Results 151 to 160 of about 2,601 (165)
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Projection XEUV-nanolithography
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2009A short review of present state of the art of projection photolithography is given. Progress and main problems of the EUV lithography have received primary consideration. Advantages of using synchrotrons as sources of EUV radiation in commercial EUV scanners are considered. Present state of the art of EUV lithography in Russia is reported.
N.N. Salashchenko, N.I. Chkhalo
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Nanolithography with metastabile helium
Applied Physics B Laser and Optics, 1996We have used a self-assembling monolayer of dodecanethiole molecules as the resist for a lithography technique based on a beam of metastable helium atoms. Doses as low as 3 metastable helium atoms per 10 molecules are enough to write patterns into this resist. An edge resolution of 30 nanometers is demonstrated.
Tilman Pfau, J. Mlynek, S. Nowak
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Plasmonic Nanolithography: A Review
Plasmonics, 2011Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation ...
Hongxin Zhang +8 more
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Block Copolymer Nanolithography [PDF]
, 2017 The development of photolithography has been the main driving force of the semiconductor industry to keep pace with Moore’s Law for over five decades. The theoretical resolution limit of state-of-the-art 193 nm photolithography is about 36 nm (half pitch).
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Overview of nanolithography in Europe
Proceedings. International Semiconductor Conference, 2003Summary form only given. Lithography is still the enabler technology, allowing movement along the roadmap, and new developments in this field are often led by European teams, whether academic or industrial ones. This paper looks in depth into nanolithography activities in Europe, which in fact cover a broad spectrum of technologies, from electron-beam ...
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Nanolithography, The Integrated System
1994Generations of micron and sub-micron devices have been built based on the availability and extendibility of “conventional” technologies as they are used today in 4 Mbit DRAM and 16 Mbit DRAM. This holds true for the device technology, for lithography, and many other device related building blocks as well. With the recent demonstration of fully scaled 0.
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