Results 241 to 250 of about 184,922 (274)

Development of Gelatin Hydrogel Pads as Antibacterial Wound Dressings

Macromolecular Bioscience, 2009
AbstractGelatin hydrogel pads have been prepared from a 10 wt.‐% gelatin solution that contained 2.5 wt.‐% AgNO3 in 70% v/v acetic acid by a solvent‐casting technique. The AgNO3‐containing gelatin solution was aged under mechanical stirring for various time intervals to allow for the formation of silver nanoparticles (nAgs).
Vichayarat, Rattanaruengsrikul, Nuttaporn, Pimpha, Pitt, Supaphol   +2 more
openaire   +2 more sources

Impact of PCB Pad Site Dress Methods on Pad Array Damage

Pan Pacific Symposium, 2009
ABSTRACT There is scant data available to the process engineer to support the choice of PCB pad site dress methods from the perspective of potential printed circuit board damage. The thermal profile experienced by the pad array can have a profound impact on latent PCB damage, including the presence or absence of pad cratering. In this
Laurence A. Harvilchuck, Brian Roggeman, Raiyo F. Aspandiar, James M. Wade, Gaurav Godbole   +4 more
openaire   +1 more source

PCB Pad Site Dress Methods on BGA and Socket Pad Arrays

SMTA International, 2010
ABSTRACT This study compares manual and semi-automated Printed Circuit Board (PCB) Pad Site Dress Methods. Each method is analyzed to understand which method can prevent board damage to the PCB pads such as pad lift, pad cratering and solder mask web damage on various Ball Grid Array (BGA) package types.
James Wade, Raiyo Aspandiar, Don Naugler, Terry Leahy   +3 more
openaire   +1 more source

Novel diamond conditioner dressing characteristics of CMP polishing pad

International Journal of Machine Tools and Manufacture, 2009
A diamond pad conditioner or dresser is required to regenerate the asperity structure of a pad used in chemical mechanical polishing (CMP). A conventional diamond dresser (CDD) is made by attaching discrete diamond grits to the flat surface of a substrate.
Shun-Tong Chen, Ming-Yi Tsai, Yunn‐Shiuan Liao   +2 more
exaly   +2 more sources

Defect reduction with CMP pad dressing optimization

Proceedings of International Conference on Planarization/CMP Technology 2014, 2014
CMP is regarded as a process to remove material from wafer surface. And lots of mixture will be created from polishing interface. Consumables, such like pad, retainer ring, dresser and membrane will be consumed during polishing. Furthermore, abrasive, slurry chemicals and wafer surface material will have some specific interaction through well designed ...
Yi-Liang Liu, Wu-Sian Sie, Chun-Lin Chen, P.C. Huang, Yu-Ting Li, Renn Guey Lin, Yu Min Lin, Hisn-Kuo Hsu, Oliver Wang, J. F. Lin, J. Y. Wu   +10 more
openaire   +1 more source

PCD dresser for dressing CMP polyurethane pads

International Journal of Abrasive Technology, 2010
This paper investigating a revolutionary design of pad conditioners is based on carving a structure out of sintered polycrystalline diamond (PCD) matrix. The PCD dresser is manufactured by wire electro discharge machining to form cutting pyramids of a specific size with a designed shape.
M.Y. Tsai, J.C. Sung
exaly   +2 more sources

Comparison of a Semipermeable Dressing Bonded to an Absorbent Pad and a Semipermeable Dressing Over a Separate Gauze Pad for Containment of Vaccinia Virus at the Vaccination Site

Infection Control & Hospital Epidemiology, 2007
Objective.To compare the ability of 2 types of dressings to contain vaccinia virus after smallpox vaccination.Design.Prospective, nonrandomized trial.Setting.The smallpox vaccination clinic in a medium-sized military hospital.Participants.Ninety-seven active-duty military members who received smallpox vaccination in accordance with US Department of ...
Michael R, Savona, Wilfred P Dela, Cruz, Jennifer A, Thornton, Patrick J, Danaher   +3 more
openaire   +2 more sources

A model to simulate surface roughness in the pad dressing process

Journal of Mechanical Science and Technology, 2007
Pad dressing, which is one of the most important planarization processes, is widely used in CMP. The estimation of surface roughness under various machining parameters (such as dressing force, diamond density of the dresser, rotational speed of the dresser, different machining paths, etc.) is essential to the pad dressing process.
exaly   +2 more sources

Dressing Behaviors of PCD Conditioners on CMP Polishing Pads

Advanced Materials Research, 2009
Diamond pad conditioner or dresser can determine the efficiency of chemical mechanical polishing (CMP) processes and the quality of polished wafers. Conventional diamond pad conditioners are made by adhering discrete diamond grits on a flat substrate.
M.Y. Tsai, James C. Sung
openaire   +1 more source

AN IMPROVED RECTAL DRESSING PAD AND BINDER

JAMA: The Journal of the American Medical Association, 1926
Though it will be granted that the ordinary T-binder is one of the traditions of rectal surgery, frequent employment of it invariably leads to the conclusion that it is not a particularly convenient or efficient device with which to hold in place dressings applied to the perineum.
openaire   +1 more source