Results 231 to 240 of about 560,854 (291)
Facile, etch-free atomic layer-coated resist templates for rapid prototyping of efficient visible metasurfaces. [PDF]
Seong J +8 more
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Simplified aluminum nitride processing for low-loss integrated photonics and nonlinear optics. [PDF]
Yan H +14 more
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Real-time identification and quantification of apple scab on fruit in preharvest and postharvest conditions using YOLO11: a deep learning approach. [PDF]
Leiva F, Rebeaud SG, Christen D.
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High-Resolution Diffusion-Weighted Imaging With Self-Gated Self-Supervised Unrolled Reconstruction. [PDF]
Tan Z +4 more
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Impact of Phase Defects on the Aerial Image in High NA Extreme Ultraviolet Lithography. [PDF]
He K, Zeng Z.
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SPIE Proceedings, 2001
We propose and demonstrate a new method to fabricate volume phase mask in LiNbO 3 :Fe crystal by photorefractive effect, for the first time to our knowledge. First, we image an amplitude mask with corresponding intensity distribution at the incident face of a photorefractive LiNbO 3 :Fe crystal.
Haidong Wen +7 more
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We propose and demonstrate a new method to fabricate volume phase mask in LiNbO 3 :Fe crystal by photorefractive effect, for the first time to our knowledge. First, we image an amplitude mask with corresponding intensity distribution at the incident face of a photorefractive LiNbO 3 :Fe crystal.
Haidong Wen +7 more
openaire +1 more source
White-light photorefractive phase mask
Applied Optics, 2005A volume photorefractive phase mask has been fabricated with incoherent white light from an incandescent source in LiNbO3:Fe self-defocusing photorefractive crystal for the first time, to our knowledge. It can guide and modulate a probe white light or a laser beam and can be used to transmit an incoherent dark image as the guided modes of the ...
Yuanmei, Gao +4 more
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Interferometric characterization of phase masks
Applied Optics, 2003We demonstrate a novel interferometric technique for highly accurate characterization of phase masks used in optical fiber grating fabrication. The principle of the measurement scheme is based on the analysis of the interference pattern formed between the first- and zero-order beams transmitted through or reflected from the grating under test.
Mikhail, Sumetsky +5 more
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