Results 171 to 180 of about 124,114 (260)

Can Elastomers Combine Stiffness, Toughness and Fatigue Resistance?

open access: yesAdvanced Materials, EarlyView.
This review studies how the molecular and macroscopic architecture of elastomers influence their mechanical properties including: stiffness, stretchability, toughness, fatigue resistance, and damping behavior. By linking the structure to performance, it proposes design principles for advanced elastomeric systems that combine mechanical properties ...
Eva Baur, Esther Amstad
wiley   +1 more source

Deterministic Nucleation of Nanocrystal Superlattices on 2D Perovskites for Light‐Funneling Heterostructures

open access: yesAdvanced Materials, EarlyView.
This work investigates the heterogeneous nucleation of CsPbBr3${\rm CsPbBr}_3$ nanocrystal superlattices along the faces of 2D PEA2PbBr4${\rm PEA}_2{\rm PbBr}_4$ layered perovskite microcrystals. Core–crown and core–shell heterostructure morphologies are obtained.
Umberto Filippi   +6 more
wiley   +1 more source

Bioinspired Adaptive Surfaces for Intelligent Liquid Manipulation: Progressing From Passive and Active to Hybrid Strategies

open access: yesAdvanced Materials, EarlyView.
This review examines passive, active, and hybrid liquid manipulation strategies, highlighting hybrid approaches as an emerging route to reconcile energy efficiency with adaptive control. By actively reconstructing passive surfaces to store programmable interfacial energy, hybrid systems enable flexible yet low‐power liquid transport, with perspectives ...
Jiaqi Miao   +3 more
wiley   +1 more source

Barrier‐Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS2 Transistors

open access: yesAdvanced Materials, EarlyView.
Barrier‐assisted NH3 plasma doping enables damage‐free, spatially selective carrier modulation in monolayer MoS2 transistors. An ultrathin pV3D3/Al2O3 protective‐dielectric stack acts as a chemical filter that allows NHx radicals to reach the MoS2 surface while blocking plasma damage. This process achieves a high electron concentration of 4.3 × 1013 cm−
Inseong Lee   +15 more
wiley   +1 more source

Chloride Ions: Essential Agents for Achieving Spontaneous Delamination of MXene

open access: yesAdvanced Materials, EarlyView.
This work first identifies chloride ions as essential agents for spontaneous MXene delamination. Without Cl−, etched Ti3C2Tx remains multilayered; with Cl−, interlayer modification enables Li+ intercalation and osmotic swelling. The SPEED process couples HF‐assisted Al extraction, Cl−‐mediated interlayer expansion, and Li+‐driven swelling to produce ...
Sukhyeun Jang   +11 more
wiley   +1 more source

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