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Attenuated Phase-Shifting Mask
2009If the opaque regions on a COG mask become partially transmitting with a 180° phase relative to the bright regions, as shown in Fig. 6.1, an attenuated PSM results [15, 16]. As opposed to an alternating PSM where all phase regions image onto the wafer, the partially transmitting background of an attenuated PSMâusually with an intensity transmission ...
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Using an Elastomeric Phase Mask for Sub-100 nm Photolithography in the Optical Near Field
Applied Physics Letters, 1997Jinghua Li +2 more
exaly
Optimized Phase Pupil Masks for Extended Depth of Field
Optics Communications, 2007Liren Liu, Qingguo Yang
exaly
Phase shift mask, blank for phase shift mask, and method of manufacturing phase shift mask
1999NAKAO SHUJI +2 more
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Design of Reconfigurable and Structured Spiral Phase Mask for Optical Security System
Optics Communications, 2016Xueju Shen
exaly

