Results 211 to 220 of about 363,387 (304)

Robust motion detection and classification in real-life scenarios using motion vectors. [PDF]

open access: yesPLoS One
Rehman SU   +7 more
europepmc   +1 more source

Cardiac‐Derived ECM Microspheres for Enhanced hiPSC‐CMs Maturation

open access: yesAdvanced Functional Materials, EarlyView.
Cardiac extracellular matrix microspheres derived from decellularized porcine heart provide a biomimetic 3D microenvironment for human induced pluripotent stem cell–derived cardiomyocytes (hiPSC‐CMs). This platform supports short‐ and long‐term culture, enhances structural organization, and promotes electrophysiological and functional maturation of ...
Jiazhu Xu   +9 more
wiley   +1 more source

Transparent UV‐Curable Self‐Sanitizing Coatings Applicable to Diverse Surfaces and High‐Touch Screens to Mitigate Deadly Pathogen Transmission

open access: yesAdvanced Functional Materials, EarlyView.
Development of a transparent, self‐sanitizing antimicrobial coating technology applicable to a wide range of materials and surfaces‐including touchscreens, transparent substrates, and metal, plastic, and glass‐regardless of pathogen type. The spray‐coated, UV‐cross‐linked imidazole‐based quaternary ammonium chloride materials provide broad‐spectrum ...
Surjith Kumaran   +6 more
wiley   +1 more source

Three‐Dimensional Hierarchical Nanowire‐Networks with Deep‐Focus Tolerance and Adhesion Robustness for Harsh‐Environment SERS Sensing

open access: yesAdvanced Functional Materials, EarlyView.
A 3D nanowire‐network SERS substrate with robust adhesion is developed, featuring pronounced z‐direction optical activity, ultralow detection limit (1.5 × 10−13 M), and excellent signal uniformity (RSD < 10%). Enabled by enhanced light scattering, increased optical density of states, and structural reinforcement, the substrate demonstrates stable, high‐
Jinglai Duan   +6 more
wiley   +1 more source

Tin‐Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity

open access: yesAdvanced Functional Materials, EarlyView.
Fluoroalkyl‐functionalized tin–oxo nanoclusters (N‐TOC6) enable robust pattern formation through ligand crosslinking under EUV exposure without thermal processing. Sn–F coordination mitigates the Lewis acidity of Sn centers, suppressing reactions with airborne molecules and improving post‐exposure pattern stability.
Yejin Ku   +18 more
wiley   +1 more source

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