Results 261 to 270 of about 1,564,578 (297)

SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas

1997
Silicon dioxide (SiO2) is the most important insulator employed in silicon integrated circuit (IC) technology. It is used as the material of choice to electrically isolate the conductive portions of devices or circuits from each other, e.g. as the gate insulator of field effect transistors, field oxide or trench refill material when isolating ...
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Density diagnostic of astrophysical plasmas

AIP Conference Proceedings, 1997
The Arcetri Spectral Code, that evaluates XUV line and continuum emission of thin plasmas in the range 1–2000 A, has been recently updated and includes detailed computation of levels populations for the Iron lines from Fe IX to Fe XXIII and the most important Be-like, C-like, and N-like ions (1).
Massimo Landini, Enrico Landi
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Digital plasma density determining device

Review of Scientific Instruments, 1974
A device is described for measuring the time dependent, volume averaged density of a decaying plasma in a large multimode microwave cavity such as is typically used for plasma confinement studies. The technique consists of filling the cavity with microwave radiation and digitally counting the modes observed with a detector as the plasma decays.
D. J. Holly, T. W. Lovell, J. C. Sprott
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Finite density effects in plasmas

Journal of Quantitative Spectroscopy and Radiative Transfer, 1995
Abstract The electronic structure on an ion in a low-density plasma is compared with that of an ion in a high-density plasma. The raising of energy levels and pressure ionization of loosely bound levels are well known and easy to estimate with reasonable accuracy.
David A. Liberman, James R. Albritton
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High-density plasma sources

2000
Publisher Summary The chapter discusses the challenges for ionized physical vapor deposition plasma source design. Ionized physical vapor deposition (I-PVD), in comparison with other process steps for ULSI (ultra large-scale integration) fabrication, presents some interesting and unique challenges in the selection of a plasma source.
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High-Density Plasma Laser Interaction

2008
High-density plasmas are of interest for fundamental research and applications, as e.g., in light sources and fusion, as well as for the understanding of the physics in stellar and planetary systems. In recent years, ultra-short high-intensity laser pulses have become available so that intensities up to 10 W/cm can be reached.
Heidi Reinholz, Thomas Bornath
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Plasma density effects on ionization

AIP Conference Proceedings, 1996
Traditionally, collisional rate coefficients for electron impact excitation or ionization of an ion in a plasma are obtained by first computing a binary collision cross section σ(v) between a single plasma electron and an isolated ion. This quantity is subsequently averaged over the plasma electron flux to obtain the rate coefficient 〈vσ(v)〉.
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Density diagnostics and coronal plasma

Advances in Space Research, 1991
Abstract The electron density in the coronal plasma using diagnostic line intensity ratios has been studied. These studies have provided clues to our understanding of physical processes in the quiet Sun, coronal holes, sunspot and active regions. In this paper some new work on the determination of theoretical electron density in the solar atmosphere ...
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Interplanetary scintillation and plasma density

Planetary and Space Science, 1986
Abstract Observations on a grid of 900–2500 radio sources have been combined with in situ spacecraft measurements to determine the relation between interplanetary scintillation and mean plasma-densily along the line of sight. Studies carried out during a variety of disturbances, including shocks and corotating streams, indicate a relation g ≅ (N/9)0 ...
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Density deviations of sheet plasma

1993
A sheet plasma has been generated by use of a TPD (Test Plasma produced by Direct current) type plasma source that all shapes of cathode, slits of anode and floating electrodes, vacuum chambers and magnetic coils are modified rectangularly. Such a machine called a TU–1 or a TU–2 machine, has structural feature that can be produced a steady-state, high ...
Katsuhiko Sunako, Kenzo Nanri, Kazutaka Kawamura, Kazuo Takayama   +3 more
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