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Ionic Distribution in Plasma for the Process of Electron-Beam Physical Vapor Deposition

Applied Mechanics and Materials, 2014
This paper investigates ionic distribution generated by electron beam (EB) during Physical Vapor Deposition (PVD). EB-PVD has a wide range of applications in thermal barrier coatings (TBCs) due to favorable characteristics compared with other coating processes.
Ching Yen Ho, Wen Chieh Wu
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Longitudinal Phase Space Measurements and Application to Beam-Plasma Physics

2006
Beam driven plasma wakes show great promise for meter scale accelerators with high gradients. Plasma wakefield theory indicates that the achievable gradient is proportional to N/{sigma}{sub z}{sup 2}, and the bunches as short as 12 {micro}m {approx} 40 fsec in RMS length which are now possible at the Stanford Linear Accelerator Center (SLAC) are ...
Christopher Dwight Barnes, null /SLAC
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Limits of the Physical Relevance of Numerical Investigations of the Chaotic Beam Relaxation in an Electron Beam‐Plasma System

Beiträge aus der Plasmaphysik, 1987
AbstractThe chaotic relaxation mechanism of a monoenergetic electron beam in a strongly dissipative plasma is investigated in the framework of the single wave theory. An information theoretical quantity is introduced that describes the information loss of the beam system in course of time.
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Accelerator Physics Challenges towards a Plasma Accelerator with Usable Beam Quality

2014
Enormous progress in compact plasma accelerators has been demonstrated over the recent years in various experiments. These experiments rely on high power, pulsed lasers or short electron bunches to excite ultra-strong wakefields in plasmas. Accelerating gradients have reached several 10 GV/m up to 100 GV/m and the absolute energy gain of electron beams
Aßmann, Ralph, Grebenyuk, Julia
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‘Programming’ Electron Beam Ion Traps To Produce Atomic Data Relevant To Plasma Physics

AIP Conference Proceedings, 2009
After a brief review of the processes taking place in electron beam ions traps (EBITs), the means by which EBITs are used to make measurements of electron impact ionization cross‐sections and dielectronic recombination resonance strengths are discussed.
Fred Currell   +7 more
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Physical effects induced by particle beams artificially injected into space plasmas

Journal of Atmospheric and Terrestrial Physics, 1985
Abstract This paper presents a review of several communications which were presented during the meeting on Active Experiments in Space (Florence, 1984). The experimental results are connected with the study of the physical effects induced by particle beams artificially injected into space plasmas.
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Physics of Negative Ions and Helicon Waves in a Resonant Antenna Plasma Source for Neutral Beams [PDF]

open access: possible, 2021
Present activities on the Resonant Antenna Ion Device (RAID) [1] at the Swiss Plasma Center aim at broadening the current knowledge of volume production of negative ions as well as the physics of helicon wave propagation in hydrogen and deuterium plasmas for neutral beam injectors (NBIs) for fusion.
Furno I   +11 more
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Halo plasma physics model for mirror machines with neutral beam injection

Nuclear Fusion, 1986
A model for halo plasmas in mirror machines sustained by neutral beam injection is described and applied to the conceptual tandem mirror test facilities TDF and TASKA-M. Halo source terms include alpha particle heating, radial transport, neutral beam attenuation, and reionization of charge exchanged neutrals.
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Space plasma physics: phenomena induced by charged particle beams.

Science (New York, N.Y.), 2010
The effects of electron beam emissions from Spacelab were recorded with onboard diagnostic instruments. The variation of the Spacelab-shuttle potential with respect to the ambient plasma near the scientific air lock was investigated. Data on the waves and instabilities triggered by the electron beams are discussed. Within the electron gyrofrequency and
C, Beghin   +5 more
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Plasma- and Ion-Beam Assisted Physical Vapor Deposition: Processes and Materials

1989
Physical vapor deposition (PVD) includes any thin film process involving the deposition of physically generated atoms or molecules onto a substrate in a vacuum environment. Evaporation, sputtering, and ion plating, the fundamental PVD processes, are characterized by the physical mechanism by which the vapor flux is generated.
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