Film‐Based Multi‐Photon Lithography for Efficient Printing of Electromagnetic Surface Structures
Advanced Materials Technologies, EarlyView.This work introduces film‐based multi‐photon lithography as an efficient method for fabricating electromagnetic surface structures with 2D and 2.5D geometries, particularly THz and mid‐IR metasurfaces. These structures can be fabricated on various substrates, such as glass or silicon‐on‐insulator, over areas ranging from mm2 to cm2, achieving feature ...
Gordon Zyla +6 more
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Ultrafast 3D nanofabrication via digital holography
Nature Communications, 2023 The application of two-photon lithography has been limited by the low writing speed. The authors reported a multi-focus improved lithography platform that employs up to 2000 laser foci to perform parallel fabrication with 90 nm resolution via optimised ...
Wenqi Ouyang +5 more
doaj +1 more source
Ultra-broadband polarisation beam splitters and rotators based on 3D-printed waveguides
Light: Advanced Manufacturing, 2023 Multi-photon lithography has emerged as a powerful tool for photonic integration, allowing to complement planar photonic circuits by 3D-printed freeform structures such as waveguides or micro-optical elements.
Aleksandar Nesic +6 more
doaj +1 more source
Guiding cell migration in 3D with high-resolution photografting
Scientific Reports, 2022 Multi-photon lithography (MPL) has proven to be a suitable tool to precisely control the microenvironment of cells in terms of the biochemical and biophysical properties of the hydrogel matrix.
Simon Sayer +7 more
doaj +1 more source
3D-printed facet-attached microlenses for advanced photonic system assembly
Light: Advanced Manufacturing, 2023 Wafer-level mass production of photonic integrated circuits (PIC) has become a technological mainstay in the field of optics and photonics, enabling many novel and disrupting a wide range of existing applications. However, scalable photonic packaging and
Yilin Xu +17 more
doaj +1 more source
Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization [PDF]
2023, Applied Optics, 2023 As the feature size of integrated circuits continues to decrease, optical proximity correction (OPC) has emerged as a crucial resolution enhancement technology for ensuring high printability in the lithography process. Recently, level set-based inverse lithography technology (ILT) has drawn considerable attention as a promising OPC solution, showcasing
arxiv +1 more source
Polymerization mechanisms initiated by spatio-temporally confined light
Nanophotonics, 2021 Ultrafast laser 3D lithography based on non-linear light–matter interactions, widely known as multi-photon lithography (MPL), offers unrivaled precision rapid prototyping and flexible additive manufacturing options.
Skliutas Edvinas +8 more
doaj +1 more source
Resilient Calcination Transformed Micro-Optics
Engineering Proceedings, 2023 Three-dimensional multiphoton laser lithography of hybrid resins has been shown to be a viable tool for producing micro-optical functional components.
Darius Gailevicius +2 more
doaj +1 more source
Anti-Reflective Coatings Produced via Atomic Layer Deposition for Hybrid Polymer 3D Micro-Optics
Nanomaterials, 2023 The increasing demand for optics quality requires the lowest optical power loss, which can occur from unwanted reflections. Laser direct writing (LDW) allows for the fabrication of complex structures, which is particularly advantageous in micro-optic ...
Darija Astrauskytė +5 more
doaj +1 more source
Multi-Focal Laser Direct Writing through Spatial Light Modulation Guided by Scalable Vector Graphics
Micromachines, 2023 Multi-focal laser direct writing (LDW) based on phase-only spatial light modulation (SLM) can realize flexible and parallel nanofabrication with high-throughput potential.
Linhan Duan +6 more
doaj +1 more source