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Interferometer for phase measurements in phase-shift masks

SPIE Proceedings, 1993
The etch depth of phase shift masks is typically measured by means of profilometry and the expected phase shift is calculated from a knowledge of the refractive index at the lithographic wavelength of interest. In the case of masks utilizing deposited films the index may differ from values for bulk materials and commonly varies to some degree with ...
Derek B. Dove   +2 more
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Broadband nulling of a vortex phase mask

Optics Letters, 2005
A pulse transmitted through a helical vortex phase mask undergoes a temporal Hilbert transform. The fluence transmitted into the unfavorable plane wave mode is found to increase as the square of the bandwidth and, to first order, is independent of the topological charge.
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Phase correct routing for alternating phase shift masks

Proceedings of the 41st annual Design Automation Conference, 2004
In this paper, we investigate routing restrictions that enable the generation of "correct by construction" layouts for Dark Field AltPSM. Existing routers produce designs in which coloring errors are numerous, and up to 15% of the pin locations in macros may cause unavoidable coloring errors.
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Attenuated Phase-Shifting Mask

2009
If the opaque regions on a COG mask become partially transmitting with a 180° phase relative to the bright regions, as shown in Fig. 6.1, an attenuated PSM results [15, 16]. As opposed to an alternating PSM where all phase regions image onto the wafer, the partially transmitting background of an attenuated PSM—usually with an intensity transmission ...
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