Results 1 to 10 of about 127,127 (147)

Enhancing uniformity in HARC etching via edge bias voltage and structural impedance variations in a rectangular voltage waveform [PDF]

open access: yesScientific Reports
In the semiconductor industry, plasma etching has become a key process for fabricating precise and reliable patterns with high aspect ratios capacitors (HARC), allowing for complex device architectures.
Chanho Park   +3 more
doaj   +2 more sources

Plasma edge and plasma-wall interaction modelling: Lessons learned from metallic devices

open access: yesNuclear Materials and Energy, 2017
Robust power exhaust schemes employing impurity seeding are needed for target operational scenarios in present day tokamak devices with metallic plasma-facing components (PFCs). For an electricity-producing fusion power plant at power density Psep/R>15MW/
S. Wiesen   +6 more
doaj   +7 more sources

Evaluation of NVIDIA Xavier NX Platform for Real-Time Image Processing for Plasma Diagnostics

open access: yesEnergies, 2022
Machine protection is a core task of real-time image diagnostics aiming for steady-state operation in nuclear fusion devices. The paper evaluates the applicability of the newest low-power NVIDIA Jetson Xavier NX platform for image plasma diagnostics ...
Bartłomiej Jabłoński   +8 more
doaj   +1 more source

Transport barrier and spinning blob dynamics in the tokamak edge

open access: yesNuclear Fusion, 2023
In this work, we investigate the dynamics of plasma blobs in the edge of magnetic confinement devices using a full-f gyrokinetic particle-in-cell code with X-point geometry.
Junyi Cheng   +5 more
doaj   +1 more source

Experimental characterization of the quasi-coherent mode in EDA H-Mode and QCE scenarios at ASDEX Upgrade

open access: yesNuclear Fusion, 2023
The quasi-coherent mode (QCM), appearing in enhanced D $_{\alpha}$ high confinement mode (EDA H-mode) and quasi-continuous exhaust (QCE) plasmas has been analysed in detail at ASDEX Upgrade via thermal helium beam spectroscopy under various discharge ...
J. Kalis   +14 more
doaj   +1 more source

Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment

open access: yesApplied Sciences, 2022
During the oxide layer etching process, particles in capacitively coupled plasma etching equipment adhere to the wafer edge and cause defects that reduce the yield from semiconductor wafers.
Ching-Ming Ku, Stone Cheng
doaj   +1 more source

Quantum Hall edges beyond the plasma analogy

open access: yesPhysical Review Research
We demonstrate that the widely used plasma analogy is unreliable at predicting edge properties of quantum Hall states. This discrepancy arises from a fundamental difference between quantum Hall droplets and plasmas (Coulomb gases): The former are ...
Per Moosavi   +4 more
doaj   +3 more sources

Hermes: global plasma edge fluid turbulence simulations [PDF]

open access: yesPlasma Physics and Controlled Fusion, 2017
Joint Varenna-Lausanne international workshop on Theory of Fusion ...
Dudson, Benjamin Daniel, Leddy, Jarrod
openaire   +3 more sources

Aerodynamic drag reduction for a truck model using DBD plasma actuators

open access: yesAdvances in Mechanical Engineering, 2022
In this study, the effect of DBD plasma actuator based active flow control for a truck model was investigated. Two different electrode shapes which are linear and comb-shaped plasma actuators, are considered.
Chin-Cheng Wang, Ching-Po Wen
doaj   +1 more source

Time-resonant tokamak plasma edge instabilities? [PDF]

open access: yesPlasma Physics and Controlled Fusion, 2014
For a two week period during the Joint European Torus (JET) 2012 experimental campaign, the same high confinement plasma was repeated 151 times. The dataset was analysed to produce a probability density function (pdf) for the waiting times between edge-localised plasma instabilities ("ELMS"). The result was entirely unexpected.
Webster, A. J.   +200 more
openaire   +6 more sources

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