Results 31 to 40 of about 15,945 (255)
Active Adjustment of the Subreflector Shape for the Large Dual-Reflector Antenna
A shape adjustment method for subreflectors based on minimizing the residual wavefront error of the large dual-reflector antenna is presented. This method is used to compensate for the antenna structural deformation caused by environment loading.
Binbin Xiang +6 more
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Algorithms for finding generalized minimum aberration designs
15 pages.
Dursun A. Bulutoglu, Kenneth Joseph Ryan
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Mohammed Abd Elghaffar Shehata, Mohamed Hassan Hosny, Doaa Ahmed Tolba, Mohamed Attya Department of Ophthalmology, Cairo University, Cairo, EgyptCorrespondence: Mohamed Attya, Department of Ophthalmology, Cairo University, 15th Zahret Alsokar, Alsheikh ...
Abd Elghaffar Shehata M +3 more
doaj
(1) Introduction: We analysed epithelial changes after the treatment of moderate myopia with transepithelial photorefractive keratectomy. (2) Materials and Methods: We used optical coherence tomography data and analysed changes in the stroma and ...
Diego de Ortueta +2 more
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Minimum $G_2$-aberration for nonregular fractional factorial designs [PDF]
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Tang, Boxin, Deng, Lih-Yuan
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An optimized fractional fractal photon sieve (OFFPS) is proposed to generate the tailorable first-order main focus with many subsidiary foci and the low-intensity higher-order diffraction foci.
Tian Xia, Shubo Cheng, Shaohua Tao
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Genotoxicity test of eight natural color additives in the Korean market
Background Various natural color additives are preferred by many consumers over synthetic color additives because they are perceived to be safer. However, most do not have sufficient toxicity data for safety assurance.
Byungkyung Do, Hoonjeong Kwon
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Evaluations of wavefront aberrations and corneal surface regularity in dry eye patients measured with OPD Scan III [PDF]
AIM: To compare the wavefront aberrations and corneal surface regularity between dry eye (DE) patients and normal subjects and assess its diagnostic performance for DE measured with OPD Scan-III.
Rong-Jun Liu +4 more
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5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet (EUV) lithography on a large scale. We have done a simulation study for typical 5 nm logic design rule patterns.
Yanli Li, Qiang Wu, Shoumian Chen
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Algorithmic search for baseline minimum aberration designs [PDF]
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Pei Li, Arden Miller, Boxin Tang
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