Results 261 to 270 of about 165,978 (305)

Nanopatterning with conformable phase masks

Journal of Photochemistry and Photobiology A: Chemistry, 2004
Abstract This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal ...
Maria, J, Jeon, S Jeon, Seokwoo, Rogers, JA   +2 more
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Measurement of phase-shift masks

SPIE Proceedings, 1993
We discuss in this paper the use of the confocal microscope and an interferometric microscope for measurement of phase-shift masks. It is shown that phase measurements are more accurate than intensity measurements for determining the depth and slope of the sides of a notch.
Fang C. Chang, Gordon S. Kino, William K. Studenmund, Stanley S. C. Chim, Ching-Hua Chou   +4 more
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Broadband nulling of a vortex phase mask

Optics Letters, 2005
A pulse transmitted through a helical vortex phase mask undergoes a temporal Hilbert transform. The fluence transmitted into the unfavorable plane wave mode is found to increase as the square of the bandwidth and, to first order, is independent of the topological charge.
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Transparent phase shifting mask

International Technical Digest on Electron Devices, 2002
A transparent phase shifting mask has been demonstrated to improve the resolution of the conventional i-line stepper and to facilitate the fabrication of various deep submicron patterns for VLSI. This mask, having a single patterned layer of phase shifter, can be easily fabricated, and it is easy to inspect and repair compared to the conventional phase
H. Watanabe, Y. Todokoro, M. Inoue
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Phase correct routing for alternating phase shift masks

Proceedings of the 41st annual Design Automation Conference, 2004
In this paper, we investigate routing restrictions that enable the generation of "correct by construction" layouts for Dark Field AltPSM. Existing routers produce designs in which coloring errors are numerous, and up to 15% of the pin locations in macros may cause unavoidable coloring errors.
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Pixelated phase masks and their synthesis

Moscow University Physics Bulletin, 2007
An approach to the design of holograms and masks for optical lithography is proposed on the basis of digitizing an image and dividing the sample into three phase components defined on a special bitmap. The equivalence conditions of the continuous and discrete methods of specifying a transmission function are studied.
G. V. Belokopytov, Yu. V. Korotkova
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Trapezoidal phase mask coronagraph

Chinese Optics Letters, 2015
An angular trapezoidal phase mask used for a wideband coronagraph is proposed. The azimuthal phase of the mask is double-periodic and has both trapezoidal and constant parts in each period. This kind of continuous phase distribution can be employed to avoid the abrupt phase variation of the 6-level phase distribution we proposed previously.
Zichen Cao Zichen Cao, Qing Cao Qing Cao, Yajun Ge Yajun Ge, Rongfei Hu Rongfei Hu, Minning Zhu Minning Zhu   +4 more
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IntenCD and mask phase uniformity

SPIE Proceedings, 2010
The allowable wafer Critical Dimension Uniformity (CDU) budget of the 2x node poses stringent requirements on mask induced errors at wafer level. The total CDU budget of 2 nm which is partially consumed by across wafer and field process and imaging variations, leaves little room for additional mask errors to still comply to the overall CDU budget ...
Yaron Cohen, Shmoolik Mangan, Shay Attal, Michael Ben-Yishay, Ilan Englard   +4 more
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Metrology for phase-shifting masks

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1993
Metrology test reticles that include a wide variety of structures typically encountered on phase-shifting masks were fabricated using a subtractive process. The test masks have been used to assess the ability of metrology instruments to measure linewidth, height, edge slope, roughness, critical dimension uniformity, and placement of the various ...
H. M. Marchman, S. Vaidya, C. Pierrat, J. Griffith   +3 more
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Mask topography effects in projection printing of phase-shifting masks

IEEE Transactions on Electron Devices, 1994
Topography effects of glass edges in phase-shifting masks (PSM's) on image quality are assessed using the rigorous electromagnetic simulation program TEMPEST on three different optical systems for four PSM technologies including alternating, rim, attenuated, and chromeless.
A.K. Wong, A.R. Neureuther
openaire   +1 more source