Results 111 to 120 of about 69,296 (307)
METefnet: developments in metrology for moisture in materials [PDF]
Bien que les mesures de teneur en eau soient largement utilisées dans l'industrie, les considérations métrologiques quant à cette mesure ne sont pas complètement abouties de sorte à fournir des mesures fiables et traçables au SI. Afin de remédier à ceci,
Østergaard, Peter +80 more
core +1 more source
Metrology for RF-exposure from massive MIMO system
Chapter Contents:21.1 Motivation for 5G RF-exposure new metrology and guidelines21.2 Measuring 5G RF-exposure21.3 Experimental assessment of the RF-exposure of massive MIMO base station via a reconfigurable testbed21.3.1 mMIMO testbed set-up21.3.2 ...
Gui, Yunsong +3 more
core +1 more source
A robust, substrate‐independent fabrication approach overcomes the spectral and geometric limitations of traditional stray‐light suppression. By combining ink spray‐coating with self‐assembled microsphere mask etching, this method produces parabolic‐shaped microstructures on diverse planar and curved engineering components.
Yiming Li +5 more
wiley +1 more source
ABSTRACT Layered 2D materials are considered as promising for memristive applications due to their ultimate vertical scalability compared to conventional semiconductor films and pronounced hysteresis properties. Bias‐resolved Raman and Photoluminescence mapping is used to quantify strain from phonon shifts and carrier density from the exciton‐trion ...
Vladislav Kurtash +4 more
wiley +1 more source
Enhanced Resistive Switching Uniformity in Tantalum Oxide Memristor Devices via Copper Implantation
Metal oxide memristor devices typically suffer from uncontrolled forming processes and limited resistive switching uniformity due to the stochastic formation of an oxygen vacancy filament. Improved resistive switching uniformity in Ta2O5 memristor is developed by Cu implantation in the switching oxide.
Shaochuan Chen, Ilia Valov
wiley +1 more source
Industrial engineering applications in metrology: Job scheduling, calibration interval and average outgoing quality [PDF]
This thesis was submitted for the degree of Doctor of Philosophy and was awarded by Brunel UniversityThis research deals with the optimization of metrology and calibration problems.
Al Reeshi, Mohammad Ahmad
core
An alcohol‐adduct‐mediated strategy is employed to stabilize tin isopropoxide for the formation of a homogeneous double electron transport layer (ETL) incorporating SnO2 nanoparticles (NPs). This double‐ETL exhibits improved optical and charge‐transport properties due to reduced defect density and better energy level alignment, resulting in high ...
You‐Hyun Seo +10 more
wiley +1 more source
A unified methodology for the application of surface metrology [PDF]
This thesis addresses the growing "divergence" in the field of surface metrology through the presentation of a practical system for unification. A technical and economic review of applied surface metrology is presented, highlighting the problems ...
Malburg, Mark C.
core
This article outlines how artificial intelligence could reshape the design of next‐generation transistors as traditional scaling reaches its limits. It discusses emerging roles of machine learning across materials selection, device modeling, and fabrication processes, and highlights hierarchical reinforcement learning as a promising framework for ...
Shoubhanik Nath +4 more
wiley +1 more source

