Results 1 to 10 of about 131,113 (167)

Enhancing uniformity in HARC etching via edge bias voltage and structural impedance variations in a rectangular voltage waveform [PDF]

open access: yesScientific Reports
In the semiconductor industry, plasma etching has become a key process for fabricating precise and reliable patterns with high aspect ratios capacitors (HARC), allowing for complex device architectures.
Chanho Park   +3 more
doaj   +2 more sources

Tokamak Edge Plasma Turbulence Interaction with Magnetic X-Point in 3D Global Simulations

open access: yesFluids, 2019
Turbulence in the edge plasma of a tokamak is a key actor in the determination of the confinement properties. The divertor configuration seems to be beneficial for confinement, suggesting an effect on turbulence of the particular magnetic geometry ...
Davide Galassi   +6 more
doaj   +3 more sources

Transport Processess in the Plasma Edge [PDF]

open access: yesFusion Science and Technology, 2008
Basic properties of the plasma edge in magnetically confined fusion plasmas are summarized. Starting from the magnetic topology of tokamaks we describe the transport of the scrape-off layer includi...
Bernhard Unterberg, Jülich Gmbh
openaire   +3 more sources

Evaluation of NVIDIA Xavier NX Platform for Real-Time Image Processing for Plasma Diagnostics

open access: yesEnergies, 2022
Machine protection is a core task of real-time image diagnostics aiming for steady-state operation in nuclear fusion devices. The paper evaluates the applicability of the newest low-power NVIDIA Jetson Xavier NX platform for image plasma diagnostics ...
Bartłomiej Jabłoński   +8 more
doaj   +1 more source

Josephson plasma edge in La1.85Sr0.15CuO4 [PDF]

open access: yesPhysica B: Condensed Matter, 1995
The far-infrared dielectric c-axis response for La 1.85 Sr 0.15 CuO 4 shows a pronounced plasma edge below the BCS superconductive gap frequency. The low frequency of this plasmon was previously interpreted as an indication for anomalous mass enhancement for the c-axis transport.
Bentum, P.J.M. van   +5 more
openaire   +1 more source

Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment

open access: yesApplied Sciences, 2022
During the oxide layer etching process, particles in capacitively coupled plasma etching equipment adhere to the wafer edge and cause defects that reduce the yield from semiconductor wafers.
Ching-Ming Ku, Stone Cheng
doaj   +1 more source

Transport barrier and spinning blob dynamics in the tokamak edge

open access: yesNuclear Fusion, 2023
In this work, we investigate the dynamics of plasma blobs in the edge of magnetic confinement devices using a full-f gyrokinetic particle-in-cell code with X-point geometry.
Junyi Cheng   +5 more
doaj   +1 more source

Experimental characterization of the quasi-coherent mode in EDA H-Mode and QCE scenarios at ASDEX Upgrade

open access: yesNuclear Fusion, 2023
The quasi-coherent mode (QCM), appearing in enhanced D $_{\alpha}$ high confinement mode (EDA H-mode) and quasi-continuous exhaust (QCE) plasmas has been analysed in detail at ASDEX Upgrade via thermal helium beam spectroscopy under various discharge ...
J. Kalis   +14 more
doaj   +1 more source

Aerodynamic drag reduction for a truck model using DBD plasma actuators

open access: yesAdvances in Mechanical Engineering, 2022
In this study, the effect of DBD plasma actuator based active flow control for a truck model was investigated. Two different electrode shapes which are linear and comb-shaped plasma actuators, are considered.
Chin-Cheng Wang, Ching-Po Wen
doaj   +1 more source

The Cutting Edge of Plasma Etching

open access: yesScience, 2008
Better etching methods for creating more finely structured microcircuits will require close attention to basic plasma physics and surface chemistry.
Lill, Thorsten, Joubert, Olivier
openaire   +3 more sources

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