Results 211 to 220 of about 20,524 (256)
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Decomposition of Hydrofluorocarbons in a Dielectric-Packed Plasma Reactor
The Journal of Physical Chemistry A, 2008This study investigated the decomposition of hydrofluorocarbons (HFCs) having high global warming potentials by using a dielectric-packed-bed nonthermal plasma reactor with barium titanate beads as the packing material. The target HFCs were 1,1,1,2-tetrafluoroethane (HFC-134a) and 1,1-difluoroethene (HFC-132a). The effects of several parameters such as
Mok, Y. S. +2 more
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Investigation on a DBD Plasma Reactor
IEEE Transactions on Plasma Science, 2011This paper investigates the effect of some dielectric barrier discharge plasma reactor parameters such as dielectric conductivity and electrode gap on the plasma mode. The results show that in the shorter gap, plasma is more homogenous, and dielectric conductivity can affect on the plasma mode.
Hamid Ghomi +2 more
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A gas chromatograph with plasma reactor
Mikrochimica Acta, 1978A plasma reactor has been developed, which is inserted into a gas-chromatographic flow system so that any effluent emerging from the first column can be routed through the plasma and the resulting products separated in a second column. Plasma processing is based, typically, on a weak,β-stimulated argon discharge, and a variety of doping gases can be ...
Walter A. Aue +2 more
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Analytical Model of a Plasma Reactor
Plasma Chemistry and Plasma Processing, 2000This paper presents a simple analytical model to estimate the effect of theboundary layer on the performance of a dc plasma reactor. A graphite linerwas inserted inside the reactor to raise the wall temperature. The model wasused to predict the Destruction and Removal Efficiency (DRE) of the reactorwith and without the graphite liner.
R. T. Deam, A. R. Dayal
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2000
Plans to introduce pilot lines for 300 mm processing are in progress. The IC technology is simultaneously moving towards 0.18 µm and 0.15 µm linewidths. The convergence of these two trends places unprecedented stringent demands on processes and equipments. The challenges faced by equipment manufacturers are enormous.
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Plans to introduce pilot lines for 300 mm processing are in progress. The IC technology is simultaneously moving towards 0.18 µm and 0.15 µm linewidths. The convergence of these two trends places unprecedented stringent demands on processes and equipments. The challenges faced by equipment manufacturers are enormous.
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Modeling of a counterflow plasma reactor
Plasma Chemistry and Plasma Processing, 1991Modeling of a counterflow plasma reactor is presented, using liquid injection for the synthesis of fine particles. An experimental reactor has been developed in this laboratory, and feasibility has been demonstrated for synthesizing advanced ceramic powders.
Seungho Paik +3 more
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Processing Plasmas and Reactors
1995In our discussion of the fundamental characteristics of plasmas, we did not place emphasis on the means of generating and sustaining the plasma. Nor did we consider the proper confinement of the plasma and the reactants, or the optimization of the plasma in order to produce a solid film on the substrate. In this chapter we will address these issues and
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Novel reactors for plasma applications
Chemical Engineering Science, 1990Abstract With the availability of efficient and reliable torches for thermal plasma generation, industrial interest has turned to the design of novel reactors capable of taking full advantage of this new energy source. This effort has resulted in a wide variety of designs, depending on the applications.
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Electronegative Plasma Reactor Engineering
2004Low pressure (0.1 mtorr to 10 torr), cold (gas temperature ∼500 K), weakly ionized (degree of ionization 10−6-10−1) glow discharge plasmas are used extensively in the processing of electronic materials, especially for etching and deposition of thin films1. Such plasmas also find application in surface modification (e.g., hardening, corrosion resistance)
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