Results 241 to 250 of about 560,854 (291)
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Pixelated phase-mask dynamic interferometer
SPIE Proceedings, 2004We have demonstrated a new type of dynamic measurement system that is comprised of a micropolarizer array and can work with any type polarization interferometer to measure a variety of physical properties. The unique configuration overcomes many of the limitations of previous single frame, phase-shift interferometer techniques.
James Millerd +5 more
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Random Phase Data Masks: Fabrication Tolerances and Advantages of Four Phase Level Masks
Applied Optics, 1972An analysis is presented of the intensity variations in the Fourier transform plane resulting from the use of a bilevel random phase mask for holographic data recording as suggested by Burckhardt. To maintain a fixed ratio of peak intensities between in-phase amplitude components and out-of-phase components for an imperfect phase mask, the permissible ...
W C, Stewart, A H, Firester, E C, Fox
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Trapezoidal phase mask coronagraph
Chinese Optics Letters, 2015An angular trapezoidal phase mask used for a wideband coronagraph is proposed. The azimuthal phase of the mask is double-periodic and has both trapezoidal and constant parts in each period. This kind of continuous phase distribution can be employed to avoid the abrupt phase variation of the 6-level phase distribution we proposed previously.
Zichen Cao Zichen Cao +4 more
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Transparent phase shifting mask
International Technical Digest on Electron Devices, 2002A transparent phase shifting mask has been demonstrated to improve the resolution of the conventional i-line stepper and to facilitate the fabrication of various deep submicron patterns for VLSI. This mask, having a single patterned layer of phase shifter, can be easily fabricated, and it is easy to inspect and repair compared to the conventional phase
H. Watanabe, Y. Todokoro, M. Inoue
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Optically controlled imaging phase mask element
Optics Letters, 1996We demonstrate a new optical element consisting of a phase mask made of a nonlinear material. The element uses the nonlinearity to produce an intensity-dependent lens that controls its imaging properties. We demonstrate this element by optically controlling the imaging of an array produced by a diffractive spot generator in direct contact with a thin ...
S D, Vartak, N M, Lawandy
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Phase calibration for attenuating phase-shift masks
SPIE Proceedings, 2006A phase metrology pattern for attenuating phase masks. The phase error of this pattern can be determined to high accuracy by aerial image measurements. This pattern can be used to create an optical phase standard for calibrating phase metrology equipment for attenuated phase masks, or as a witness pattern on a product mask to verify the phase accuracy ...
Michael S. Hibbs, Timothy A. Brunner
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Nanopatterning with conformable phase masks
Journal of Photochemistry and Photobiology A: Chemistry, 2004Abstract This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal ...
Maria, J +2 more
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Simpler attenuated phase-shifting mask
SPIE Proceedings, 2000The structure, principle and manufacturing process of a single layer attenuated phase-shifting mask which is compatible with the traditional Cr mask fabrication technology are introduced in the paper. Partial experimental results are provided.
Jin Zhang +8 more
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Measurement of phase-shift masks
SPIE Proceedings, 1993We discuss in this paper the use of the confocal microscope and an interferometric microscope for measurement of phase-shift masks. It is shown that phase measurements are more accurate than intensity measurements for determining the depth and slope of the sides of a notch.
Fang C. Chang +4 more
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X-ray phase mask: nanostructures
SPIE Proceedings, 1997In this paper we report the results of simulations and experiments on application of phase-shifting mask to x-ray lithography (XPM). We have built an XPM with PMMA as a phase shifter; we printed patterns using the XPM and characterized the linewidth dependence on gap and dose. Small lines around 70 nm were printed at 25 micrometer gap. The resist lines
Zheng Chen +3 more
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