Results 231 to 240 of about 7,739 (249)

A Novel Technique for Dressing Fixed Abrasive Lapping Pad with Abrasive Water Jet

International Journal of Precision Engineering and Manufacturing - Green Technology, 2023
Zhankui Wang, Yakun Yang, Minghua Pang   +2 more
exaly  

Study on diamond dressing for non-uniformity of pad surface topography in CMP process

International Journal of Advanced Manufacturing Technology, 2017
Chao-Chang A Chen, Quôc-Phóng Pham
exaly  

Study on pad cutting rate and surface roughness in diamond dressing process

International Journal of Precision Engineering and Manufacturing, 2017
Quôc-Phóng Pham, Chao-Chang A Chen
exaly  

Novel diamond conditioner dressing characteristics of CMP polishing pad

International Journal of Machine Tools and Manufacture, 2009
Ming-Yi Tsai, Shun-Tong Chen, Yunn-Shiuan Liao   +2 more
exaly  

A Study on the Dressing Rate in CMP Pad Conditioning

Key Engineering Materials, 2004
Pei Lum Tso
exaly  

21211 Study on mechanism of polishing pad surface dressing

The Proceedings of Conference of Kanto Branch, 2013
Hirokuni Hiyama, Hisanori Matsuo
exaly  

Water-jet-assisted diamond disk dressing characteristics of CMP polishing pad

International Journal of Advanced Manufacturing Technology, 2011
Ming-Yi Tsai
exaly  

Single Diamond Dressing Characteristics of CMP Polyurethane Pad

Key Engineering Materials, 2007
Yunn Shiuan Liao, James C Sung
exaly  

606 Study on dressing mechanism R)r the polishing pad surface

The Proceedings of Conference of Kyushu Branch, 2012
Hisanori Matsuo, Yutaka Wada, Hirokuni Hiyama   +2 more
exaly  

DRESSING CHARACTERISTICS OF ORIENTED SINGLE DIAMOND ON CMP POLYURETHANE PAD

Machining Science and Technology, 2009
Y S Liao
exaly