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Minimum aberration designs of resolution III
, 2002 In this article we prove several important properties of 2^{k-p} minimum aberration (MA) designs with k>2, where n=2^{k-p} is the number of runs. We develop a simple method to build MA designs of resolution III. Furthermore, we introduce a simple relationship, based on product of polynomials, for computing their word-length patterns.
Juan, Jesus, Palomo, J. Gabriel
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APL Materials, 2014 We studied ZrO2 − La2/3Sr1/3MnO3 pillar–matrix thin films which were found to show anomalous magnetic and electron transport properties. With the application of an aberration-corrected transmission electron microscope, interfacial chemistry, and atomic ...
Dan Zhou +6 more
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CYTOLOGICAL STUDIES OF THE MEIOSIS BEHAVIOUR DIVISION OF (DATURA, ERUCA AND CARDUUS) PLANTS IN HABANIA LAKE OF ANBAR [PDF]
مجلة جامعة الانبار للعلوم الصرفة, 2012 During the study of the behavior of meiosis in 5 anthers in each species of (Datura inoxia(Solanaceae),Eruca sativa(Cruciferae)andCarduus pycnocephalus(Compositae) around the area of Habania leak, Datura plant revealed a moderate number of cells between (
NAJI SWADI NASSER, ENAS ADNIN MANFY
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An easy to construct sub-micron resolution imaging system
Scientific Reports, 2020 We report an easy to construct imaging system that can resolve particles separated by $$\ge $$ ≥ 0.68 $$\upmu $$ μ m with minimum aberrations. Its first photon collecting lens is placed at a distance of 31.6 mm giving wide optical access.
Lakhi Sharma, A. Roy, S. Panja, S. De
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Micromachines, 2014 We present a wide-angle, broad-spectrum cylindrical lens based on reflections from an array of three-dimensional, high-aspect-ratio micro-mirrors fabricated on a cylindrical elastomeric substrate, functionally inspired by natural reflecting superposition
Chi-Chieh Huang, Hongrui Jiang
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Error correction of a phase-only computer-generated hologram for an aspheric surface [PDF]
Journal of the European Optical Society-Rapid Publications, 2014 When applying phase-only computer-generated hologram (CGH) as a standard model of optical measurement in computer-generated holography for aspheric surface testing, it has the advantage of simplifying optical path configuration and improving the ...
Zhang H. +5 more
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Zernike Polynomiales· for Opticl Ssytew. With Borizantal Recta_nguJar Aperture
Ibn Al-Haitham Journal for Pure and Applied Sciences, 2017 For small aberrations, the ·suehl' ratio of an . im i'ng syStem • depends on trne aberration v·ariance. Its· aberration fu.nct1on ·is e:qJanded in terms 9f-l nike polynomials. which are_ oirrh6goilal over a circular apeltitte.
A, ,1J. AL-.llamdani, 8 Y. RAI-As di
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Designing the optimal Fresnel lenses by using Zemax software [PDF]
Journal of Optoelectronical Nanostructures, 2018 In this paper, the optimal Fresnel lenses are designed by Zemax software.The fundamental problem of the Fresnel lenses is the beam divergence, which wasresolved by decreeing the output stain diameter on the image plane.
Alireza Keshavarz +1 more
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An Aliasing Measure of Factor Effects in Three-Level Regular Designs
EntropyFor three-level regular designs, the confounding from the perspectives of both factor and component effects leads to different results. The aliasing properties of factor effects are more significant than the latter in the experimental model.
Qiuying Chen, Zhiming Li, Zhi Li
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A Photolithography Process Design for 5 nm Logic Process Flow
Journal of Microelectronic Manufacturing, 2019 With the introduction of EUV lithography, the photolithographic process in 5 nm logic process can be simplified to use mostly single exposure method. In a typical 5 nm logic process, the contact-poly pitch (CPP) is 44-50 nm, the minimum metal pitch (MPP)
Qiang Wu +3 more
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