Results 51 to 60 of about 1,669 (167)
Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" [PDF]
arXiv, 2003 Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.
arxiv
Enhancement of optical response in nanowires by negative-tone PMMA lithography [PDF]
, 2018 The method of negative-tone-PMMA electron-beam lithography is investigated to improve the performance of nanowire-based superconducting detectors. Using this approach, the superconducting nanowire single-photon detectors (SNSPDs) have been fabricated from thick 5-nm NbN film sputtered at the room temperature.
arxiv +1 more source
Responsive Molecules for Organic Neuromorphic Devices: Harnessing Memory Diversification
Advanced Materials, EarlyView.Responsive molecules are essential for organic in‐sensor computing devices. This Review highlights recent advances in thedesign, synthesis, and incorporation of electrically, optically, and magnetically responsive molecules in multifunctional synaptic perception devices endowedwith both nonvolatile and volatile memory diversification. By exploiting the
Yusheng Chen +4 more
wiley +1 more source
Layout Decomposition for Quadruple Patterning Lithography and Beyond [PDF]
arXiv, 2014 For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patterning lithography (QPL) for sub-10nm. In this paper, we propose a generic and robust layout decomposition framework for QPL, which can be further extended to handle any ...
arxiv
Enhancement of superconductivity in NbN nanowires by negative electron-beam lithography with positive resist [PDF]
, 2017 We performed comparative experimental investigation of superconducting NbN nanowires which were prepared by means of positive-and negative electron-beam lithography with the same positive tone Poly-methyl-methacrylate (PMMA) resist. We show that nanowires with a thickness 4.9 nm and widths less than 100 nm demonstrate at 4.2 K higher critical ...
arxiv +1 more source
Flexible 3D Kirigami Probes for In Vitro and In Vivo Neural Applications
Advanced Materials, EarlyView.A customizable and scalable approach to fabricate flexible 3D kirigami microelectrode arrays (MEAs) featuring up to 128 shanks, including surface and penetrating electrodes designed to interact with the 3D space of neural tissue, is presented. The 3D kirigami MEAs are successfully deployed in several neural applications, both in vitro and in vivo, and ...
Marie Jung +10 more
wiley +1 more source
A Review of Proximity Effect Correction in Electron-beam Lithography [PDF]
arXiv, 2015 I review the work of proximity effect correction (PEC) in electron-beam (e-beam) lithography with emphasis on dose modification and shape modification PEC techniques.
arxiv
Photonic Nanomaterials for Wearable Health Solutions
Advanced Materials, EarlyView.This review discusses the fundamentals and applications of photonic nanomaterials in wearable health technologies. It covers light‐matter interactions, synthesis, and functionalization strategies, device assembly, and sensing capabilities. Applications include skin patches and contact lenses for diagnostics and therapy. Future perspectives emphasize AI‐
Taewoong Park +3 more
wiley +1 more source
Analysis of Lithography Based Approaches In development of Semi Conductors [PDF]
, 2015 The end of the 19th century brought about a change in the dynamics of computing by the development of the microprocessor. Huge bedroom size computers began being replaced by portable, smaller sized desktops. Today the world is dominated by silicon, which has circumscribed chip development for computers through microprocessors.
arxiv +1 more source