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Nanolithography in microelectronics: A review
Technical Physics, 2011The current status of basic photolithographic techniques allowing researchers to achieve results that seemed to be unrealistic even a short time ago is reviewed. For example, advanced DUV photolithography makes it possible to exactly reproduce IC elements 25 times smaller in size than the wavelength of an excimer laser used as a lithographic tool ...
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Nanolithography with metastabile helium
Applied Physics B Laser and Optics, 1996We have used a self-assembling monolayer of dodecanethiole molecules as the resist for a lithography technique based on a beam of metastable helium atoms. Doses as low as 3 metastable helium atoms per 10 molecules are enough to write patterns into this resist. An edge resolution of 30 nanometers is demonstrated.
Tilman Pfau, J. Mlynek, S. Nowak
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1986
Lithography plays a central role in the fabrication of electronic devices, and is essential in the preparation of samples for studies of transport in 1-D. The minimum feature size required in the device is important in the choice of lithographic method.
S. P. Beaumont, C. D. W. Wilkinson
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Lithography plays a central role in the fabrication of electronic devices, and is essential in the preparation of samples for studies of transport in 1-D. The minimum feature size required in the device is important in the choice of lithographic method.
S. P. Beaumont, C. D. W. Wilkinson
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Nanolithography with an atomic force microscope
Superlattices and Microstructures, 1996Abstract A lithographic technique, employing the vibrating tip of an atomic force microscope to mechanically pattern various materials such as photoresist, metals or semiconductors in the nanometre regime has been developed. We use this technique for the fabrication of etch masks as well as for the patterning of evaporation shadow masks.The tip ...
Wendel, M. +7 more
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Overview of nanolithography in Europe
Proceedings. International Semiconductor Conference, 2003Summary form only given. Lithography is still the enabler technology, allowing movement along the roadmap, and new developments in this field are often led by European teams, whether academic or industrial ones. This paper looks in depth into nanolithography activities in Europe, which in fact cover a broad spectrum of technologies, from electron-beam ...
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Block Copolymer Nanolithography [PDF]
, 2017 The development of photolithography has been the main driving force of the semiconductor industry to keep pace with Moore’s Law for over five decades. The theoretical resolution limit of state-of-the-art 193 nm photolithography is about 36 nm (half pitch).
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Nanolithography, The Integrated System
1994Generations of micron and sub-micron devices have been built based on the availability and extendibility of “conventional” technologies as they are used today in 4 Mbit DRAM and 16 Mbit DRAM. This holds true for the device technology, for lithography, and many other device related building blocks as well. With the recent demonstration of fully scaled 0.
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Nanolithography and patterning techniques in microelectronics
2005Copolymer ordering Templated synthesis for controlled 3D structural control Surface-induced structure formation of polymer blends Rapid prototyping of functional microfabricated devices by soft lithography Control of polymer topography AFM based patterning Patterning of confined polymer thin films Ion beam patterning Nanoprinting techniques ...
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