Results 261 to 270 of about 9,351 (286)
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Physical Chemistry, Chemical Physics - PCCP, 2017
Controlling the microstructure of monolayers of microgels confined at a water/oil interface is the key to their successful application as nanolithography masks after deposition on a solid substrate.
Laura Scheidegger +6 more
semanticscholar +1 more source
Controlling the microstructure of monolayers of microgels confined at a water/oil interface is the key to their successful application as nanolithography masks after deposition on a solid substrate.
Laura Scheidegger +6 more
semanticscholar +1 more source
Structural Consequences of Ferroelectric Nanolithography
Nano Letters, 2011Domains of remnant polarization can be written into ferroelectrics with nanoscale precision using scanning probe nanolithography techniques such as piezoresponse force microscopy (PFM). Understanding the structural effects accompanying this process has been challenging due to the lack of appropriate structural characterization tools.
Martin V. Holt +11 more
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Surface Plasmon Interference Nanolithography
Nano Letters, 2005A new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their frequencies remain in the optical range. As a result, the resolution of this surface
Xiang Zhang, Zhaowei Liu, Qi-Huo Wei
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1986
Lithography plays a central role in the fabrication of electronic devices, and is essential in the preparation of samples for studies of transport in 1-D. The minimum feature size required in the device is important in the choice of lithographic method.
S. P. Beaumont, C. D. W. Wilkinson
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Lithography plays a central role in the fabrication of electronic devices, and is essential in the preparation of samples for studies of transport in 1-D. The minimum feature size required in the device is important in the choice of lithographic method.
S. P. Beaumont, C. D. W. Wilkinson
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Projection XEUV-nanolithography
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2009A short review of present state of the art of projection photolithography is given. Progress and main problems of the EUV lithography have received primary consideration. Advantages of using synchrotrons as sources of EUV radiation in commercial EUV scanners are considered. Present state of the art of EUV lithography in Russia is reported.
N.N. Salashchenko, N.I. Chkhalo
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Overview of nanolithography in Europe
Proceedings. International Semiconductor Conference, 2003Summary form only given. Lithography is still the enabler technology, allowing movement along the roadmap, and new developments in this field are often led by European teams, whether academic or industrial ones. This paper looks in depth into nanolithography activities in Europe, which in fact cover a broad spectrum of technologies, from electron-beam ...
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Nanolithography in microelectronics: A review
Technical Physics, 2011The current status of basic photolithographic techniques allowing researchers to achieve results that seemed to be unrealistic even a short time ago is reviewed. For example, advanced DUV photolithography makes it possible to exactly reproduce IC elements 25 times smaller in size than the wavelength of an excimer laser used as a lithographic tool ...
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Nanolithography with metastabile helium
Applied Physics B Laser and Optics, 1996We have used a self-assembling monolayer of dodecanethiole molecules as the resist for a lithography technique based on a beam of metastable helium atoms. Doses as low as 3 metastable helium atoms per 10 molecules are enough to write patterns into this resist. An edge resolution of 30 nanometers is demonstrated.
Tilman Pfau, J. Mlynek, S. Nowak
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Nanolithography with an atomic force microscope
Superlattices and Microstructures, 1996Abstract A lithographic technique, employing the vibrating tip of an atomic force microscope to mechanically pattern various materials such as photoresist, metals or semiconductors in the nanometre regime has been developed. We use this technique for the fabrication of etch masks as well as for the patterning of evaporation shadow masks.The tip ...
Wendel, M. +7 more
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, 2017
For ultrahigh-density storage media and D-RAM, the feature size of lithography should be much reduced (say less than 10 nm). Though some research groups reported feature size of 5–6 nm, further reduced feature size is needed for next-generation ...
Jongheon Kwak +7 more
semanticscholar +1 more source
For ultrahigh-density storage media and D-RAM, the feature size of lithography should be much reduced (say less than 10 nm). Though some research groups reported feature size of 5–6 nm, further reduced feature size is needed for next-generation ...
Jongheon Kwak +7 more
semanticscholar +1 more source