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Attenuated Phase-Shifting Mask

2009
If the opaque regions on a COG mask become partially transmitting with a 180° phase relative to the bright regions, as shown in Fig. 6.1, an attenuated PSM results [15, 16]. As opposed to an alternating PSM where all phase regions image onto the wafer, the partially transmitting background of an attenuated PSM—usually with an intensity transmission ...
openaire   +1 more source

Using an Elastomeric Phase Mask for Sub-100 nm Photolithography in the Optical Near Field

Applied Physics Letters, 1997
Jinghua Li   +2 more
exaly  

Optimized Phase Pupil Masks for Extended Depth of Field

Optics Communications, 2007
Liren Liu, Qingguo Yang
exaly  

ALTERNATING PHASE MASK

2001
FRIEDRICH CHRISTOPH   +5 more
openaire   +2 more sources

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