution enhances high‐temperature compressive strength and creep resistance.
Christopher Schmidt +5 more
wiley +1 more source
Mapping Nanoscale Order-Disorder Transitions to Optimal Topochemical Polymerization Across Alkyl Diacetylene Monolayers. [PDF]
Garfield JA, Paul S, Claridge SA.
europepmc +1 more source
Deep‐UV (258 nm) femtosecond pulses enable uniform amorphous silicon writing on Si(100)/(111) with a six‐fold larger fluence amorphization window than NIR methods. Optimized fluence and overlap yield 20–45 nm uniform and continuous amorphous layers. Microscopy shows sharp interfaces, and real‐time reflectivity reveals nanosecond melt–resolidification ...
Wissal Benali +5 more
wiley +1 more source

