Results 21 to 30 of about 73,280 (324)
UV-Photolithography Fabrication of Poly-Ethylene Glycol Hydrogels Encapsulated with Hepatocytes [PDF]
, 2006 The development of biomanufacturing technologies particularly, layered manufacturing has advanced cell encapsulation processes in an effort to mimic the cellular microenvironment for invitro studies.
Chang, R., Starly, B., Sun, W.
core +1 more source
The Variables and Invariants in the Evolution of Logic Optical Lithography Process
Journal of Microelectronic Manufacturing, 2019 Photolithography has been a major enabler for the continuous shrink of the semiconductor manufacturing design rules. Throughout the years of the development of the photolithography, many new technologies have been invented and successfully implemented ...
Qiang Wu
doaj +1 more source
Advanced Materials Interfaces, 2023 The alluring optoelectronic properties of lead halide perovskites have continued to attract enormous interest from the scientific community. They are among the brightest candidates for future optoelectronic devices.
Gokul M. A., Atikur Rahman
doaj +1 more source
Information, 2023 In photolithographic processes, nanometer-level-precision wavefront-aberration models enable the machine to be able to meet the overlay (OVL) drift and critical dimension (CD) specifications.
Aris Magklaras +4 more
doaj +1 more source
Multi-silicon ridge nanofabrication by repeated edge lithography [PDF]
, 2009 We present a multi-Si nanoridge fabrication scheme and its application in nanoimprint\ud lithography (NIL). Triple Si nanoridges approximately 120 nm high and 40 nm wide separated\ud by 40 nm spacing are fabricated and successfully applied as a stamp in ...
Berenschot, J.W. +5 more
core +4 more sources
Nonlinear optical properties of photoresists for projection lithography [PDF]
, 1996 Optical beams are self-focused and self-trapped upon initiating crosslinking in photoresists. This nonlinear optical phenomenon is apparent only for low average optical intensities and produces index of refraction changes as large as 0.04.
Kewitsch, Anthony S., Yariv, Amnon
core +1 more source
Nanomaterials, 2022 The formation of polymeric micro-patterns on various substrates via a photolithography procedure has been widely used in semiconductor fabrication. Standard polymer patterns are usually fabricated via photosensitive polymer varnishes, in which large ...
Yan-shuang Gao +9 more
doaj +1 more source
Shape-controlled single-crystal growth of InP at low temperatures down to 220 °C. [PDF]
, 2020 III-V compound semiconductors are widely used for electronic and optoelectronic applications. However, interfacing III-Vs with other materials has been fundamentally limited by the high growth temperatures and lattice-match requirements of traditional ...
Amani, Matin +9 more
core +1 more source
Synthesis of large-area and aligned copper oxide nanowires from copper thin film on silicon substrate [PDF]
, 2007 Large-area and aligned copper oxide nanowires have been synthesized by thermal annealing of copper thin films deposited onto silicon substrate. The effects of the film deposition method, annealing temperature, film thickness, annealing gas, and ...
Alphonse, Pierre +4 more
core +3 more sources
Cell Migration According to Shape of Graphene Oxide Micropatterns
Micromachines, 2016 Photolithography is a unique process that can effectively manufacture micro/nano-sized patterns on various substrates. On the other hand, the meniscus-dragging deposition (MDD) process can produce a uniform surface of the substrate.
Sung Eun Kim +11 more
doaj +1 more source