Minimum Aberration Split-Plot Designs Focusing on the Whole Plot Factors [PDF]
In some experiments, the levels of some factors are difficult to change; then fractional factorial split-plot (FFSP) designs are suitable for selection.
Minyang Hu, Shengli Zhao
doaj +2 more sources
Holographic optical scanning elements with minimum aberrations [PDF]
An analytical method to design holographic optical elements for focusing laser scanners, especially disk scanners, with minimum aberrations and optimum scan line definition is reported. The results reveal that the focused spot constraint to a straight line is always astigmatic.
Herzig, Hans-Peter, Dändliker, René
openaire +4 more sources
Selecting baseline designs using a minimum aberration criterion when some two-factor interactions are important [PDF]
This article considers the problem of selecting two-level designs under the baseline parameterisation when some two-factor interactions are important.
Anqi Chen, Cheng-Yu Sun, Boxin Tang
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$2\sp {n-l}$ designs with weak minimum aberration [PDF]
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Chen, Hegang, Hedayat, A. S.
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Generalized minimum aberration for asymmetrical fractional factorial designs [PDF]
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Xu, Hongquan, Wu, C.F.J.
+9 more sources
Minimum aberration blocking schemes for 128-run designs [PDF]
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Xu, Hongquan, Mee, Robert W.
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Minimum aberration designs of resolution III [PDF]
In this article we prove several important properties of 2^{k-p} minimum aberration (MA) designs with k>2, where n=2^{k-p} is the number of runs. We develop a simple method to build MA designs of resolution III. Furthermore, we introduce a simple relationship, based on product of polynomials, for computing their word-length patterns.
Juan, Jesus, Palomo, J. Gabriel
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Blocked regular fractional factorial designs with minimum aberration [PDF]
This paper considers the construction of minimum aberration (MA) blocked factorial designs. Based on coding theory, the concept of minimum moment aberration due to Xu [Statist. Sinica 13 (2003) 691--708] for unblocked designs is extended to blocked designs.
Hongquan Xu
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Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source–Mask Optimization [PDF]
Extreme ultraviolet (EUV) lithography faces critical challenges in aberration control and patterning fidelity as technology nodes shrink below 3 nm. This work demonstrates how Source–Mask Optimization (SMO) simultaneously addresses both illumination and ...
Qi Wang +4 more
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Some theory for constructing minimum aberration fractional factorial designs [PDF]
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Neil A. Butler
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